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公开(公告)号:US11604136B2
公开(公告)日:2023-03-14
申请号:US17204059
申请日:2021-03-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jaehwang Jung , Yasuhiro Hidaka , Mitsunori Numata , Wookrae Kim , Jinseob Kim , Myungjun Lee
Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
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公开(公告)号:US11314205B2
公开(公告)日:2022-04-26
申请号:US16225638
申请日:2018-12-19
Applicant: Samsung Electronics Co., Ltd.
Inventor: Myungjun Lee , Wookrae Kim , Gwangsik Park , Changhoon Choi
Abstract: A low-cost digital holography microscope (DHM) that is capable of performing inspection at high speed while accurately inspecting an inspection object at high resolution, an inspection method using the DHM, and a method of manufacturing a semiconductor device by using the DHM are provided. The DHM includes: a light source configured to generate and output light; a beam splitter configured to cause the light to be incident on an inspection object and output reflected light from the inspection object; and a detector configured to detect the reflected light, wherein, when the reflected light includes interference light, the detector generates a hologram of the interference light, and wherein no lens is present in a path from the light source to the detector.
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公开(公告)号:US20210164919A1
公开(公告)日:2021-06-03
申请号:US17022249
申请日:2020-09-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Kyungwon Yun , Taewan Kim , Seungbeom Park , Jaehyeon Son , Myungjun Lee , Jaehwang Jung
IPC: G01N21/956 , G01N21/45
Abstract: An inspection apparatus includes: a light source that generates and outputs light; a stage on which an inspection target is arranged; an irradiation optical system that irradiates light from the light source to the inspection target; a detector that receives the light diffracted from the inspection target and generates diffraction image; and a detector moving device configured to move the detector on a z-axis, which is an optical axis of the light, and an x-y plane perpendicular to the z-axis. Furthermore, while the detector moves on the x-y plane and the z-axis through the detector moving device, the detector generates a plurality of the diffraction images with different positions on the x-y plane and the z-axis with respect to the inspection target, and thus simultaneously implements phase retrieval and super resolution of diffraction images.
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