公开(公告)号：US09928997B2

公开(公告)日：2018-03-27

申请号：US14616895

申请日：2015-02-09

Applicant: APPLIED MATERIALS, INC.

Inventor： Keith A. Miller ,  Thanh X. Nguyen ,  Ilya Lavitsky ,  Randy Schmieding ,  Prashanth Kothnur

IPC: H01J37/34 ,  C23C14/34 ,  C23C14/35

CPC classification number: H01J37/3452 ,  C23C14/345 ,  C23C14/3485 ,  C23C14/352 ,  H01J37/3408 ,  H01J37/3417 ,  H01J37/3467

Abstract: Apparatus for physical vapor deposition of dielectric material is provided herein. In some embodiments, a chamber lid of a physical vapor deposition chamber includes an inner magnetron assembly coupled to an inner target assembly, and an outer magnet assembly coupled to an outer target assembly, wherein the inner magnetron assembly and the inner target assembly are electrically isolated from the outer magnet assembly and the outer target assembly.