公开(公告)号：US20150079508A1

公开(公告)日：2015-03-19

申请号：US14550181

申请日：2014-11-21

Applicant: FUJIFILM Corporation

Inventor： Junichi ITO ,  Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Kei YAMAMOTO

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/22 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/32 ,  G03F7/325 ,  G03F7/40 ,  H01L21/027 ,  H01L21/0273

Abstract: There is provided a pattern forming method comprising (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition; (ii) a step of exposing the film; and (iii) a step of performing development by using a developer containing an organic solvent to form a negative pattern, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin capable of increasing the polarity by an action of an acid to decrease the solubility in a developer containing an organic solvent, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin having a repeating unit having a fluorine atom and not having a CF3 partial structure.

Abstract translation: 提供了一种图案形成方法，其包括（i）通过光化射线敏感或辐射敏感树脂组合物形成膜的步骤; （ii）曝光胶片的步骤; （iii）通过使用含有有机溶剂的显影剂形成负型图案进行显影的工序，其中，所述光化射线敏感性或辐射敏感性树脂组合物含有（A）能够通过 降低在含有有机溶剂的显影剂中的溶解性的酸，（B）在用光化射线或辐射照射时能够产生酸的化合物，（C）溶剂，（D）具有重复单元的树脂， 不具有CF 3部分结构的氟原子。

公开(公告)号：US20140141360A1

公开(公告)日：2014-05-22

申请号：US14164389

申请日：2014-01-27

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Michihiro SHIRAKAWA ,  Fumihiro YOSHINO

IPC: G03F7/038

CPC classification number: G03F7/0382 ,  C08F20/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit represented by the following formula (I) or (II) as defined in the specification in an amount of 20 mol % or more based on all repeating units in the resin (P) and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, so as to form an exposed film; and (iii) a step of developing the exposed film by using a developer containing an organic solvent to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）从含有（P）具有（a1）由下式（I）表示的重复单元的树脂或（a1）由下式（I）表示的重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤， （II），基于树脂（P）中的所有重复单元为20摩尔％以上，（B）在光化射线或辐射照射时能够产生酸的化合物; （ii）曝光胶片的步骤，以形成曝光胶片; 和（iii）通过使用包含有机溶剂的显影剂形成负图案来显影所述曝光的薄膜的步骤。