公开(公告)号：US10858729B2

公开(公告)日：2020-12-08

申请号：US14730768

申请日：2015-06-04

Applicant: Universal Display Corporation

Inventor： Gregory McGraw ,  William E. Quinn ,  Matthew King ,  Elliot H. Hartford, Jr. ,  Siddharth Harikrishna Mohan ,  Benjamin Swedlove ,  Gregg Kottas

IPC: C23C14/12 ,  C23C14/54 ,  C23C14/22 ,  B41J2/045 ,  C23C14/04 ,  H01L51/56 ,  H01L51/00 ,  B05D1/00

Abstract: Embodiments of the disclosed subject matter provide methods and systems including a nozzle, a source of material to be deposited on a substrate in fluid communication with the nozzle, a delivery gas source in fluid communication with the source of material to be deposited with the nozzle, an exhaust channel disposed adjacent to the nozzle, a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel, and an actuator to adjust a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target. The adjustment of the fly height separation may stop and/or start the deposition of the material from the nozzle.

公开(公告)号：US09583707B2

公开(公告)日：2017-02-28

申请号：US14858840

申请日：2015-09-18

Applicant: Universal Display Corporation

Inventor： William E. Quinn ,  Gregory McGraw ,  Siddharth Harikrishna Mohan ,  Matthew King ,  Elliot H. Hartford, Jr.

IPC: H01L51/00 ,  B41J2/16 ,  C23C14/22 ,  C23C14/12 ,  C23C14/24 ,  B41J2/14 ,  H01L51/50

CPC classification number: H01L51/56 ,  B05B15/555 ,  B41J2/1433 ,  B41J2/162 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1642 ,  B41J2002/14475 ,  C23C14/12 ,  C23C14/22 ,  C23C14/228 ,  C23C14/24 ,  H01L51/0004 ,  H01L51/0005 ,  H01L51/50

Abstract: Embodiments of the disclosed subject matter provide a nozzle assembly and method of making the same, the nozzle assembly including a first aperture formed on a first aperture plate to eject a carrier gas flow having organic vapor onto a substrate in a deposition chamber, second apertures formed on a second aperture plate disposed adjacent to the first aperture to form a vacuum aperture, where the first aperture plate and the second aperture plate are separated by a first separator plate, third apertures formed on a third aperture plate to eject purge gas that are disposed adjacent to the second aperture plate, where the second aperture plate and the third aperture plate are separated by second separator plate, and a third separator plate is disposed adjacent to the one or more third aperture plates to form a gas channel in the one or more third aperture plates.

Abstract translation: 所公开的主题的实施例提供了一种喷嘴组件及其制造方法，喷嘴组件包括形成在第一孔板上的第一孔，以将具有有机蒸汽的载气流喷射到沉积室中的基底上，形成第二孔 在与所述第一孔相邻设置的第二孔板上形成真空孔，其中所述第一孔板和所述第二孔板由第一隔板隔开，所述第三孔形成在第三孔板上以排出所设置的吹扫气体 邻近所述第二孔板，其中所述第二孔板和所述第三孔板由第二隔板隔开，并且第三隔离板邻近所述一个或多个第三孔板设置，以在所述一个或多个孔板中形成气体通道 第三孔板。