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公开(公告)号:US11424239B2
公开(公告)日:2022-08-23
申请号:US16724257
申请日:2019-12-21
Applicant: Intel Corporation
Inventor: Aleksandar Aleksov , Adel A. Elsherbini , Feras Eid , Veronica Aleman Strong , Johanna M. Swan
IPC: H01L27/02 , H01L29/872
Abstract: Embodiments may relate to a package substrate that is to couple with the die. The package substrate may include a signal line that is communicatively coupled with the die. The package substrate may further include a conductive line. The package substrate may further include a diode communicatively coupled with the signal line and the conductive line. Other embodiments may be described or claimed.
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公开(公告)号:US20220181276A1
公开(公告)日:2022-06-09
申请号:US17677877
申请日:2022-02-22
Applicant: Intel Corporation
Inventor: Adel A. Elsherbini , Feras Eid , Johanna M. Swan , Aleksandar Aleksov , Veronica Aleman Strong
IPC: H01L23/60 , H01L23/48 , H01L27/02 , H01L23/00 , H01L23/498
Abstract: Disclosed herein are structures, devices, and methods for electrostatic discharge protection (ESDP) in integrated circuits (ICs). For example, in some embodiments, an IC package support may include: a first conductive structure in a dielectric material; a second conductive structure in the dielectric material; and a material in contact with the first conductive structure and the second conductive structure, wherein the material includes a polymer, and the material is different from the dielectric material. The material may act as a dielectric material below a trigger voltage, and as a conductive material above the trigger voltage.
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公开(公告)号:US11289431B2
公开(公告)日:2022-03-29
申请号:US16728127
申请日:2019-12-27
Applicant: Intel Corporation
Inventor: Feras Eid , Veronica Aleman Strong , Aleksandar Aleksov , Adel A. Elsherbini , Johanna M. Swan
IPC: H01L23/495 , H01L23/60 , H01L23/498 , H01L25/16 , H01L23/538 , H01L25/065
Abstract: Disclosed herein are structures, devices, and methods for electrostatic discharge protection (ESDP) in integrated circuits (ICs). In some embodiments, an IC component may include: a first conductive structure; a second conductive structure; and a material in contact with the first conductive structure and the second conductive structure, wherein the material has a first electrical conductivity before illumination of the material with optical radiation and a second electrical conductivity, different from the first electrical conductivity, after illumination of the material with optical radiation.
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公开(公告)号:US11264373B2
公开(公告)日:2022-03-01
申请号:US16724259
申请日:2019-12-21
Applicant: Intel Corporation
Inventor: Aleksandar Aleksov , Adel A. Elsherbini , Feras Eid , Veronica Aleman Strong , Johanna M. Swan
IPC: H01L27/02 , H01L23/528 , H01L29/24 , H01L29/861 , H01L29/47 , H01L29/872 , H01L29/45
Abstract: Embodiments may relate to a die with a front-end and a backend. The front-end may include a transistor. The backend may include a signal line, a conductive line, and a diode that is communicatively coupled with the signal line and the conductive line. Other embodiments may be described or claimed.
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公开(公告)号:US11147197B2
公开(公告)日:2021-10-12
申请号:US16659459
申请日:2019-10-21
Applicant: Intel Corporation
Inventor: Veronica Aleman Strong , Johanna M. Swan , Aleksandar Aleksov , Adel A. Elsherbini , Feras Eid
Abstract: Embodiments may relate to a material to provide electrostatic discharge (ESD) protection in an electrical device. The material may include first and second electrically-conductive carbon allotropes. The material may further include an electrically-conductive polymer that is chemically bonded to the first and second electrically-conductive carbon allotropes such that an electrical signal may pass between the first and second electrically-conductive carbon allotropes. Other embodiments may be described or claimed.
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公开(公告)号:US20210287979A1
公开(公告)日:2021-09-16
申请号:US16817309
申请日:2020-03-12
Applicant: Intel Corporation
Inventor: Veronica Aleman Strong , Henning Braunisch , Hiroki Tanaka , Haobo Chen
IPC: H01L23/498
Abstract: Embodiments may relate to a microelectronic package with an interconnect stack that includes a cavity therein. The cavity may include a dielectric material with a dielectric value less than 3.9. The microelectronic package may further include first and second conductive elements in the cavity, with the dielectric material positioned therebetween. Other embodiments may be described or claimed.
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