Device for adjusting flatness of plate

    公开(公告)号:US10081859B2

    公开(公告)日:2018-09-25

    申请号:US14926243

    申请日:2015-10-29

    Inventor: Jeong Won Han

    CPC classification number: C23C14/042

    Abstract: A plate flatness adjusting device includes at least one tendon, an accommodation portion, and a tensile strength adjuster. The at least one tendon penetrates a through-hole of a plate and has lateral ends protruding outside of the plate. The accommodation portion accommodates the lateral ends of the at least one tendon. The tensile strength adjuster is coupled to the accommodation portion to adjust a tensile strength of the at least one tendon. The adjusted tensile strength adjusts a degree of flatness of the plate.

    Aligning method of mask assembly using deposition apparatus
    22.
    发明授权
    Aligning method of mask assembly using deposition apparatus 有权
    使用沉积装置的面罩组装对准方法

    公开(公告)号:US09496525B2

    公开(公告)日:2016-11-15

    申请号:US14154070

    申请日:2014-01-13

    Inventor: Jeong Won Han

    CPC classification number: H01L51/56 C23C14/042 H01L51/0011 Y10T29/49

    Abstract: A method of aligning a mask assembly includes: providing a mask assembly including a mask and a mask frame; and adjusting the mask frame by independently moving at least a position of a lower portion of the mask frame and an upper portion of the mask frame.

    Abstract translation: 对准掩模组件的方法包括:提供包括掩模和掩模框架的掩模组件; 以及通过独立地移动所述面罩框架的下部的至少一个位置和所述面罩框架的上部来调整所述面罩框架。

    DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME
    23.
    发明申请
    DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME 有权
    沉积装置和使用该沉积方法的沉积方法

    公开(公告)号:US20160207066A1

    公开(公告)日:2016-07-21

    申请号:US14967053

    申请日:2015-12-11

    Inventor: Jeong Won Han

    CPC classification number: B05C21/005 H01L21/32139 H01L51/0011

    Abstract: A deposition apparatus for manufacturing a display device is disclosed. In one aspect, the apparatus includes a substrate fixing portion configured to fix a deposition substrate to a lower portion thereof and a first mask transfer portion placed on one side of the substrate fixing portion and configured to move the deposition mask upwardly such that the deposition mask is formed spaced apart from the deposition substrate by a predetermined distance. The apparatus also includes a substrate transfer portion configured to move the deposition substrate such that the deposition substrate passes over the deposition mask. The apparatus further includes a mask spacing portion positioned on the substrate fixing portion and configured to maintain a substantially uniform distance between the deposition substrate and the deposition mask when the deposition substrate is moved and a deposition source configured to deposit a deposition material on the deposition substrate through the deposition mask.

    Abstract translation: 公开了一种用于制造显示装置的沉积装置。 一方面,该装置包括:基板固定部,其被配置为将沉积基板固定到其下部;以及第一掩模转印部,其设置在基板固定部的一侧,并被配置为向上移动沉积掩模,使得沉积掩模 形成为与沉积基板间隔开预定距离。 该设备还包括一个衬底转移部分,其构造成移动沉积衬底,使得沉积衬底通过沉积掩模。 所述设备还包括掩模间隔部分,其位于所述基板固定部分上并且被配置为当所述沉积基板移动时保持所述沉积基板和所述沉积掩模之间的基本上均匀的距离;以及沉积源,其被配置为在所述沉积基板上沉积沉积材料 通过沉积掩模。

    APPARATUS FOR DEPOSITION AND SUBSTRATE ALIGNMENT METHOD IN THE SAME
    24.
    发明申请
    APPARATUS FOR DEPOSITION AND SUBSTRATE ALIGNMENT METHOD IN THE SAME 有权
    用于沉积和底物对准方法的装置

    公开(公告)号:US20160186305A1

    公开(公告)日:2016-06-30

    申请号:US14792443

    申请日:2015-07-06

    Inventor: Jeong Won Han

    Abstract: A deposition apparatus is disclosed. In one aspect, the apparatus includes a metal sheet of which an edge portion is integrally combined with a sheet frame and an electrostatic chuck attached to a bottom surface of the metal sheet and configured to pull a substrate based on a static electricity force. The apparatus also includes a metal mask placed below the electrostatic chuck, wherein an edge portion of the metal mask is combined with a mask frame, and wherein the metal mask has a predetermined patterned opening where the substrate is mounted to the upper surface thereof. The apparatus further includes a magnet plate placed above the metal sheet, and configured to pull the metal mask based on a magnetic force so as to attach the substrate to the electrostatic chuck.

    Abstract translation: 公开了一种沉积设备。 一方面,该装置包括:金属板,其边缘部分与片材框架一体地组合;以及静电卡盘,其安装在金属板的底面上,并被构造成基于静电力拉动基板。 该设备还包括放置在静电卡盘下方的金属掩模,其中金属掩模的边缘部分与掩模框架组合,并且其中金属掩模具有预定的图案化开口,其中基板安装到其上表面。 该设备还包括一个放置在金属片上方的磁板,并被配置为基于磁力拉动金属掩模,从而将该基板固定在静电卡盘上。

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