公开(公告)号：US20150053348A1

公开(公告)日：2015-02-26

申请号：US14461537

申请日：2014-08-18

Applicant: Tokyo Electron Limited

Inventor： Nobuyuki NAGAYAMA ,  Naoyuki SATOH

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/46 ,  C23C16/50

CPC classification number: H01J37/32642 ,  H01J37/32513 ,  H01J37/32522 ,  H01J37/3266 ,  H01J37/32669 ,  H01J37/32715

Abstract: A plasma processing apparatus includes a mounting stage on which a substrate is mounted, a focus ring arranged around a periphery of the mounting stage, a plurality of magnetic members arranged at a surface of the focus ring and a surface of the mounting stage facing opposite each other, and a temperature adjustment unit configured to adjust a temperature of the focus ring by introducing a heat transfer gas between the surface of the focus ring and the surface of the mounting stage facing opposite each other.

Abstract translation: 一种等离子体处理装置，包括安装基板的安装台，围绕安装台周围设置的聚焦环，配置在聚焦环的表面的多个磁性部件和安装台的面对相反的表面 以及温度调节单元，其被配置为通过在聚焦环的表面和安装台的彼此面对的表面之间引入传热气体来调节聚焦环的温度。