公开(公告)号：US09559210B2

公开(公告)日：2017-01-31

申请号：US14800187

申请日：2015-07-15

Applicant: Samsung Display Co. Ltd.

Inventor： Dong Gun Oh ,  Young Gu Kang ,  Sung In Ro ,  Jae Hak Lee ,  Sung Hoon Lim ,  Woong Ki Jeon

IPC: H01L29/786 ,  H01L29/66 ,  H01L27/12

CPC classification number: H01L27/124 ,  H01L27/1214 ,  H01L27/1248 ,  H01L27/1259 ,  H01L27/1262 ,  H01L29/66742 ,  H01L29/78648 ,  H01L29/78669 ,  H01L29/78678 ,  H01L29/7869

Abstract: A thin film transistor is provided as follows. A first gate electrode and a second gate electrode are stacked on each other. A semiconductor layer is interposed between the first and second gate electrodes. A source electrode and a drain electrode are interposed between the semiconductor layer and the second gate electrode. A connection electrode connects electrically the first gate electrode and the second gate electrode. A first insulating film is interposed between the first gate electrode and the semiconductor layer. A second insulating film includes a first part interposed between the semiconductor layer and the second gate electrode and a second part interposed between the second gate electrode and the drain electrode. A third insulating film includes a first part interposed between the connection electrode and the second gate electrode.

Abstract translation: 如下提供薄膜晶体管。 第一栅电极和第二栅电极彼此堆叠。 半导体层介于第一和第二栅电极之间。 源电极和漏电极插入在半导体层和第二栅电极之间。 连接电极电连接第一栅电极和第二栅电极。 第一绝缘膜介于第一栅电极和半导体层之间。 第二绝缘膜包括插入在半导体层和第二栅电极之间的第一部分和介于第二栅电极和漏电极之间的第二部分。 第三绝缘膜包括插入在连接电极和第二栅电极之间的第一部分。