公开(公告)号：US06566038B2

公开(公告)日：2003-05-20

申请号：US09842396

申请日：2001-04-26

申请人： Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

发明人： Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

IPC分类号： G03F7039

CPC分类号： C08F222/06 ,  C08F222/40 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111 ,  C08F232/04 ,  C08F2220/1866 ,  C08F232/00

摘要： A polymer comprising units of formulas (1) and (2) and having a Mw of 1,000-500,000 is provided. R1 is H, CH3 or CH2CO2R3, R2 is H, CH3 or CO2R3, R3 is alkyl, R4 is halogen or acyloxy, alkoxycarbonyloxy or alkylsulfonyloxy group which may be substituted with halogen, R5 is H or alkyl, R6 is an acid labile group, Z is a single bond or a divalent hydrocarbon group, k is 0 or 1, and W is —O— or —(NR)— wherein R is H or alkyl. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV rays.

摘要翻译： 提供了包含式（1）和（2）单元并且Mw为1,000-500,000的聚合物。 R 1为H，CH 3或CH 2 CO 2 R 3，R 2为H，CH 3或CO 2 R 3，R 3为烷基，R 4为卤素或酰氧基，可被卤素取代的烷氧基羰氧基或烷基磺酰氧基，R 5为H或烷基，R 6为酸不稳定基团， Z为单键或二价烃基，k为0或1，W为-O-或 - （NR） - ，其中R为H或烷基。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

公开(公告)号：US06566037B2

公开(公告)日：2003-05-20

申请号：US09797878

申请日：2001-03-05

申请人： Tsunehiro Nishi ,  Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho ,  Jun Hatakeyama

发明人： Tsunehiro Nishi ,  Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho ,  Jun Hatakeyama

IPC分类号： G03F7038

CPC分类号： C08F232/08 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111

摘要： A polymer comprising recurring units of formula (1) and having a Mw of 1,000-500,000 is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is alkyl, R4 is H, alkyl, alkoxyalkyl or acyl, R5 and R15 are acid labile groups, and at least one of R6 to R9 is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the reminders are H or alkyl, at least one of R10 to R13 is a monovalent hydrocarbon group containing a —CO2— partial structure, and the reminders are H or alkyl, R14 is a polycyclic hydrocarbon group or polycyclic hydrocarbon-containing alkyl group, Z is a trivalent hydrocarbon group, k=0 or 1, x is>0, a, b, c and d are≧0, satisfying x+a+b+c+d=1. A resist composition comprising the polymer has significantly improved sensitivity, resolution and etching resistance and is very useful in microfabrication.

摘要翻译： 提供了包含式（1）的重复单元并且具有1,000-500,000的Mw的聚合物.R1是H，甲基或CH2CO2R3，R2是H，甲基或CO2R3，R3是烷基，R4是H，烷基，烷氧基烷基或酰基 R 5和R 15为酸不稳定基团，R 6〜R 9中的至少一个为羧基或羟基的一价烃基，提醒为H或烷基，R 10〜R 13中的至少一个为含有 -CO 2部分结构，提醒为H或烷基，R 14为多环烃基或含多环烃基的烷基，Z为三价烃基，k = 0或1，x为> 0，a，b， c和d为> = 0，满足x + a + b + c + d = 1。 包含聚合物的抗蚀剂组合物具有显着提高的灵敏度，分辨率和耐蚀刻性，并且在微细加工中非常有用。

公开(公告)号：US06515150B2

公开(公告)日：2003-02-04

申请号：US09967946

申请日：2001-10-02

申请人： Mutsuo Nakashima ,  Seiichiro Tachibana ,  Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Jun Hatakeyama

发明人： Mutsuo Nakashima ,  Seiichiro Tachibana ,  Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Jun Hatakeyama

IPC分类号： C07D31726

CPC分类号： C07D317/24 ,  C08F232/08 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

公开(公告)号：US06515149B2

公开(公告)日：2003-02-04

申请号：US09922635

申请日：2001-08-07

申请人： Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

发明人： Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

IPC分类号： C07D31712

CPC分类号： C08G61/08 ,  C08G61/02 ,  Y10S430/106 ,  Y10S430/111

摘要： Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by —(CH2)m— in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group, and m is from 1 to 8 are novel. Using the acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

公开(公告)号：US06962767B2

公开(公告)日：2005-11-08

申请号：US10315069

申请日：2002-12-10

申请人： Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

发明人： Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

IPC分类号： G03F7/039 ,  C07D317/12 ,  C07D317/20 ,  C07D317/24 ,  C07D319/06 ,  C08F32/00 ,  C08F220/10 ,  C08F222/06 ,  C08F222/10 ,  C08G61/02 ,  C08G61/08 ,  G03C5/00

CPC分类号： C08G61/08 ,  C08G61/02 ,  Y10S430/106 ,  Y10S430/111

摘要： Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by —(CH2)m— in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group, and m is from 1 to 8 are novel. Using the acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

摘要翻译： 其中5或6元环缩醛结构通过 - （CH 2 CH 2）m - 表示的连接体与降冰片烯结构连接的缩醛化合物，其中一个氢 原子可以被羟基或乙酰氧基取代，m为1至8的是新的。 使用缩醛化合物作为单体，得到聚合物。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，并且具有优异的灵敏度，分辨率和耐蚀刻性。

公开(公告)号：US06780563B2

公开(公告)日：2004-08-24

申请号：US09963465

申请日：2001-09-27

申请人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Tsunehiro Nishi ,  Jun Hatakeyama

发明人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Tsunehiro Nishi ,  Jun Hatakeyama

IPC分类号： G03F7039

CPC分类号： G03F7/0758 ,  G03F7/0045

摘要： A polymer bearing specific silicon-containing groups is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching. The resist composition lends itself to micropatterning for the fabrication of VLSIs.

摘要翻译： 具有特定含硅基团的聚合物是新颖的。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，并且在小于300nm的波长下具有优异的灵敏度和分辨率，以及高耐氧等离子体蚀刻性。 抗蚀剂组合物本身可用于制造VLSI的微图案。

公开(公告)号：US06670498B2

公开(公告)日：2003-12-30

申请号：US10288514

申请日：2002-11-06

申请人： Tsunehiro Nishi ,  Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

发明人： Tsunehiro Nishi ,  Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

IPC分类号： C07C6974

CPC分类号： G03F7/039 ,  C07C69/716 ,  C08G61/08 ,  G03F7/0045

摘要： An ester compound of the following formula (1) is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is C1-C15 alkyl, R4 is branched or cyclic, tertiary C5-C20 alkyl group, Z is a divalent C1-C10 hydrocarbon group, and k is 0 or 1. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and is suited for micropatterning using electron beams or deep-UV.

摘要翻译： 提供下式（1）的酯化合物：R 1是H，甲基或CH 2 CO 2 R 3，R 2是H，甲基或CO 2 R 3，R 3是C 1 -C 15烷基 R 4是支链或环状的，叔C5-C20烷基，Z是二价C1-C10烃基，k是0或1.含有由酯化合物得到的聚合物作为基础树脂的抗蚀剂组合物是 对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，适用于使用电子束或深UV的微图案。

公开(公告)号：US06660448B2

公开(公告)日：2003-12-09

申请号：US09986274

申请日：2001-11-08

申请人： Seiichiro Tachibana ,  Mutsuo Nakashima ,  Tsunehiro Nishi ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

发明人： Seiichiro Tachibana ,  Mutsuo Nakashima ,  Tsunehiro Nishi ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

IPC分类号： C08F2400

CPC分类号： C08F222/06 ,  C08F232/08 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： The invention provides a polymer comprising recurring units containing bridged aliphatic rings in the backbone and having a hydroxyl, acyloxy or alkoxylcarbonyloxy group as well as a lactone structure bonded through a spacer, the polymer having a weight average molecular weight of 1,000-500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.

公开(公告)号：US06500961B2

公开(公告)日：2002-12-31

申请号：US09867656

申请日：2001-05-31

申请人： Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

发明人： Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

IPC分类号： C07D30720

CPC分类号： C07D307/33 ,  G03F7/0395

摘要： Lactone compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. R1 is H or C1-6 alkyl, R2 is H or an acyl or alkoxycarbonyl group of 1-15 carbon atoms which may be substituted with halogen atoms, Z is a divalent C1-15 organic group which forms a lactone ring with the carbonyloxy group, k is 0 or 1, and m is an integer from 0 to 5.

摘要翻译： 式（1）的内酯化合物可用作单体以形成适用于微图案光刻的化学放大抗蚀剂组合物的基础树脂.R1为H或C1-6烷基，R2为H或1-15碳的酰基或烷氧基羰基 可以被卤素原子取代的原子，Z是与羰基氧基形成内酯环的二价C1-15有机基团，k为0​​或1，m为0-5的整数。

公开(公告)号：US06472543B2

公开(公告)日：2002-10-29

申请号：US09897985

申请日：2001-07-05

申请人： Takeshi Kinsho ,  Takeru Watanabe ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

发明人： Takeshi Kinsho ,  Takeru Watanabe ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

IPC分类号： C07D40700

CPC分类号： C07D315/00 ,  G03F7/0395

摘要： Lactone compounds of formula (1) are novel and useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. Letter k is 0 or 1 and m is an integer of 1-8.

摘要翻译： 式（1）的内酯化合物是新颖的并且可用作单体以形成适用于微图案光刻的化学放大抗蚀剂组合物的基础树脂。引发剂k为0或1，m为1-8的整数。