公开(公告)号：US20170327940A1

公开(公告)日：2017-11-16

申请号：US15668631

申请日：2017-08-03

Applicant: View, Inc.

Inventor： Martin John Neumann ,  Que Anh Song Nguyen ,  Disha Mehtani ,  Anshu A. Pradhan ,  Robert T. Rozbicki ,  Dhairya Shrivastava ,  Sridhar Kailasam ,  Trevor Frank ,  Jason Satern ,  Todd Martin

IPC: C23C14/34 ,  C01G19/02 ,  C01G9/02 ,  C08L23/06 ,  C01B33/113

CPC classification number: C23C14/3407 ,  C01B33/113 ,  C01G9/02 ,  C01G19/02 ,  C08L23/06 ,  C23C14/3414 ,  H01J37/3414 ,  H01J37/3426 ,  H01J37/3435

Abstract: Described are methods of fabricating lithium sputter targets, lithium sputter targets, associated handling apparatus, and sputter methods including lithium targets. Various embodiments address adhesion of the lithium metal target to a support structure, avoiding and/or removing passivating coatings formed on the lithium target, uniformity of the lithium target as well as efficient cooling of lithium during sputtering. Target configurations used to compensate for non-uniformities in sputter plasma are described. Modular format lithium tiles and methods of fabrication are described. Rotary lithium sputter targets are also described.

公开(公告)号：US20160109777A1

公开(公告)日：2016-04-21

申请号：US14893504

申请日：2014-06-12

Applicant: VIEW, INC.

Inventor： Todd Martin ,  Abhishek Anant Dixit ,  Fabian Strong ,  Anshu A. Pradhan

IPC: G02F1/153 ,  G02F1/15 ,  G02F1/155

CPC classification number: G02F1/1533 ,  G02F1/1523 ,  G02F1/155 ,  G02F2001/1536 ,  G02F2001/1555 ,  G02F2201/08

Abstract: Certain embodiments relate to optical devices and methods of fabricating optical devices that pre-treat a sub-layer to enable selective removal of the pre-treated sub-layer and overlying layers. Other embodiments pertain to methods of fabricating an optical device that apply a sacrificial material layer.

Abstract translation: 某些实施例涉及光学器件和制造预先处理子层以使得能够选择性地去除预处理的子层和覆盖层的光学器件的方法。 其它实施例涉及制造施加牺牲材料层的光学装置的方法。