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Patent Agency Ranking
公开(公告)号：US10443121B2
公开(公告)日：2019-10-15
申请号：US14784276
申请日：2014-04-24
Applicant: VIEW, INC.
Inventor： Martin John Neumann
Abstract: A method of sustained self-sputtering of lithium in a sputtering station having a lithium metal target, the method comprising initiating a lithium sputtering reaction in the sputtering station by igniting an initial plasma comprising a majority fraction of inert gas ions and inducing a sustained lithium self-sputtering reaction by reducing supply of an inert gas to the sputtering station under conditions that provide a sustained self-sputtering lithium plasma comprising a majority fraction of lithium ions.
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公开(公告)号：US20190032195A1
公开(公告)日：2019-01-31
申请号：US16150168
申请日：2018-10-02
Applicant: View, Inc.
Inventor： Disha Mehtani , Sridhar Karthik Kailasam , Trevor Frank , Todd William Martin , Jason Satern , Que Anh Song Nguyen , Dhairya Shrivastava , Martin John Neumann , Anshu A. Pradhan , Robert T. Rozbicki
Abstract: Described are methods of fabricating lithium sputter targets, lithium sputter targets, associated handling apparatus, and sputter methods including lithium targets. Various embodiments address adhesion of the lithium metal target to a support structure, avoiding and/or removing passivating coatings formed on the lithium target, uniformity of the lithium target as well as efficient cooling of lithium during sputtering. Target configurations used to compensate for non-uniformities in sputter plasma are described. Modular format lithium tiles and methods of fabrication are described. Rotary lithium sputter targets are also described.
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公开(公告)号：US10125419B2
公开(公告)日：2018-11-13
申请号：US15668631
申请日：2017-08-03
Applicant: View, Inc.
Inventor： Martin John Neumann , Que Anh Song Nguyen , Anshu A. Pradhan , Robert T. Rozbicki , Dhairya Shrivastava , Jason Satern , Todd Martin
Abstract: Described are methods of fabricating lithium sputter targets, lithium sputter targets, associated handling apparatus, and sputter methods including lithium targets. Various embodiments address adhesion of the lithium metal target to a support structure, avoiding and/or removing passivating coatings formed on the lithium target, uniformity of the lithium target as well as efficient cooling of lithium during sputtering. Target configurations used to compensate for non-uniformities in sputter plasma are described. Modular format lithium tiles and methods of fabrication are described. Rotary lithium sputter targets are also described.
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公开(公告)号：US20170327940A1
公开(公告)日：2017-11-16
申请号：US15668631
申请日：2017-08-03
Applicant: View, Inc.
Inventor： Martin John Neumann , Que Anh Song Nguyen , Disha Mehtani , Anshu A. Pradhan , Robert T. Rozbicki , Dhairya Shrivastava , Sridhar Kailasam , Trevor Frank , Jason Satern , Todd Martin
IPC: C23C14/34 , C01G19/02 , C01G9/02 , C08L23/06 , C01B33/113
CPC classification number: C23C14/3407 , C01B33/113 , C01G9/02 , C01G19/02 , C08L23/06 , C23C14/3414 , H01J37/3414 , H01J37/3426 , H01J37/3435
Abstract: Described are methods of fabricating lithium sputter targets, lithium sputter targets, associated handling apparatus, and sputter methods including lithium targets. Various embodiments address adhesion of the lithium metal target to a support structure, avoiding and/or removing passivating coatings formed on the lithium target, uniformity of the lithium target as well as efficient cooling of lithium during sputtering. Target configurations used to compensate for non-uniformities in sputter plasma are described. Modular format lithium tiles and methods of fabrication are described. Rotary lithium sputter targets are also described.
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5.发明申请SUSTAINED SELF-SPUTTERING OF LITHIUM FOR LITHIUM PHYSICAL VAPOR DEPOSITION 审中-公开用于锂离子物理蒸发沉积的可持续自发溅射公开(公告)号：US20160076139A1
公开(公告)日：2016-03-17
申请号：US14784276
申请日：2014-04-24
Applicant: VIEW, INC.
Inventor： Martin John Neumann
CPC classification number: C23C14/3457 , C23C14/185 , C23C14/3492 , C23C14/54 , H01J37/32733 , H01J37/3426 , H01J37/3476 , H01J2237/036 , H01J2237/202 , H01J2237/2487 , H01J2237/327 , H01J2237/332
Abstract: A method of sustained self-sputtering of lithium in a sputtering station having a lithium metal target, the method comprising initiating a lithium sputtering reaction in the sputtering station by igniting an initial plasma comprising a majority fraction of inert gas ions and inducing a sustained lithium self-sputtering reaction by reducing supply of an inert gas to the sputtering station under conditions that provide a sustained self-sputtering lithium plasma comprising a majority fraction of lithium ions.
Abstract translation: 一种在具有锂金属靶的溅射站中持续自溅射锂的方法，所述方法包括通过点燃包含大部分惰性气体离子并引起持续锂自身的初始等离子体在溅射站中引发锂溅射反应 在提供包含大部分锂离子的持续自溅射锂等离子体的条件下，通过减少向溅射站供应惰性气体的溅射反应。
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