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    Positive photosensitive composition
    1.
    发明授权
    Positive photosensitive composition 有权
    正光敏组合物

    公开(公告)号：US07214465B2

    公开(公告)日：2007-05-08

    申请号：US10338737

    申请日：2003-01-09

    申请人： Hajime Nakao ,  Yasumasa Kawabe ,  Toru Fujimori ,  Kunihiko Kodama

    发明人： Hajime Nakao ,  Yasumasa Kawabe ,  Toru Fujimori ,  Kunihiko Kodama

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0045 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

    摘要： A positive photosensitive composition comprising (A1) a compound that generates an aromatic sulfonic acid substituted with at least one fluorine atom and/or a group having at least one fluorine atom upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a compound that has at least three hydroxy or substituted hydroxy groups and at least one cyclic structure or (A2) an onium salt of an alkanesulfonic acid in which the α-position of the sulfonic acid is not substituted with a fluorine atom and/or an onium salt of a carboxylic acid.

    摘要翻译： 一种正型感光性组合物，其包含（A1）在光化射线或辐射照射时产生被至少一个氟原子取代的芳香族磺​​酸和/或具有至少一个氟原子的基团的化合物，（B）具有 单环或多环脂环族烃结构，并通过酸的作用分解以提高在碱性显影液中的溶解度，（C）具有至少三个羟基或取代羟基和至少一个环状结构的化合物或（A2 ）其中磺酸的α-位没有被氟原子和/或羧酸的鎓盐取代的烷基磺酸的鎓盐。

    Positive-working photoresist composition
    2.
    发明授权
    Positive-working photoresist composition 有权
    正光刻胶组合物

    公开(公告)号：US06596458B1

    公开(公告)日：2003-07-22

    申请号：US09563436

    申请日：2000-05-03

    申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai ,  Yasumasa Kawabe

    发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai ,  Yasumasa Kawabe

    IPC分类号： G03F7039

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/111

    摘要： Disclosed is a positive-working photoresist composition having reduced development defects, and excellent in resist pattern profiles and in the resolving power of contact holes, which comprises (i) a compound generating an acid by irradiation of active light or radiation, and (ii) a resin containing repeating units of at least one kind selected from the group consisting of (a) repeating units having alkali-soluble groups each protected with at least one group selected from the group consisting of groups containing alicyclic hydrocarbon structures represented by specific general formulas (pI) to (pVI), (b) repeating units represented by specific general formula (II) and (c) repeating units represented by specific general formulas (III-a) to (III-d), and decomposed by the action of an acid to increase the solubility of the resin into an alkali.

    摘要翻译： 公开了具有减少的显影缺陷，抗蚀剂图案轮廓和接触孔分辨能力优异的正性光致抗蚀剂组合物，其包括（i）通过活性光或辐射的照射产生酸的化合物，和（ii） 含有重复单元的树脂，所述重复单元选自（a）具有碱溶性基团的重复单元，各自被至少一个选自由特定通式表示的脂环族烃结构的基团所选择的基团保护的基团 pI）至（pVI），（b）由特定通式（II）表示的重复单元和（c）由特定通式（III-a）至（III-d）表示的重复单元，并通过 酸以增加树脂在碱中的溶解度。

    Positive photoresist composition
    3.
    发明授权
    Positive photoresist composition 失效
    正光致抗蚀剂组合物

    公开(公告)号：US5629128A

    公开(公告)日：1997-05-13

    申请号：US531081

    申请日：1995-09-20

    申请人： Koji Shirakawa ,  Kenichiro Sato ,  Kunihiko Kodama ,  Yasumasa Kawabe ,  Shinji Sakaguchi

    发明人： Koji Shirakawa ,  Kenichiro Sato ,  Kunihiko Kodama ,  Yasumasa Kawabe ,  Shinji Sakaguchi

    IPC分类号： G03F7/022 ,  H01L21/027 ,  G03F7/023

    CPC分类号： G03F7/022

    摘要： A positive photoresist composition is described, which comprises an alkali-soluble resin and 1,2-naphthoquinone-diazido-5-(and/or -4-)sulfonate of a polyhydroxy compound represented by the following formula (I): ##STR1## wherein R.sub.1 to R.sub.11 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxyl group, an acyl group or a cycloalkyl group, provided that at least one of R.sub.1 to R.sub.11 is a cycloalkyl group; A represents -CH(R.sub.12)-, in which R.sub.12 represents a hydrogen atom or an alkyl group; and m represents 2 or 3.

    摘要翻译： 描述了一种正型光致抗蚀剂组合物，其包含由下式（I）表示的多羟基化合物的碱溶性树脂和1,2-萘醌 - 二叠氮基-5-（和/或-4-）磺酸盐： （I）其中R 1至R 11相同或不同，并且各自表示氢原子，卤素原子，烷基，芳基，烷氧基，酰基或环烷基，条件是R 1至R 11中的至少一个 R11为环烷基; A表示-CH（R 12） - ，其中R 12表示氢原子或烷基; m表示2或3。

    Positive photosensitive composition
    4.
    发明授权
    Positive photosensitive composition 有权
    正光敏组合物

    公开(公告)号：US06699635B1

    公开(公告)日：2004-03-02

    申请号：US09471007

    申请日：1999-12-23

    申请人： Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai ,  Yasumasa Kawabe

    发明人： Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai ,  Yasumasa Kawabe

    IPC分类号： G03F7004

    CPC分类号： G03F7/0048 ,  G03F7/0397 ,  Y10S430/106

    摘要： A positive photosensitive composition suitable for resist pattern formation under exposure to far ultraviolet light of wavelengths of 250 nm or shorter, particularly 220 nm or shorther, comprising: (A) a resin comprising constitutional repeating units wherein particular ring structures are present and having groups capable of decomposing under the action of an acid to cause an increase of the solubility in an alkali developer, (B) a photo-acid generator capable of generating an acid upon irradiation with actinic rays or radiation, and (C) a fluorine-containing surfactant, a silicon-containing surfactant or a mixture thereof.

    摘要翻译： 适合于在暴露于波长为250nm或更短，特别是220nm或更短的远紫外光下的抗蚀剂图案形成的正性感光性组合物，其包含：（A）包含结构重复单元的树脂，其中存在特定的环结构并具有基团 在酸的作用下分解，导致碱显影剂溶解度的增加，（B）能够在用光化学射线或辐射照射时产生酸的光酸发生剂，（C）含氟表面活性剂 ，含硅表面活性剂或其混合物。

    Positive photoresist composition for far ultraviolet exposure
    6.
    发明授权
    Positive photoresist composition for far ultraviolet exposure 有权
    用于远紫外线曝光的正光致抗蚀剂组合物

    公开(公告)号：US06479211B1

    公开(公告)日：2002-11-12

    申请号：US09577884

    申请日：2000-05-25

    申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai ,  Hajime Nakao

    发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai ,  Hajime Nakao

    IPC分类号： G03F7039

    CPC分类号： G03F7/0397 ,  G03F7/0048 ,  Y10S430/106

    摘要： A positive photoresist composition for far ultraviolet exposure is disclosed, comprising a compound capable of generating an acid upon irradiation with actinic rays or radiation and a resin having a repeating unit represented by formula (I) and being capable of decomposing under the action of an acid to increase the solubility in alkali. The positive photoresist composition of the present invention may further comprise a fluorine-containing and/or silicon-containing surfactant, an acid decomposable resin, a compound capable of decomposing under the action of an acid to generate a sulfonic acid, and/or a specific solvent, according to the objects.

    摘要翻译： 公开了一种用于远紫外线曝光的正性光致抗蚀剂组合物，其包含能够在光化射线或辐射照射时能够产生酸的化合物和具有由式（I）表示的重复单元并且能够在酸的作用下分解的树脂 以增加在碱中的溶解度。 本发明的正型光致抗蚀剂组合物可以进一步包含含氟和/或含硅表面活性剂，可酸分解树脂，能够在酸的作用下分解以产生磺酸的化合物和/或特定的 溶剂，根据目的。

    Positive photoresist composition
    7.
    发明授权
    Positive photoresist composition 有权
    正光致抗蚀剂组合物

    公开(公告)号：US06692884B2

    公开(公告)日：2004-02-17

    申请号：US10116137

    申请日：2002-04-05

    申请人： Toru Fujimori ,  Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai

    发明人： Toru Fujimori ,  Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai

    IPC分类号： G03F7004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/106

    摘要： A positive photoresist composition comprises: a compound capable of generating an acid upon irradiation with an actinic ray or a radiation, in which the compound contains (A1) a sulfonate compound of a sulfonium, and (A2) a sulfonate compound of an N-hydroxyimide or a disulfonyldiazomethane compound; and a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developing solution, in which the resin contains a repeating unit having a specific lactone structure.

    摘要翻译： 正型光致抗蚀剂组合物包括：在光化学射线或辐射照射时能够产生酸的化合物，其中该化合物含有（A1）锍磺酸盐化合物，和（A2）N-羟基酰亚胺的磺酸盐化合物 或二磺酰基重氮甲烷化合物; 以及能够通过酸的作用分解以增加在碱性显影液中的溶解度的树脂，其中树脂含有具有特定内酯结构的重复单元。

    Positive resist composition
    8.
    发明授权
    Positive resist composition 失效
    正抗蚀剂组成

    公开(公告)号：US06489080B2

    公开(公告)日：2002-12-03

    申请号：US09449899

    申请日：1999-12-02

    申请人： Kazuya Uenishi ,  Toru Fujimori ,  Kunihiko Kodama ,  Koji Shirakawa ,  Shiro Tan

    发明人： Kazuya Uenishi ,  Toru Fujimori ,  Kunihiko Kodama ,  Koji Shirakawa ,  Shiro Tan

    IPC分类号： G03F7027

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/115

    摘要： The present invention provides a positive electron beam or X-ray resist composition containing (a) a compound which generates an acid by the irradiation with radiation and (b) a compound having a cationic polymerizable function. The positive electron beam or X-ray resist composition is high sensitivity, has high resolution, can provide an excellent rectangular pattern profile, and is excellent in PCD stability and PED stability.

    摘要翻译： 本发明提供一种正电子束或X射线抗蚀剂组合物，其含有（a）通过辐射照射产生酸的化合物和（b）具有阳离子可聚合官能团的化合物。 正电子束或X射线抗蚀剂组成灵敏度高，分辨率高，可提供优异的矩形图案，PCD稳定性和PED稳定性优异。