Abstract:
A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus includes a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction so as to partition a space between the first nozzle and the second nozzle.
Abstract:
A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus includes a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction so as to partition a space between the first nozzle and the second nozzle.
Abstract:
A thin film deposition apparatus including a deposition source having a crucible to contain a deposition material and a heater to heat and vaporize the deposition material; a nozzle unit disposed at a side of the deposition source along a first direction and having a plurality of nozzle slits to discharge the deposition material that was vaporized; a plurality of emission coefficient increasing units disposed toward the nozzle unit within the deposition source and increasing a quantity of motion of the deposition material that is discharged toward the nozzle unit; a patterning slit sheet disposed opposite to the nozzle unit and having a plurality of patterning slits arranged along the first direction; and a barrier plate assembly disposed between the nozzle unit and the patterning slit sheet along the first direction, and having a plurality of barrier plates that partition a space between the nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces.
Abstract:
A frit sealing system and a method of manufacturing an organic light-emitting display (OLED) using the frit sealing system are disclosed. In one embodiment, the frit sealing system includes: a thermal expansion film formed on the second substrate to pressurize the second substrate when heat is applied to the frit and thermal expansion film, wherein the frit is interposed between the first and second substrates and a mask formed on the thermal expansion film.
Abstract:
A deposition mask for forming an organic layer pattern of an organic light emitting diode (OLED) display includes a base member having a first surface facing a substrate of the OLED display, and a second surface facing a side opposite to the first surface, and including a plurality of openings passing through the first surface and the second surface for forming the organic layer pattern. The opening has a pair of first side walls and a pair of second side walls. Each side wall of the openings has an inclination surface inclined with respect to a thickness direction of the base member, and when measuring an inclination angle of the inclination surface with reference to the first surface of the base member, the inclination angle of the first side wall and the inclination angle of the second side wall are different from each other.
Abstract:
A laser sealing device includes a laser beam generation device for irradiating a laser beam, a shutter positioned on a beam path of the laser beam and for blocking a portion of the laser beam, and a substrate supporter for supporting a substrate on which a frit is formed, the frit being configured to be irradiated with the laser beam passing through the shutter, wherein the shutter has a circular aperture for transmitting the laser beam, and comprises a blocking portion defining a portion of the aperture.