公开(公告)号：US20150324963A1

公开(公告)日：2015-11-12

申请号：US14702336

申请日：2015-05-01

Applicant: KLA-Tencor Corporation

Inventor： Abdurrahman Sezginer ,  Rui-fang Shi

IPC: G06T7/00 ,  G01N21/88 ,  G01N21/956 ,  G01N21/95

CPC classification number: G06T7/00 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8887 ,  G01N2021/95676 ,  G01N2201/06113 ,  G01N2201/10 ,  G01N2201/12 ,  G06T7/0008 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148

Abstract: Systems and methods for detecting defects on a reticle are provided. The embodiments include generating and/or using a data structure that includes pairs of predetermined segments of a reticle pattern and corresponding near-field data. The near-field data for the predetermined segments may be determined by regression based on actual image(s) of a reticle generated by a detector of a reticle inspection system. Inspecting a reticle may then include separately comparing two or more segments of a pattern included in an inspection area on the reticle to the predetermined segments and assigning near-field data to at least one of the segments based on the predetermined segment to which it is most similar. The assigned near-field data can then be used to simulate an image that would be formed for the reticle by the detector, which can be compared to an actual image generated by the detector for defect detection.

Abstract translation: 提供了用于检测掩模版上的缺陷的系统和方法。 实施例包括生成和/或使用包括标线图案的预定片段对和对应的近场数据的数据结构。 用于预定段的近场数据可以通过基于由掩模版检查系统的检测器产生的掩模版的实际图像的回归来确定。 然后检查掩模版可以包括单独地将掩模版上的检查区域中包括的图案的两个或多个段与预定的段进行比较，并且基于其最大的预定段将近场数据分配给至少一个段 类似。 所分配的近场数据然后可以用于模拟由检测器为掩模版形成的图像，其可以与由检测器生成的用于缺陷检测的实际图像进行比较。

公开(公告)号：US20150103351A1

公开(公告)日：2015-04-16

申请号：US14381304

申请日：2013-03-07

Applicant: KLA-Tencor Corporation

Inventor： Carl E. Hess ,  Rui-fang Shi

IPC: G01N21/95 ,  G01M11/00

CPC classification number: G01N21/95 ,  G01M11/00 ,  G01N21/95607 ,  G01N2021/9511 ,  G01N2021/95676 ,  G01N2201/06113 ,  G01N2201/062 ,  G01N2201/10 ,  G03F1/84

Abstract: An optical reticle inspection tool is used during an inspection to obtain, for each local area, an average of multiple reflected intensity values corresponding to light reflected from a plurality of sub-areas of each local area of the reticle. The optical reticle inspection tool is also used during the inspection to obtain, for each local area, an average of multiple transmitted intensity values corresponding to light transmitted through the sub-areas of each local area of the reticle. A combined intensity map is generated by combining, for each local area, the average of multiple reflected intensity values and the average of multiple transmitted intensity values such that a reticle pattern of the reticle is cancelled from the combined intensity map if the reticle has not degraded and such that the reticle pattern of the reticle is not cancelled out of the combined intensity map if the reticle has degraded.

Abstract translation: 在检查期间使用光学掩模版检查工具，以针对每个局部区域获得对应于从掩模版的每个局部区域的多个子区域反射的光的多个反射强度值的平均值。 在检查期间还使用光学掩模版检查工具，以对于每个局部区域获得对应于透过分划板的每个局部区域的子区域的光的多个透射强度值的平均值。 通过对于每个局部区域组合多个反射强度值的平均值和多个透射强度值的平均值来产生组合强度图，使得如果标线没有退化，则从组合强度图中取消掩模版的掩模版图案 并且如果掩模版已劣化，则掩模版的掩模版图案不会从组合强度图中抵消。

公开(公告)号：US20150005917A1

公开(公告)日：2015-01-01

申请号：US14370101

申请日：2012-10-01

Applicant: KLA-Tencor Corporation

Inventor： Lih-Huah Yiin ,  Venkatraman K. Iyer ,  Rui-fang Shi

IPC: G05B19/418 ,  G06F17/30

CPC classification number: G05B19/41875 ,  G03F1/36 ,  G03F1/44 ,  G03F1/84 ,  G05B2219/31304 ,  G06F17/30587

Abstract: A method embodiment includes providing a reticle design data that specify a plurality of printable features that are formed on the wafer using the reticle and a plurality of nonprintable features that are not formed on the wafer using such reticle, wherein the reticle design data is usable to fabricate the reticle. A reduced design database is generated from the reticle design data and this reduced design database includes a description or map of the nonprintable features of the reticle, a description or map of a plurality of cell-to-cell regions of the reticle, and a grayscale reticle image that is rasterized from the reticle design data. The reduced design database, along with the reticle, is transferred to a fabrication facility so that the reduced design database is usable to periodically inspect the reticle in the fabrication facility.

Abstract translation: 一种方法实施例包括提供一种掩模版设计数据，其使用所述掩模版指定在所述晶片上形成的多个可打印特征，以及使用所述掩模版未在所述晶片上形成的多个不可打印特征，其中所述标线设计数据可用于 制作掩模版。 从掩模版设计数据生成缩减的设计数据库，并且该缩减的设计数据库包括掩模版的不可打印特征的描述或图，掩模版的多个单元到单元区域的描述或映射，以及灰度 光栅图案，从光栅设计数据光栅化。 减少的设计数据库以及掩模版被传送到制造设施，使得减少的设计数据库可用于周期性地检查制造设备中的掩模版。