摘要:
A positive photosensitive composition comprising (A1) a compound that generates an aromatic sulfonic acid substituted with at least one fluorine atom and/or a group having at least one fluorine atom upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a compound that has at least three hydroxy or substituted hydroxy groups and at least one cyclic structure or (A2) an onium salt of an alkanesulfonic acid in which the α-position of the sulfonic acid is not substituted with a fluorine atom and/or an onium salt of a carboxylic acid.
摘要:
A manufacturing method for a horizontal electric field type liquid crystal display device of fringe field switching (FFS) or the like mode whereby pixel electrodes and a common electrode are disposed opposing each other on a planarization layer with an insulator interposed, includes a step whereby a planarization layer 18 is formed that has openings formed therein at the positions where contact holes 21a are to be formed in the surface of a passivation layer 17, and the portions of such planarization layer at the periphery of the display area are removed, followed by a step whereby the exposed portions of the passivation layer 17 are removed using a fluorine etching gas. By employing such method, the size of the contact hole 21a mouths can be rendered smaller, and also the number of manufacturing processes can be reduced, compared to the related art.
摘要:
A positive resist composition comprises: (A) a resin having an aliphatic cyclic hydrocarbon group and increasing the solubility to an alkali developer by the action of an acid; (B) a compound generating an acid upon irradiation with an actinic ray or radiation; and (C) a nitrogen-containing compound having in the molecule at least one partial structure represented by following formula (I).