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公开(公告)号：US20240418645A1
公开(公告)日：2024-12-19
申请号：US18408247
申请日：2024-01-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Hojun Lee , Jangwoon Sung , Wookrae Kim , Hyungjin Kim , Seungbeom Park , Junho Shin , Myungjun Lee
Abstract: An example semiconductor measurement apparatus includes a light source, a pattern generator, a stage, an image sensor, and a controller. The light source is configured to output light in a predetermined wavelength band. The pattern generator is configured to generate light including a speckle pattern by scattering the light output from the light source. The stage is disposed on a movement path of the light including the speckle pattern, and a sample reflecting the light including the speckle pattern is seated on the stage. The image sensor is configured to receive light reflected from the sample and generate an original image representing a diffractive pattern of light reflected from the sample. The controller is configured to generate a prediction image for estimating diffractive characteristics of light incident on the image sensor.
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公开(公告)号：US20210200148A1
公开(公告)日：2021-07-01
申请号：US17060526
申请日：2020-10-01
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Seungbeom Park , Sungmin Park , Jaehyeon Son , Heejun Ahn , Myungjun Lee
Abstract: Provided is a holographic microscope including an input optical system configured to emit polarized input beam, a first beam splitter configured to emit an object beam by reflecting a portion of the polarized input beam, and emit a reference beam by transmitting a remaining portion of the polarized input beam, a reference optical system configured to separate the reference beam into a first reference beam and a second reference beam, a camera configured to receive the first reference beam and the second reference beam and the object beam that is reflected by an inspection object, the camera including a micro polarizer array, wherein a first polarization axis of the first reference beam is perpendicular to a second polarization axis of the second reference beam.
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公开(公告)号：US12045009B2
公开(公告)日：2024-07-23
申请号：US17716257
申请日：2022-04-08
Applicant: Samsung Electronics Co., Ltd.
Inventor： Myungjun Lee , Wookrae Kim , Gwangsik Park , Changhoon Choi
CPC classification number: G03H1/0443 , G02B21/361 , G03H1/0465 , G03H2001/005 , G03H2001/0469
Abstract: A low-cost digital holography microscope (DHM) that is capable of performing inspection at high speed while accurately inspecting an inspection object at high resolution, an inspection method using the DHM, and a method of manufacturing a semiconductor device by using the DHM are provided. The DHM includes: a light source configured to generate and output light; a beam splitter configured to cause the light to be incident on an inspection object and output reflected light from the inspection object; and a detector configured to detect the reflected light, wherein, when the reflected light includes interference light, the detector generates a hologram of the interference light, and wherein no lens is present in a path from the light source to the detector.
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公开(公告)号：US11988495B2
公开(公告)日：2024-05-21
申请号：US17156049
申请日：2021-01-22
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Kwangsoo Kim , Sungyoon Ryu , Daejun Park , Seong Yun , Seungryeol Oh , Sujin Lee , Jaeyong Lee , Minho Rim , Chungsam Jun , Myungjun Lee
CPC classification number: G01B11/02 , G01N21/8806 , G01N21/8851 , G03F7/70625 , G03F7/7065 , G01B2210/56 , G01N2021/8887
Abstract: Provided is a through-focus image-based metrology device including an optical device, and a computing device configured to acquire at least one through-focus image of a target from the optical device, generate an intensity profile based on the acquired at least one through-focus image, and perform metrology on the target based on the generated intensity profile, wherein the optical device includes a stage on which the target is disposed, the stage being configured to move by one step in at least one direction based on control of the computing device, and to acquire the at least one through-focus image, an image sensor disposed on the stage, an objective lens disposed between the image sensor and the stage, the objective lens being configured to transmit reflected light from the target, and a light source configured to emit illumination light to the target through the objective lens.
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公开(公告)号：US20220276607A1
公开(公告)日：2022-09-01
申请号：US17716257
申请日：2022-04-08
Applicant: Samsung Electronics Co., Ltd.
Inventor： Myungjun Lee , Wookrae Kim , Gwangsik Park , Changhoon Choi
Abstract: A low-cost digital holography microscope (DHM) that is capable of performing inspection at high speed while accurately inspecting an inspection object at high resolution, an inspection method using the DHM, and a method of manufacturing a semiconductor device by using the DHM are provided. The DHM includes: a light source configured to generate and output light; a beam splitter configured to cause the light to be incident on an inspection object and output reflected light from the inspection object; and a detector configured to detect the reflected light, wherein, when the reflected light includes interference light, the detector generates a hologram of the interference light, and wherein no lens is present in a path from the light source to the detector.
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Patent Agency Ranking
公开(公告)号：US20220074867A1
公开(公告)日：2022-03-10
申请号：US17225275
申请日：2021-04-08
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jaehwang Jung , Hyejin Shin , Wookrae Kim , Gwangsik Park , Myungjun Lee , Yongju Jeon
Abstract: An imaging apparatus includes a light source configured to generate and output light, a stage having a measurement target thereon, a line-scan spectral imaging (SI) optical system configured to measure the measurement target using a first scale and to slopingly irradiate the light from the light source onto the measurement target in a line beam shape, divide light reflected by the measurement target, and perform imaging of the divided light, and an angle-resolved SI optical system configured to measure the measurement target at a second scale that is smaller than the first scale and configured to divide the light from the light source into monochromatic light, slopingly irradiate the monochromatic light onto the measurement target by using a reflective objective lens, and perform imaging of light reflected by the measurement target.
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公开(公告)号：US12222282B2
公开(公告)日：2025-02-11
申请号：US18082040
申请日：2022-12-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Seoyeon Jeong , Seungwoo Lee , Inho Shin , Wookrae Kim , Myungjun Lee , Jaehwang Jung
IPC: G01N21/21 , G01B11/24 , G01N21/956 , G02B27/28
Abstract: A semiconductor measurement apparatus includes an illumination unit configured to provide illumination light including linearly polarized light beams having different wavelengths, an optical unit including an objective lens configured to allow the illumination light to be incident on a sample, the optical unit being configured to transmit reflection light generated when the illumination light is reflected from the sample, a self-interference generator configured to self-interfere the reflection light transmitted from the optical unit and transmit the reflection light to a first image sensor, for each wavelength, and a controller. The controller is configured to process a measurement image output by the image sensor to divide the measurement image into a first image representing an intensity ratio of a polarization component of the reflection light and a second image representing a phase difference of the polarization component of the reflection light, for each wavelength.
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公开(公告)号：US20240219315A1
公开(公告)日：2024-07-04
申请号：US18493226
申请日：2023-10-24
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jangwoon Sung , Lei Tian , Hao Wang , Jiabei Zhu , Myungjun Lee , Wookrae Kim , Seungbeom Park , Junho Shin , Hojun Lee
IPC: G01N21/95 , G01N21/88 , G01N21/956
CPC classification number: G01N21/9501 , G01N21/8806 , G01N21/956
Abstract: A substrate inspection apparatus includes a light irradiator including an objective lens and a plurality of optical fibers. The objective lens is configured to irradiate light to an illumination area on a semiconductor substrate having a plurality of circuit pattern layers, the plurality of optical fibers are adjacent a periphery of the objective lens and are configured to irradiate the light to a peripheral area adjacent the illumination area. A light generator is configured to generate the light. The light generator is configured to change an irradiation angle of the light to selectively irradiate the light to one or more of the objective lens and the plurality of optical fibers. A light analyzer is configured to obtain images of the circuit pattern layers from the light reflected from the illumination area and the peripheral area. The light analyzer is configured to model each of the circuit pattern layers of the semiconductor substrate to obtain image models and to measure an overlay between the circuit pattern layers through the images and the image models.
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公开(公告)号：US11726046B2
公开(公告)日：2023-08-15
申请号：US17225275
申请日：2021-04-08
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jaehwang Jung , Hyejin Shin , Wookrae Kim , Gwangsik Park , Myungjun Lee , Yongju Jeon
CPC classification number: G01N21/9501 , G01B11/254 , G01B2210/56
Abstract: An imaging apparatus includes a light source configured to generate and output light, a stage having a measurement target thereon, a line-scan spectral imaging (SI) optical system configured to measure the measurement target using a first scale and to slopingly irradiate the light from the light source onto the measurement target in a line beam shape, divide light reflected by the measurement target, and perform imaging of the divided light, and an angle-resolved SI optical system configured to measure the measurement target at a second scale that is smaller than the first scale and configured to divide the light from the light source into monochromatic light, slopingly irradiate the monochromatic light onto the measurement target by using a reflective objective lens, and perform imaging of light reflected by the measurement target.
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公开(公告)号：US11428947B2
公开(公告)日：2022-08-30
申请号：US16848169
申请日：2020-04-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Myungjun Lee , Seungbeom Park , Jaehyeon Son , Jaehwang Jung , Taewan Kim , Kyungwon Yun
Abstract: A super-resolution holographic microscope includes a light source configured to emit input light, a diffraction grating configured to split the input light into first diffracted light and second diffracted light, a mirror configured to reflect the first diffracted light, a wafer stage arranged on an optical path of the second diffracted light and on which a wafer is configured to be arranged, and a camera configured to receive the first diffracted light that is reflected by the mirror and the second diffracted light that is reflected by the wafer to generate a plurality of hologram images of the wafer.
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