Abstract:
A delay locked loop for generating an internal clock signal locked to an external clock signal includes: a phase detector for detecting a phase difference between the external clock signal and the internal clock signal; a delay unit controller for generating a control signal and a selection signal in response to an output signal of the phase detector; a variable delay device (VDD), responsive to the control signal and a selection signal, to produce a delayed version of the external clock signal on a VDD output line, the variable delay device being configured such that, if the external clock signal undergoes a change from a first frequency to a second frequency significantly different than the first frequency, then a resultant load on the VDD output line nonetheless remains substantially the same.
Abstract:
Disclosed are an image sensor module of a camera and an assembling method thereof capable of simultaneously bonding a circuit pattern and an infrared ray filter to an upper surface of a circuit board section. The image sensor module has the circuit board section including a bonding part made of transparent material. The circuit board section has an upper surface onto which the circuit pattern and the infrared ray filter are simultaneously bonded. An image sensor chip is bonded to a lower surface of the circuit board section using a flip chip bonding technique. A lens holder is bonded to the upper surface of the circuit board section using an epoxy bonding process. A lens assembly is bonded to an upper surface of the lens holder using the epoxy bonding process.
Abstract:
A method for fabricating a semiconductor device to reduce the contact resistance by enhancing the surface concentration of doped polysilicon in a semiconductor substrate divided into active and field regions, comprises the steps of forming a plurality of word lines each having a cap insulating layer with a predetermined interval between adjacent word lines on the substrate, forming source/drain impurity regions in the active regions adjacent to both sides of each of the word lines, forming insulating sidewalls on both sides of each of the word lines, forming capacitor node plugs and bit line contact plugs on the source/drain impurity regions, forming a plurality of bit lines in the direction perpendicular to the word lines with a predetermined interval between adjacent bit lines by forming bit line contact holes contacting the bit line contact plugs in a first insulating interlayer deposited on the substrate, forming storage electrode contact holes to expose the capacitor node plugs in a second insulating interlayer deposited over the substrate, and subjecting the storage electrode contact holes to heat treatment before implanting impurity ions through the storage electrode contact holes into the active regions to grow the storage electrodes.