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公开(公告)号：US20190032195A1
公开(公告)日：2019-01-31
申请号：US16150168
申请日：2018-10-02
Applicant: View, Inc.
Inventor： Disha Mehtani , Sridhar Karthik Kailasam , Trevor Frank , Todd William Martin , Jason Satern , Que Anh Song Nguyen , Dhairya Shrivastava , Martin John Neumann , Anshu A. Pradhan , Robert T. Rozbicki
Abstract: Described are methods of fabricating lithium sputter targets, lithium sputter targets, associated handling apparatus, and sputter methods including lithium targets. Various embodiments address adhesion of the lithium metal target to a support structure, avoiding and/or removing passivating coatings formed on the lithium target, uniformity of the lithium target as well as efficient cooling of lithium during sputtering. Target configurations used to compensate for non-uniformities in sputter plasma are described. Modular format lithium tiles and methods of fabrication are described. Rotary lithium sputter targets are also described.
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公开(公告)号：US20170327940A1
公开(公告)日：2017-11-16
申请号：US15668631
申请日：2017-08-03
Applicant: View, Inc.
Inventor： Martin John Neumann , Que Anh Song Nguyen , Disha Mehtani , Anshu A. Pradhan , Robert T. Rozbicki , Dhairya Shrivastava , Sridhar Kailasam , Trevor Frank , Jason Satern , Todd Martin
IPC: C23C14/34 , C01G19/02 , C01G9/02 , C08L23/06 , C01B33/113
CPC classification number: C23C14/3407 , C01B33/113 , C01G9/02 , C01G19/02 , C08L23/06 , C23C14/3414 , H01J37/3414 , H01J37/3426 , H01J37/3435
Abstract: Described are methods of fabricating lithium sputter targets, lithium sputter targets, associated handling apparatus, and sputter methods including lithium targets. Various embodiments address adhesion of the lithium metal target to a support structure, avoiding and/or removing passivating coatings formed on the lithium target, uniformity of the lithium target as well as efficient cooling of lithium during sputtering. Target configurations used to compensate for non-uniformities in sputter plasma are described. Modular format lithium tiles and methods of fabrication are described. Rotary lithium sputter targets are also described.
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公开(公告)号：US10125419B2
公开(公告)日：2018-11-13
申请号：US15668631
申请日：2017-08-03
Applicant: View, Inc.
Inventor： Martin John Neumann , Que Anh Song Nguyen , Anshu A. Pradhan , Robert T. Rozbicki , Dhairya Shrivastava , Jason Satern , Todd Martin
Abstract: Described are methods of fabricating lithium sputter targets, lithium sputter targets, associated handling apparatus, and sputter methods including lithium targets. Various embodiments address adhesion of the lithium metal target to a support structure, avoiding and/or removing passivating coatings formed on the lithium target, uniformity of the lithium target as well as efficient cooling of lithium during sputtering. Target configurations used to compensate for non-uniformities in sputter plasma are described. Modular format lithium tiles and methods of fabrication are described. Rotary lithium sputter targets are also described.
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