Emulative particle contamination standard fabricated by particulate formation processes
    21.
    发明申请
    Emulative particle contamination standard fabricated by particulate formation processes 审中-公开
    通过颗粒形成过程制造的模拟颗粒污染标准

    公开(公告)号:US20040252298A1

    公开(公告)日:2004-12-16

    申请号:US10460876

    申请日:2003-06-12

    CPC classification number: G01N21/93 G01N15/0211

    Abstract: An emulative particle contamination standard is fabricated using photolithography and semiconductor processes to produce raised features, such as in a thick photoresist layer, to create stable and resilient raised structures that mimic realistic contamination, so as to enable the reproducible production of the emulative particle contamination standards that comprise the raised features of various sizes, shapes, and distribution across a highly reflective surface of an underlying substrate.

    Abstract translation: 使用光刻和半导体工艺制造模拟颗粒污染标准,以产生诸如厚光致抗蚀剂层的凸起特征,以产生模拟现实污染的稳定且有弹性的凸起结构,以便能够重复地产生模拟颗粒污染标准 其包括跨越底层基底的高反射表面的各种尺寸,形状和分布的凸起特征。

    Calibration method for surface texture measuring instrument, calibration program for surface texture measuring instrument, recording medium storing the calibration program and surface texture measuring instrument
    22.
    发明申请
    Calibration method for surface texture measuring instrument, calibration program for surface texture measuring instrument, recording medium storing the calibration program and surface texture measuring instrument 有权
    表面纹理测量仪器的校准方法,表面纹理测量仪器的校准程序,存储校准程序的记录介质和表面纹理测量仪器

    公开(公告)号:US20040223148A1

    公开(公告)日:2004-11-11

    申请号:US10833007

    申请日:2004-04-28

    Inventor: Isamu Takemura

    CPC classification number: G01B5/28 G01B5/20

    Abstract: In a calibration method for a surface texture measuring instrument which measures a surface of a workpiece and includes an arm that is supported to be swingable around a base point thereof and is provided with a contact point at an end for scanning the workpiece surface, the calibration method includes a measurement step for measuring a calibration gauge of which cross section contains a part of a substantially perfect circle, an assignment step for assigning the detection results, which are obtained in the measurement step, in an evaluation formula based on a circle equation in which the center coordinates of the calibration gauge are (xc, zc) and the radius is nullrnull, and a calibration step for calibrating each parameter based on the evaluation formula obtained in the assignment step.

    Abstract translation: 在用于测量工件表面的表面纹理测量仪的校准方法中,包括支撑在其基点附近摆动的臂,并且在用于扫描工件表面的端部设置有接触点,校准 方法包括:测量步骤,用于测量横截面包含基本上完整圆的一部分的校准量规;分配步骤,用于将在测量步骤中获得的检测结果分配在基于圆形方程式的评估公式中 其中校准量规的中心坐标为(xc,zc)且半径为“r”,以及校准步骤,用于基于在分配步骤中获得的评估公式来校准每个参数。

    Spectroscopic system and method using a ceramic optical reference
    23.
    发明申请
    Spectroscopic system and method using a ceramic optical reference 有权
    光谱系统和方法使用陶瓷光学参考

    公开(公告)号:US20040169857A1

    公开(公告)日:2004-09-02

    申请号:US10723353

    申请日:2003-11-25

    Abstract: A ceramic reference in conjunction with a spectrometer, a metallized ceramic material, and a method of utilizing a ceramic material as a reference in the ultraviolet, visible, near-infrared, or infrared spectral regions are presented. The preferred embodiments utilize a ceramic reference material to diffusely reflect incident source light toward a detector element for quantification in a reproducible fashion. Alternative embodiments metallize either the incident surface or back surface of to form a surface diffuse reflectance standard. Optional wavelength reference layers or protective layers may be added to the ceramic or to the metallized layer. The reference ceramic is used to provide a measure of optical signal of an analyzer as a function of the analyzers spatial, temporal, and environmental state.

    Abstract translation: 介绍了陶瓷参考文献,结合光谱仪,金属化陶瓷材料以及在紫外线,可见光,近红外或红外光谱区域中利用陶瓷材料作为参考的方法。 优选实施例利用陶瓷参考材料将入射光源漫反射到检测器元件,以便以可再现的方式进行定量。 替代实施例将入射表面或后表面金属化以形成表面漫反射标准。 可选的波长参考层或保护层可以添加到陶瓷或金属化层。 参考陶瓷用于根据分析仪的空间,时间和环境状态提供分析仪的光信号测量。

    Method and apparatus for calibrating a vision system to a parts handling device
    24.
    发明申请
    Method and apparatus for calibrating a vision system to a parts handling device 失效
    将视觉系统校准到零件处理装置的方法和装置

    公开(公告)号:US20030059100A1

    公开(公告)日:2003-03-27

    申请号:US10102515

    申请日:2002-03-19

    CPC classification number: F16C11/12

    Abstract: A calibration method for calibrating a parts-handling device with respect to a computer vision camera includes the steps of moving a parts-handling device into contact with a touch-off block, and storing a value indicative of the position of the parts-handling device when it is in contact with the touch-off block. In addition, there may be two orthogonal surface on the touch-off block. By touching the parts-handling device against both surfaces, the parts-handling device can be calibrated for position offset in two orthogonal directions. For parts-handling devices that are rotatable, the parts-handling device may be rotated to a succession of predetermined angular positions and brought into contact with the touch-off block in each position. By combining the measured positions of the parts-handling device in each rotational position, the system can be calibrated to compensate for the offset from the camera to the parts-handling device as a function of rotational position as well.

    Abstract translation: 用于校准相对于计算机视觉摄像机的部件处理装置的校准方法包括以下步骤:将部件处理装置移动到与触摸块接触,并且存储指示部件处理装置的位置的值 当它与触发块接触时。 另外,触碰块上可能有两个正交表面。 通过相对于两个表面触摸零件处理装置,可以在两个正交方向上校准零件处理装置的位置偏移。 对于可旋转的零件处理装置,零件处理装置可以旋转到一系列预定的角度位置,并在每个位置与接触块接触。 通过将部件处理装置的测量位置组合在每个旋转位置,可以对系统进行校准,以便根据旋转位置补偿从相机到零件处理装置的偏移。

    Submicron dimensional calibration standards and methods of manufacture and use

    公开(公告)号:US20030058437A1

    公开(公告)日:2003-03-27

    申请号:US09961629

    申请日:2001-09-24

    CPC classification number: G01Q40/02 H01J2237/30444

    Abstract: A calibration standard which may be used to calibrate lateral dimensional measurement systems is provided. The calibration standard may include a first substrate spaced from a second substrate. In addition, the calibration standard may include at least one layer disposed between the first and second substrates. The layer may have a traceably measured thickness. For example, a thickness of the layer may be traceably measured using any measurement technique in which a measurement system may be calibrated with a standard reference material traceable to a national testing authority. The calibration standard may be cross-sectioned in a direction substantially perpendicular to an upper surface of the first substrate. The cross-sectioned portion of the calibration standard may form a viewing surface of the calibration standard. In this manner, a lateral dimensional artifact of the calibration standard may include the traceably measured thickness of at least the one layer.

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