NEAR FIELD TRANSDUCERS (NFTS) INCLUDING BARRIER LAYER AND METHODS OF FORMING
    23.
    发明申请
    NEAR FIELD TRANSDUCERS (NFTS) INCLUDING BARRIER LAYER AND METHODS OF FORMING 有权
    包括障碍层的近场传感器(NFTS)及其形成方法

    公开(公告)号:US20160351221A1

    公开(公告)日:2016-12-01

    申请号:US15166785

    申请日:2016-05-27

    CPC classification number: G11B5/6088 G11B5/314 G11B5/3163 G11B2005/0021

    Abstract: Devices having an air bearing surfaces (ABS), the devices including a near field transducer (NFT) that includes a disc having a front edge; a peg, the peg having a front surface at the air bearing surface of the apparatus, an opposing back surface, a top surface that extends from the front surface to the back surface, two side surfaces that expend from the front surface to the back surface and a bottom surface that extends from the front surface to the back surface; and a barrier layer, the barrier layer separating at least the back surface of the peg from the disc and the barrier layer having a thickness from 10 nm to 50 nm.

    Abstract translation: 具有空气轴承表面(ABS)的装置,所述装置包括近场传感器(NFT),其包括具有前缘的盘; 栓钉,该钉在设备的空气支承表面具有前表面,相对的后表面,从前表面延伸到后表面的顶表面,从前表面延伸到后表面的两个侧表面 以及从前表面延伸到后表面的底面; 和阻挡层,所述阻挡层至少将所述钉的后表面与所述盘分离,并且所述阻挡层具有10nm至50nm的厚度。

    NEAR FIELD TRANSDUCERS (NFTS) AND METHODS OF MAKING
    24.
    发明申请
    NEAR FIELD TRANSDUCERS (NFTS) AND METHODS OF MAKING 有权
    近场传感器(NFTS)和制造方法

    公开(公告)号:US20160351214A1

    公开(公告)日:2016-12-01

    申请号:US15167622

    申请日:2016-05-27

    Abstract: Methods of forming a NFT the methods including forming a hard mask positioned over at least a portion of the rod, the hard mask including at least one layer; patterning a resist mask over the hard mask, the resist mask having an edge positioned over at least a portion of the rod; etching a portion of the hard mask to expose a back edge of the rod and to form a back edge of the hard mask, wherein the back edge of the rod is equivalent to the back edge of the peg; and wherein a forward portion of the rod which is the portion of the rod forward of the back edge is covered by the hard mask; forming a disc mask including a void configured to form a disc of a NFT, the disc mask being formed over at least a portion of the hard mask so that the exposed back edge of the rod is within the void configured to form the disc; etching an area exposed in the void of the disc mask to remove both a rear portion of the rod and the surrounding dielectric up to the back edge of the hard mask edge; depositing a disc material in the etched void, wherein the back edge of the hard mask defines the front edge of the disc and the back edge of the rod is in contact with the front edge of the disc; and polishing the deposited disc material to form a top surface substantially planar with the top of the forward rod portion.

    Abstract translation: 形成NFT的方法包括形成位于杆的至少一部分上方的硬掩模,所述硬掩模包括至少一层; 在所述硬掩模上形成抗蚀剂掩模,所述抗蚀剂掩模具有位于所述杆的至少一部分上方的边缘; 蚀刻硬掩模的一部分以露出杆的后边缘并形成硬掩模的后边缘,其中杆的后边缘等同于钉的后边缘; 并且其中所述杆的前部部分是所述后缘的前部的所述部分被所述硬掩模覆盖; 形成包括构造成形成NFT的盘的空隙的盘掩模,所述盘掩模形成在所述硬掩模的至少一部分上,使得所述杆的暴露的后边缘在被构造成形成所述盘的所述空间内; 蚀刻暴露在盘掩模的空隙中的区域,以将杆的后部和周围的电介质移除到硬掩模边缘的后边缘; 将光盘材料沉积在蚀刻的空隙中,其中硬掩模的后边缘限定盘的前边缘,并且杆的后边缘与盘的前边缘接触; 并抛光沉积的盘材料以形成与前杆部分的顶部基本平面的顶表面。

    Near field transducers (NFTS) and methods of making

    公开(公告)号:US09928859B2

    公开(公告)日:2018-03-27

    申请号:US15481866

    申请日:2017-04-07

    Abstract: Methods of forming a NFT the methods including forming a hard mask positioned over at least a portion of the rod, the hard mask including at least one layer; patterning a resist mask over the hard mask, the resist mask having an edge positioned over at least a portion of the rod; etching a portion of the hard mask to expose a back edge of the rod and to form a back edge of the hard mask, wherein the back edge of the rod is equivalent to the back edge of the peg; and wherein a forward portion of the rod which is the portion of the rod forward of the back edge is covered by the hard mask; forming a disc mask including a void configured to form a disc of a NFT, the disc mask being formed over at least a portion of the hard mask so that the exposed back edge of the rod is within the void configured to form the disc; etching an area exposed in the void of the disc mask to remove both a rear portion of the rod and the surrounding dielectric up to the back edge of the hard mask edge; depositing a disc material in the etched void, wherein the back edge of the hard mask defines the front edge of the disc and the back edge of the rod is in contact with the front edge of the disc; and polishing the deposited disc material to form a top surface substantially planar with the top of the forward rod portion.

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