公开(公告)号：US11605616B1

公开(公告)日：2023-03-14

申请号：US17986831

申请日：2022-11-14

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Brian Cronquist

IPC: H01L23/528 ,  H01L25/065 ,  H01L21/768 ,  H01L23/48 ,  H01L23/485 ,  H01L23/522 ,  H01L27/06 ,  H01L29/66 ,  H01L21/74 ,  H01L25/00 ,  H01L23/00 ,  H01L27/088 ,  H01L27/092 ,  H01L29/423 ,  H01L29/78

Abstract: A semiconductor device, the device including: a first silicon layer including a first single crystal silicon; a first metal layer disposed over the first silicon layer; a second metal layer disposed over the first metal layer; a first level including a plurality of transistors, the first level disposed over the second metal layer, where the plurality of transistors include a second single crystal silicon; a third metal layer disposed over the first level; a fourth metal layer disposed over the third metal layer, where the fourth metal layer is aligned to the first metal layer with a less than 40 nm alignment error; and a via disposed through the first level, where the first level thickness is less than two microns.

公开(公告)号：US11600667B1

公开(公告)日：2023-03-07

申请号：US17898475

申请日：2022-08-29

Applicant: Monolithic 3D Inc.

Inventor： Deepak C. Sekar ,  Zvi Or-Bach

IPC: H01L27/24 ,  H01L21/268 ,  H01L21/683 ,  H01L21/762 ,  H01L21/822 ,  H01L21/84 ,  H01L27/06 ,  H01L27/108 ,  H01L27/11 ,  H01L27/11529 ,  H01L27/11551 ,  H01L27/11578 ,  H01L27/12 ,  H01L29/78 ,  H01L29/423 ,  H01L27/22 ,  H01L27/105 ,  H01L27/11526 ,  H01L27/11573 ,  H01L45/00

Abstract: A method for producing a 3D semiconductor device including: providing a first level, the first level including a first single crystal layer; forming first alignment marks and control circuits in and/or on the first level, where the control circuits include first single crystal transistors and at least two interconnection metal layers; forming at least one second level disposed above the control circuits; performing a first etch step into the second level; forming at least one third level disposed on top of the second level; performing additional processing steps to form first memory cells within the second level and second memory cells within the third level, where each of the first memory cells include at least one second transistor, where each of the second memory cells include at least one third transistor, performing bonding of the first level to the second level, where the bonding includes oxide to oxide bonding.

公开(公告)号：US20230041344A1

公开(公告)日：2023-02-09

申请号：US17947752

申请日：2022-09-19

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Jin-Woo Han ,  Brian Cronquist ,  Eli Lusky

IPC: H01L25/065 ,  H01L23/00 ,  H01L25/18

Abstract: A 3D device, the device including: at least a first level including logic circuits; and at least a second level bonded to the first level, where the second level includes a plurality of transistors, where the device include connectivity structures, where the connectivity structures include at least one of the following: a. differential signaling, or b. radio frequency transmission lines, or c. Surface Waves Interconnect (SWI) lines, and where the bonded includes oxide to oxide bond regions and metal to metal bond regions.

公开(公告)号：US20230019049A1

公开(公告)日：2023-01-19

申请号：US17945459

申请日：2022-09-15

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Brian Cronquist ,  Deepak C. Sekar

IPC: H01L21/683 ,  H01L21/74 ,  H01L21/762 ,  H01L21/768 ,  H01L21/822 ,  H01L21/8238 ,  H01L21/84 ,  H01L23/48 ,  H01L23/525 ,  H01L27/02 ,  H01L27/06 ,  H01L27/092 ,  H01L27/10 ,  H01L27/105 ,  H01L27/108 ,  H01L27/11 ,  H01L27/112 ,  H01L27/11526 ,  H01L27/11529 ,  H01L27/11551 ,  H01L27/11573 ,  H01L27/11578 ,  H01L27/118 ,  H01L27/12 ,  H01L29/423 ,  H01L29/66 ,  H01L29/78 ,  H01L29/788 ,  H01L29/792 ,  G11C8/16

Abstract: A 3D semiconductor device including: a first single crystal layer with first transistors; overlaid by a first metal layer; a second metal layer overlaying the first metal layer and being overlaid by a third metal layer; a logic gates including at least the first metal layer interconnecting the first transistors; second transistors disposed atop the third metal layer; third transistors disposed atop the second transistors; a top metal layer disposed atop the third transistors; and a memory array including word-lines, and at least four memory mini arrays, where each of the memory mini arrays includes at least four rows by four columns of memory cells, where each of the memory cells includes at least one of the second transistors or third transistors, sense amplifier circuit(s) for each of the memory mini arrays, the second metal layer provides a greater current carrying capacity than the third metal layer.

公开(公告)号：US20230017372A1

公开(公告)日：2023-01-19

申请号：US17951545

申请日：2022-09-23

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Deepak C. Sekar ,  Brian Cronquist

IPC: H01L27/146 ,  H01L23/544 ,  H01L23/00 ,  H04N5/372 ,  H04N5/378 ,  H04N5/369

Abstract: An integrated device, the device including: a first level including a first mono-crystal layer, the first mono-crystal layer including a plurality of single crystal transistors; an overlying oxide disposed on top of the first level; a second level including a second mono-crystal layer, the second level overlaying the oxide, where the second mono-crystal layer includes a plurality of semiconductor devices; a third level overlaying the second level, where the third level includes a plurality of image sensors, where the first level includes a plurality of landing pads, where the second level is bonded to the first level, where the bonded includes an oxide to oxide bond; and an isolation layer disposed between the second mono-crystal layer and the third level.

公开(公告)号：US20230012640A1

公开(公告)日：2023-01-19

申请号：US17953211

申请日：2022-09-26

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Zeev Wurman

IPC: G06F30/392 ,  G06F30/394

Abstract: A method of designing a 3D Integrated Circuit including: partitioning at least one design into at least two levels, a first level and a second level, where the first level includes logic and the second level includes memory; and then obtaining a first placement of at least portion of the second level, where the first placement includes placement of a first memory array, where the Circuit includes a plurality of connections between the first level and the second level; and performing a second placement, where performing the second placement includes placing the first logic circuit based on the first placement of the first memory array, where the performing a second placement includes using a placer executed by a computer, where the placer is a part of a Computer Aided Design tool, and where the logic includes a first logic circuit configured to read data from the first memory array.

公开(公告)号：US11527416B2

公开(公告)日：2022-12-13

申请号：US17846010

申请日：2022-06-22

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Brian Cronquist ,  Deepak Sekar

IPC: H01L23/498 ,  H01L21/48 ,  H01L23/34 ,  H01L27/02 ,  H01L21/8234 ,  H01L27/06 ,  H01L27/098 ,  H01L23/522 ,  H01L23/367 ,  H01L27/092 ,  H01L25/00 ,  H01L23/60 ,  H01L25/065 ,  H01L23/373

Abstract: A method for producing a 3D semiconductor device: providing a first level with a first single crystal layer; forming a plurality of first transistors in and/or on the first level with a first metal layer above; forming a second metal layer above the first metal layer; forming a third metal layer above the second metal layer; forming at least one second level on top of or above the third metal layer; performing a first etch step; performing additional processing steps to form a plurality of second transistors within the second level; forming a fourth metal layer above; forming a connection to the second metal layer which includes a via through the second level; forming a fifth metal layer above, where some second transistors include a metal gate, and the fifth metal layer thickness is at least 50% greater than the second metal layer thickness.

公开(公告)号：US11508605B2

公开(公告)日：2022-11-22

申请号：US17734867

申请日：2022-05-02

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Brian Cronquist ,  Deepak C. Sekar

IPC: H01L21/336 ,  H01L21/683 ,  H01L21/74 ,  H01L21/762 ,  H01L21/768 ,  H01L21/822 ,  H01L21/8238 ,  H01L21/84 ,  H01L23/48 ,  H01L23/525 ,  H01L27/02 ,  H01L27/06 ,  H01L27/092 ,  H01L27/10 ,  H01L27/105 ,  H01L27/108 ,  H01L27/11 ,  H01L27/112 ,  H01L27/11526 ,  H01L27/11529 ,  H01L27/11551 ,  H01L27/11573 ,  H01L27/11578 ,  H01L27/118 ,  H01L27/12 ,  H01L29/423 ,  H01L29/66 ,  H01L29/78 ,  H01L29/788 ,  H01L29/792 ,  H01L23/367 ,  H01L25/065 ,  H01L25/00 ,  H01L23/00

Abstract: A 3D semiconductor device including: a first single crystal layer including a plurality of first transistors and a first metal layer, where a second metal layer is disposed atop the first metal layer; a plurality of logic gates including the first metal layer and first transistors; a plurality of second transistors disposed atop the second metal layer; a plurality of third transistors disposed atop the second transistors; a top metal layer disposed atop the third transistors; and a memory array including word-lines, where the memory array includes at least four memory mini arrays, where each of the mini arrays includes at least two rows by two columns of memory cells, where each memory cell includes one of the second transistors or one of the third transistors, and where one of the second transistors is self-aligned to one of the third transistors, being processed following a same lithography step.

公开(公告)号：US11495484B2

公开(公告)日：2022-11-08

申请号：US17566690

申请日：2021-12-31

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Brian Cronquist ,  Deepak C. Sekar

IPC: H01L23/48 ,  H01L23/525 ,  H01L27/02 ,  H01L27/06 ,  H01L27/092 ,  H01L27/10 ,  H01L27/105 ,  H01L27/108 ,  H01L27/11 ,  H01L27/112 ,  H01L21/683 ,  H01L21/74 ,  H01L21/762 ,  H01L21/768 ,  H01L21/822 ,  H01L21/8238 ,  H01L21/84 ,  H01L27/11526 ,  H01L27/11529 ,  H01L27/11551 ,  H01L27/11573 ,  H01L27/11578 ,  H01L27/118 ,  H01L27/12 ,  H01L29/423 ,  H01L29/66 ,  H01L29/78 ,  H01L29/788 ,  H01L29/792 ,  G11C8/16 ,  H01L23/367 ,  H01L25/065 ,  H01L25/00 ,  H01L23/00

Abstract: A 3D semiconductor device, the device including: a first level including a first single crystal layer, the first level including first transistors, where the first transistors each include a single crystal channel; first metal layers interconnecting at least the first transistors; and a second level including a second single crystal layer, the second level including second transistors, where the second level overlays the first level, where the second level is bonded to the first level, where the bonded includes oxide to oxide bonds, where the second transistors each include at least two side-gates, and where through the first metal layers power is provided to at least one of the second transistors.

公开(公告)号：US11482540B2

公开(公告)日：2022-10-25

申请号：US17681767

申请日：2022-02-26

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Jin-Woo Han ,  Eli Lusky

IPC: H01L27/11 ,  H01L27/11582 ,  H01L23/522 ,  H01L27/11573 ,  H01L27/1157

Abstract: A 3D memory device, the device comprising: a plurality of memory cells, wherein each memory cell of said plurality of memory cells comprises at least one memory transistor, wherein each of said at least one memory transistor comprises a source, a drain, and a channel; a plurality of bit-line pillars, wherein each bit-line pillar of said plurality of bit-line pillars is directly connected to a plurality of said source or said drain, wherein said bit-line pillars are vertically oriented, wherein said channel is horizontally oriented, wherein said plurality of memory cells comprise a partially or fully metalized source, and/or, a partially or fully metalized drain, and wherein said plurality of bit-line pillars comprise a thermally conductive path from said plurality of memory cells to an external surface of said device.