公开(公告)号：US20100320742A1

公开(公告)日：2010-12-23

申请号：US12865461

申请日：2009-02-09

申请人： Winfried Hoffmuller ,  Marius Dichtl ,  Andre Gregarek

发明人： Winfried Hoffmuller ,  Marius Dichtl ,  Andre Gregarek

IPC分类号： B42D15/10 ,  B05D3/06 ,  B32B3/30

CPC分类号： B42D25/435 ,  B42D25/29 ,  B42D25/324 ,  B42D25/373 ,  B42D25/41 ,  B42D25/425 ,  B42D25/43 ,  B42D2033/10 ,  B42D2033/24 ,  D21H21/42 ,  D21H21/48 ,  G09F3/0292 ,  Y10T428/24479

摘要： The present invention relates to a method for manufacturing a security element (12) having a metalized microrelief pattern and a negative pattern in register therewith, in which P) a substrate (20) is provided with an embossing pattern having elevations (24) and depressions (26) that form first and second regions having different first and second height levels, wherein the desired microrelief pattern (28) is introduced into the first regions of the embossing pattern, and the second regions of the embossing pattern are developed in the form of the desired negative pattern, M) the embossing pattern with the first and second regions is contiguously metalized (30), and L) the metalized embossing pattern is impinged on with laser radiation, to selectively remove the metalization (30) in the second regions of the embossing pattern through the action of the laser radiation.

摘要翻译： 本发明涉及一种制造安全元件（12）的方法，该安全元件具有金属化的微结构图案和与其对准的负图案，其中P）基底（20）设置有具有高度（24）和凹陷的压花图案 （26），其形成具有不同的第一和第二高度水平的第一和第二区域，其中所需的微孔图案（28）被引入压花图案的第一区域中，并且压花图案的第二区域以 所需的负图案M）具有第一和第二区域的压印图案被连续地金属化（30），并且L）金属化压花图案用激光辐射照射，以选择性地去除第二区域中的金属化（30） 压花图案通过激光辐射的作用。

公开(公告)号：US07710652B2

公开(公告)日：2010-05-04

申请号：US10587294

申请日：2005-01-24

申请人： Marius Dichtl

发明人： Marius Dichtl

IPC分类号： G02B1/10

CPC分类号： B42D25/30 ,  B42D25/23 ,  B42D25/29 ,  B42D2035/14 ,  B42D2035/16 ,  B42D2035/20 ,  G02B5/1819 ,  G02B5/1823 ,  G02B5/1828 ,  G02B5/1861 ,  G07D7/0032

摘要： The present invention relates to a grating image having one or more grating fields, each of which includes an electromagnetic radiation-influencing grating pattern comprising a plurality of grating lines, the grating lines being characterized by the parameters orientation, curvature, spacing and profile. According to the present invention, in the grating image, a grating field (30) that is separately perceptible with the naked eye includes an electromagnetic radiation-influencing grating pattern having grating lines (32) for which at least one of the characteristic parameters orientation, curvature, spacing and profile varies (34) across the surface of the grating field.

摘要翻译： 本发明涉及具有一个或多个光栅场的光栅图像，每个光栅场包括包括多个光栅线的电磁辐射影响光栅图案，该光栅线的特征在于参数取向，曲率，间距和轮廓。 根据本发明，在光栅图像中，用肉眼可感知的光栅场（30）包括具有光栅线（32）的电磁辐射影响光栅图案，其中至少一个特征参数取向， 曲率，间距和轮廓在光栅场的表面上变化（34）。

公开(公告)号：US20080197295A1

公开(公告)日：2008-08-21

申请号：US10599659

申请日：2005-03-30

申请人： Wittich Kaule ,  Rainer Plontke ,  Ines Stollberg ,  Andreas Schubert ,  Marius Dichtl

发明人： Wittich Kaule ,  Rainer Plontke ,  Ines Stollberg ,  Andreas Schubert ,  Marius Dichtl

IPC分类号： G21K5/04 ,  G03F7/00

CPC分类号： G11B7/261 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0005 ,  G03F7/0017 ,  G11B7/007 ,  H01J37/3174

摘要： The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.

摘要翻译： 本发明涉及一种用于制造抗蚀剂成型元件的装置和方法。 根据本发明，使用电子束光刻系统来产生电子束，所述光束的轴线基本上垂直于要在其中产生抗蚀剂成型元件的抗蚀剂层。 可以以电子表面剂量的方式调整电子束，使得由于电子束的照射可以产生非正交抗蚀剂成型元件。

公开(公告)号：US08557369B2

公开(公告)日：2013-10-15

申请号：US12527043

申请日：2008-02-13

申请人： Winfried Hoffmüller ,  Marius Dichtl

发明人： Winfried Hoffmüller ,  Marius Dichtl

IPC分类号： B44F1/00 ,  G11B5/00 ,  B44C1/00 ,  B42D15/00 ,  B05D7/00

CPC分类号： B42D25/324 ,  B41M3/14 ,  B42D25/29 ,  B42D25/41 ,  B42D2035/20 ,  B42D2035/44 ,  C08L2312/00 ,  C09D5/28 ,  C09D11/101 ,  C09D133/14 ,  C09D133/16 ,  G02B3/0012 ,  Y10T428/24355 ,  Y10T428/24802

摘要： A highly refractive embossing lacquer for producing micro-optic arrangements which contains at least one binding agent which has at least one radiation-curing compound system having one or more organic compounds. The highly refractive embossing lacquer has at least a portion of the organic compounds of the radiation-curing compound system having molecules with at least one polarizable element, so that a polymeric material with a refractive index of greater than 1.5 is formed upon radiation curing. A security element which is produced with at least one micro-optic authenticity feature is also provided. The micro-optic authenticity features permit the production of security elements that are so thin that they can be easily incorporated into value documents.

摘要翻译： 一种用于产生微观光学布置的高折射压花漆，其包含至少一种具有至少一种具有一种或多种有机化合物的辐射固化化合物系统的粘合剂。 高折射压花漆具有辐射固化化合物系统的有机化合物的至少一部分具有至少一个可极化元素的分子，使得在辐射固化时形成折射率大于1.5的聚合物材料。 还提供了具有至少一个微光学真实性特征的安全元件。 微光学真实性特征允许生产如此薄的安全元件，使得它们可以容易地并入价值文档中。

公开(公告)号：US20110069360A1

公开(公告)日：2011-03-24

申请号：US12673805

申请日：2008-08-07

申请人： Marius Dichtl ,  Thomas Gerhardt

发明人： Marius Dichtl ,  Thomas Gerhardt

IPC分类号： B42D15/10 ,  G02B5/18 ,  G09F19/14 ,  G03F7/20

CPC分类号： G07D7/0032 ,  G07D7/003

摘要： The present invention relates to a grating image (30) for depicting a motif (24) that moves upon tilting the grating image (30) about a tilt axis (20), having two or more grating fields (32, 34, 36) having a viewing-angle-dependent visual appearance, that each include an electromagnetic-radiation-influencing grating pattern composed of a plurality of grating lines, and exhibit a preferred direction that establishes a viewing angle from which the appropriate grating field (32, 34, 36) is visually distinguishable, wherein, according to the present invention, the grating fields (32, 34, 36) are formed from a plurality of sub-regions nested within each other (32-i, 34-i, 36-i), and each grating field (32, 34, 36) displays a motif (24) view (24-A, 24-B, 24-C) that is shifted substantially along the tilt axis (20), wherein the viewing angles for the visual distinguishability and the shifts of the motif views (24-A, 24-B, 24-C) of the grating fields (32, 34, 36) are coordinated with each other such that, upon tilting the grating image (30), a motif (24) depiction that moves substantially along the tilt axis (20) is created for the viewer.

摘要翻译： 本发明涉及一种光栅图像（30），用于描绘在倾斜轴（20）倾斜光栅图像（30）时移动的图案（24），该倾斜轴具有两个或多个光栅场（32,34,36） 视角依赖的视觉外观，每个都包括由多个光栅线组成的电磁辐射影响光栅图案，并且呈现出建立视角的优选方向，从该视角可以看出适当的光栅场（32,34,36 ）在视觉上是可区分的，其中根据本发明，光栅场（32,34,36）由彼此嵌套的多个子区域（32-i，34-i，36-i）形成， 并且每个光栅场（32,34,36）显示基本上沿倾斜轴线（20）移动的图案（24）视图（24-A，24-B，24-C），其中视觉 光栅场（32,34,36）的图案视图（24-A，24-B，24-C）的区别性和偏移量与每个 r，使得在倾斜光栅图像（30）时，为观看者创建基本上沿着倾斜轴线（20）移动的图案（24）描绘。

公开(公告)号：US20080198468A1

公开(公告)日：2008-08-21

申请号：US11995228

申请日：2006-07-04

申请人： Wittich Kaule ,  Marius Dichtl

发明人： Wittich Kaule ,  Marius Dichtl

IPC分类号： G02B5/18 ,  G03H1/26 ,  G02B5/32

CPC分类号： B44F1/10 ,  G02B5/32

摘要： The present invention relates to a grating image (12) for depicting at least one unscreened halftone image having multiple brightness levels, the grating image exhibiting multiple grating fields (22-1, 22-2, 22-3) that include in each case an electromagnetic-radiation-influencing grating pattern composed of a plurality of grating lines and that, when illuminated, produce in each case an areal region of the halftone image having the same brightness level.

摘要翻译： 本发明涉及用于描绘具有多个亮度级别的至少一个未屏蔽半色调图像的光栅图像（12），该光栅图像呈现出多个光栅场（22-1,22-2,23-3），其包括在每种情况下为 由多个光栅线组成的电磁辐射影响光栅图案，并且当被照亮时，产生具有相同亮度级别的半色调图像的各个区域。

公开(公告)号：US08526085B2

公开(公告)日：2013-09-03

申请号：US12673805

申请日：2008-08-07

申请人： Marius Dichtl ,  Thomas Gerhardt

发明人： Marius Dichtl ,  Thomas Gerhardt

IPC分类号： G03H1/00

CPC分类号： G07D7/0032 ,  G07D7/003

摘要： The present invention relates to a grating image (30) for depicting a motif (24) that moves upon tilting the grating image (30) about a tilt axis (20), having two or more grating fields (32, 34, 36) having a viewing-angle-dependent visual appearance, that each include an electromagnetic-radiation-influencing grating pattern composed of a plurality of grating lines, and exhibit a preferred direction that establishes a viewing angle from which the appropriate grating field (32, 34, 36) is visually distinguishable, wherein, according to the present invention, the grating fields (32, 34, 36) are formed from a plurality of sub-regions nested within each other (32-i, 34-i, 36-i), and each grating field (32, 34, 36) displays a motif (24) view (24-A, 24-B, 24-C) that is shifted substantially along the tilt axis (20), wherein the viewing angles for the visual distinguishability and the shifts of the motif views (24-A, 24-B, 24-C) of the grating fields (32, 34, 36) are coordinated with each other such that, upon tilting the grating image (30), a motif (24) depiction that moves substantially along the tilt axis (20) is created for the viewer.

摘要翻译： 本发明涉及一种光栅图像（30），用于描绘在倾斜轴（20）倾斜光栅图像（30）时移动的图案（24），该倾斜轴具有两个或多个光栅场（32,34,36） 视角依赖的视觉外观，其每一个都包括由多个光栅线组成的电磁辐射影响光栅图案，并且呈现出确定视角的优选方向，从该视角角度，合适的光栅场（32,34,36 ）在视觉上是可区分的，其中根据本发明，光栅场（32,34,36）由彼此嵌套的多个子区域（32-i，34-i，36-i）形成， 并且每个光栅场（32,34,36）显示基本上沿倾斜轴线（20）移动的图案（24）视图（24-A，24-B，24-C），其中视觉 光栅场（32,34,36）的图案视图（24-A，24-B，24-C）的区别性和偏移量与每个 r，使得在倾斜光栅图像（30）时，为观看者创建基本上沿着倾斜轴线（20）移动的图案（24）描绘。

公开(公告)号：US07986459B2

公开(公告)日：2011-07-26

申请号：US11995228

申请日：2006-07-04

申请人： Wittich Kaule ,  Marius Dichtl

发明人： Wittich Kaule ,  Marius Dichtl

IPC分类号： G02B5/18

CPC分类号： B44F1/10 ,  G02B5/32

摘要： The present invention relates to a grating image (12) for depicting at least one unscreened halftone image having multiple brightness levels, the grating image exhibiting multiple grating fields (22-1, 22-2, 22-3) that include in each case an electromagnetic-radiation-influencing grating pattern composed of a plurality of grating lines and that, when illuminated, produce in each case an areal region of the halftone image having the same brightness level.

摘要翻译： 本发明涉及用于描绘具有多个亮度级别的至少一个未屏蔽半色调图像的光栅图像（12），该光栅图像呈现出多个光栅场（22-1,22-2,22-3），其包括在每种情况下 由多个光栅线组成的电磁辐射影响光栅图案，并且当被照亮时，产生具有相同亮度级别的半色调图像的各个区域。

公开(公告)号：US20100187806A1

公开(公告)日：2010-07-29

申请号：US12601590

申请日：2008-05-27

申请人： Wittich Kaule ,  Wolfgang Rauscher ,  Marius Dichtl

发明人： Wittich Kaule ,  Wolfgang Rauscher ,  Marius Dichtl

IPC分类号： B42D15/00 ,  B26D3/00 ,  B32B3/10 ,  B29C35/08 ,  B32B3/00 ,  B29C45/76

CPC分类号： D05B93/00 ,  B41F19/062 ,  B41M3/14 ,  B42D25/324 ,  B42D25/342 ,  B42D25/355 ,  B42D2035/44 ,  Y10T83/0538 ,  Y10T428/24479 ,  Y10T428/24802

摘要： The present invention relates to a method for manufacturing endless material for security elements having micro-optical moiré magnification arrangements that exhibit a motif grid composed of a plurality of micromotif elements and a focusing element grid composed of a plurality of microfocusing elements for moiré-magnified viewing of the micromotif elements, in which a) a motif grid composed of an at least locally periodic arrangement of micromotif elements in the form of a first one- or two-dimensional lattice is provided, b) a focusing element grid composed of an at least locally periodic arrangement of a plurality of microfocusing elements in the form of a second one- or two-dimensional lattice is provided, c) a pattern repeat of the motif grid and/or of the focusing element grid on the endless material is specified, d) it is checked whether the lattice of the motif grid and/or the lattice of the focusing element grid repeats periodically in the specified pattern repeat, and if this is not the case, a linear transformation is determined that distorts the first and/or the second lattice such that it repeats periodically in the specified pattern repeat, and e) for the further manufacture of the endless material, the motif grid or the focusing element grid is replaced by the motif grid that is distorted by the determined linear transformation, or by the focusing element grid that is distorted by the determined linear transformation.

摘要翻译： 本发明涉及一种用于制造具有微光莫尔放大布置的安全元件的环形材料的方法，其具有由多个微突起元件组成的基体网格和由多个用于莫尔放大观察的多个微聚焦元件组成的聚焦元件网格 的微突起元件，其中a）由至少局部周期性布置的具有第一一维或二维晶格形式的微突起元件组成的图案网格，b）聚焦元件网格由至少包括 提供了以第二单维或二维格子形式的多个微聚焦元件的局部周期性布置，c）指定了在环形材料上的图案网格和/或聚焦元件网格的图案重复，d ）检查图案网格的晶格和/或聚焦元素网格的格子是否以指定图案周期性重复，并且如果thi 不是这样，确定线性变换，其扭曲第一和/或第二晶格，使得其以指定的图案重复周期性地重复，以及e）为了进一步制造环形材料，图案网格或聚焦 元素网格由被确定的线性变换失真的图案网格或被确定的线性变换失真的聚焦元素网格所取代。

公开(公告)号：US08783728B2

公开(公告)日：2014-07-22

申请号：US12601590

申请日：2008-05-27

申请人： Wittich Kaule ,  Wolfgang Rauscher ,  Marius Dichtl

发明人： Wittich Kaule ,  Wolfgang Rauscher ,  Marius Dichtl

IPC分类号： B42D15/00 ,  B42D15/10 ,  B41F19/06 ,  B41M3/14

CPC分类号： D05B93/00 ,  B41F19/062 ,  B41M3/14 ,  B42D25/324 ,  B42D25/342 ,  B42D25/355 ,  B42D2035/44 ,  Y10T83/0538 ,  Y10T428/24479 ,  Y10T428/24802

摘要： An anti-counterfeit printed matter forming an invisible image that can be visualized clearly and prevents a visible image from impeding visibility of a visualized invisible image. In the anti-counterfeit printed matter according to this invention, a plurality of object elements are arranged at a predetermined pitch in a matrix, each object element including a first and second object arranged along a first direction on both sides of a boundary at a center, opposing each other, and third and fourth objects arranged along a second direction perpendicular to the first direction on both sides of a boundary at the center, opposing each other. The first object and the second object, and the third object and the fourth object of each object element have a negative/positive relationship. The first object and/or the second object forms a first invisible image. The third object and/or the fourth object forms a second invisible image.

摘要翻译： 一种形成不可见图像的防伪印刷品，其可以被清楚地可视化并且防止可视图像阻碍可视化的不可见图像的可见性。 在根据本发明的防伪印刷品中，多个物体元素以矩阵形式以预定间距排列，每个物体元件包括沿中心的边界两侧的第一方向布置的第一和第二物体 彼此相对，并且第三和第四物体沿着与第一方向垂直的第二方向在中心的边界的两侧布置，彼此相对。 第一个对象和第二个对象以及每个对象元素的第三个对象和第四个对象都具有负/正的关系。 第一对象和/或第二对象形成第一不可见图像。 第三物体和/或第四物体形成第二不可见图像。