公开(公告)号：US06905570B2

公开(公告)日：2005-06-14

申请号：US10627565

申请日：2003-07-24

申请人： Kwang-Shin Lim ,  Pil-Kwon Jun ,  Hun-Jung Yi ,  Sang-Oh Park ,  Yong-Kyun Ko

发明人： Kwang-Shin Lim ,  Pil-Kwon Jun ,  Hun-Jung Yi ,  Sang-Oh Park ,  Yong-Kyun Ko

IPC分类号： B65G49/04 ,  B65G49/07 ,  H01L21/304 ,  H01L21/673 ,  H01L21/677 ,  H01L21/687 ,  B08B7/02 ,  H01L21/22

CPC分类号： H01L21/67313 ,  H01L21/67326 ,  H01L21/68707

摘要： An apparatus includes a chamber for containing a fluid, a guide seated in the chamber, and a transfer robot for loading and/or unloading a plurality of wafers to and/or from the guide. The wafers are located on the guide. The guide has a supporting member for supporting a wafer and a stopper member for preventing the wafer from being inclined over a predetermined range. The stopper member is in contact with a wafer edge disposed at a higher position than a wafer edge supported by the supporting member. A wafer guide has a stopper member to prevent adjacent wafers from being inclined and coming in contact with each other. Therefore, it is possible to suppress a poor drying such as water spots (or watermarks) produced when wafers are adhered to each other in a drying process.

摘要翻译： 一种装置包括用于容纳流体的腔室，位于腔室中的导向器和用于将多个晶片装载和/或从该引导件卸载的传送机器人。 晶片位于导轨上。 引导件具有用于支撑晶片的支撑构件和用于防止晶片倾斜超过预定范围的止动构件。 止动构件与设置在比由支撑构件支撑的晶片边缘更高的位置处的晶片边缘接触。 晶片引导件具有阻止相邻晶片倾斜并彼此接触的止动件。 因此，可以抑制在干燥过程中晶片彼此粘附时产生的水斑（或水印）等干燥不良。

公开(公告)号：US06883248B2

公开(公告)日：2005-04-26

申请号：US10635458

申请日：2003-08-07

申请人： Yong-Kyun Ko ,  Jae-Jun Ryu ,  Hun-Jung Yi ,  Pil-Kwon Jun

发明人： Yong-Kyun Ko ,  Jae-Jun Ryu ,  Hun-Jung Yi ,  Pil-Kwon Jun

IPC分类号： H01L21/304 ,  H01L21/00 ,  F26B21/06

CPC分类号： H01L21/67034

摘要： An apparatus for drying a substrate using an isopropyl alcohol vapor includes a container for receiving an isopropyl alcohol vapor to dry a plurality of substrates wherein an opening is vertically formed through an upper portion of the container to permit the loading and unloading of the substrates; a supporting member for supporting the plurality of substrates in the container in a vertical direction and for supporting the substrates side by side in a horizontal direction, wherein the supporting member extends through the container and through the opening; and a cover for obstructing a flow of clean air from flowing directly from an air cleaner disposed over the container into the container through the opening. In addition, the apparatus may include an inert gas supplying member to supply an inert gas onto the substrates to prevent native oxide films from forming on the substrates.

摘要翻译： 使用异丙醇蒸气干燥基材的装置包括：用于接收异丙醇蒸气以干燥多个基板的容器，其中通过容器的上部垂直形成开口以允许基板的装载和卸载; 支撑部件，用于在垂直方向上支撑容器中的多个基板，并且用于在水平方向上并排地支撑基板，其中支撑部件延伸穿过容器并穿过开口; 以及用于阻挡清洁空气的流动的盖子，其通过开口直接从设置在容器上的空气滤清器流入容器。 此外，该装置可以包括惰性气体供应构件，以在衬底上提供惰性气体，以防止在衬底上形成自然氧化膜。

公开(公告)号：US20050045208A1

公开(公告)日：2005-03-03

申请号：US10891110

申请日：2004-07-15

申请人： Sang-Oh Park ,  Hun-Jung Yi

发明人： Sang-Oh Park ,  Hun-Jung Yi

IPC分类号： H01L21/304 ,  B08B3/02 ,  B08B3/04 ,  B08B3/10 ,  F26B5/16 ,  H01L21/00 ,  H01L21/302 ,  H01L21/306

CPC分类号： H01L21/02052 ,  B08B3/048 ,  B08B3/102 ,  H01L21/67028 ,  H01L21/67034

摘要： A method of and apparatus for cleaning semiconductor substrates prevents the drying fluid used to dry the substrates from condensing. The apparatus has a chamber having an exhaust port that defines a path along which the drying fluid, e.g., IPA vapor, is exhausted. The degree to which the exhaust path is opened is regulated according to the pressure within the chamber.

摘要翻译： 用于清洁半导体衬底的方法和设备防止用于干燥衬底的干燥流体冷凝。 该设备具有一个具有排气口的室，该排气口限定了干燥流体例如IPA蒸汽排出的路径。 根据室内的压力来调节排气路径的打开程度。