公开(公告)号：US20080254390A1

公开(公告)日：2008-10-16

申请号：US12093160

申请日：2006-11-09

Applicant: Marc Van Damme

Inventor： Marc Van Damme

IPC: G03F7/20

CPC classification number: B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/10 ,  B41C2210/22 ,  B41C2210/24 ,  G03F7/092 ,  G03F7/32

Abstract: A method of making a lithographic printing plate includes the steps of a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support, including a photopolymerizable layer, a top layer, and optionally, an intermediate layer between the photopolymerizable layer and the support, wherein the photopolymerizable layer includes a polymerizable compound, a polymerization initiator, and a binder; b) image-wise exposing the coating in a plate setter; c) optionally, heating the precursor in a pre-heating unit; d) washing the precursor in a pre-washing station by applying water or an aqueous solution to the coating, thereby removing at least a portion of the top layer; and e) developing the precursor in a gumming station by applying a gum solution to the coating of the precursor, thereby removing the non-exposed areas of the photopolymerizable layer from the support and gumming the plate in a single step.

Abstract translation: 制备平版印刷版的方法包括以下步骤：a）提供平版印刷版前体，其包括（i）具有亲水性表面的或具有亲水层的载体，（ii）载体上的涂层，包括 可光聚合层，顶层和任选的可光聚合层和载体之间的中间层，其中可光聚合层包括可聚合化合物，聚合引发剂和粘合剂; b）以平板印刷方式将涂层曝光在印版机中; c）任选地，在预热单元中加热前体; d）通过将水或水溶液施加到涂层上，在预洗涤站中洗涤前体，从而去除顶层的至少一部分; 和e）通过将胶溶液施加到前体的涂层上，在上胶台中显影前体，从而从支撑物中除去可光聚合层的未曝光区域，并在一个步骤中涂覆该板。

公开(公告)号：US07205084B2

公开(公告)日：2007-04-17

申请号：US10834555

申请日：2004-04-29

Applicant: Marc Van Damme ,  Huub Van Aert

Inventor： Marc Van Damme ,  Huub Van Aert

IPC: G03F7/11 ,  G03F7/30

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/145

Abstract: A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating thereon which comprises an infrared light-to-heat converter, an alkali-soluble binder and a polymeric developer accelerator. The polymeric developer accelerator is preferably a phenolic formaldehyde resin comprising at least 70 mol % of meta-cresol as recurring unit or at least 40 mol % of monohydroxy benzene cresol as recurring unit. The PDA may also be a phenolic resin which comprises at least 5 mol % of a recurring monomeric unit having at least one phenolic hydroxyl group and at least one alkali solubilising group. The polymeric developer accelerator improves the sensitivity while maintaining a good under-exposure latitude and a good developer resistance of the printing plate.

Abstract translation: 公开了一种热敏平版印刷版原版，其包含亲水载体和其上的亲油性涂层，其包含红外光热转换器，碱溶性粘合剂和聚合显影剂促进剂。 聚合显影剂促进剂优选为包含至少70mol％的间甲酚作为重复单元或至少40mol％的单羟基苯甲酚作为重复单元的酚醛树脂。 PDA还可以是酚醛树脂，其包含至少5摩尔％的具有至少一个酚羟基的重复单体单元和至少一个碱增溶基团。 聚合物显影剂促进剂在保持良好的低曝光宽容度和印刷版的良好显影剂抗性的同时提高了灵敏度。

公开(公告)号：US07186498B2

公开(公告)日：2007-03-06

申请号：US10956871

申请日：2004-10-01

Applicant: Willi-Kurt Gries ,  Marc Van Damme ,  Pascal Meeus ,  Mario Boxhorn

Inventor： Willi-Kurt Gries ,  Marc Van Damme ,  Pascal Meeus ,  Mario Boxhorn

IPC: G03F7/32

CPC classification number: G03F7/322

Abstract: The invention relates to an alkaline developer for irradiated radiation sensitive compositions, which developer is based on water and at least one inorganic salt having an alkaline reaction, wherein the developer has a pH of at least 11 and comprises at least three structurally different surfactants of formulae (A), (B) and (C), characterised in that the surfactant of formula (A) has one anionic group, the surfactant of formula (B) has two anionic groups, the surfactant of formula (C) is non-ionic and has at least one non-ionic hydrophilic group, and the concentration of each of the surfactants of formulae (A), (B) and (C) in the developer is at least 0.05 weight-% based on the total weight of the developer. The developer leads to less depositions and has a superior stability when used.

Abstract translation: 本发明涉及一种用于辐照敏感组合物的碱性显影剂，该显色剂基于水和至少一种具有碱性反应的无机盐，其中显影剂的pH至少为11，并且包含至少三种结构不同的式 （A），（B）和（C），其特征在于式（A）的表面活性剂具有一个阴离子基团，式（B）的表面活性剂具有两个阴离子基团，式（C）的表面活性剂是非离子的 并且具有至少一个非离子亲水基团，并且显影剂中式（A），（B）和（C）的每种表面活性剂的浓度相对于显影剂的总重量为至少0.05重量％ 。 开发人员的沉积少，在使用时具有优异的稳定性。

公开(公告)号：US20050136355A1

公开(公告)日：2005-06-23

申请号：US10834553

申请日：2004-04-29

Applicant: Huub Van Aert ,  Bert Groenendaal ,  Marc Van Damme

Inventor： Huub Van Aert ,  Bert Groenendaal ,  Marc Van Damme

IPC: B41C1/10 ,  G03C1/492

CPC classification number: B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/145

Abstract: According to the present invention there is provided a positive-working lithographic printing plate precursor which comprises on a support having a hydrophilic surface or which is provided with a hydrophilic layer, an oleophilic coating comprising an infrared absorbing agent, an alkali-soluble polymeric binder and a polysiloxane which comprises at least one carboxylic acid group or a salt thereof. The disclosed printing plate precursor has an improved sensitivity and at the same time a high under exposure latitude and a high developer resistance.

Abstract translation: 根据本发明，提供了一种正性平版印刷版原版，其包含在具有亲水性表面或具有亲水层的支持体上，亲水性涂层包含红外线吸收剂，碱溶性聚合物粘合剂和 包含至少一个羧酸基团或其盐的聚硅氧烷。 所公开的印版前体具有改进的灵敏度，同时高曝光宽度和高显影剂阻力。

公开(公告)号：US20050037280A1

公开(公告)日：2005-02-17

申请号：US10916154

申请日：2004-08-11

Applicant: Johan Loccufier ,  Bert Groenedaal ,  Marc Van Damme ,  Huub Van Aert

Inventor： Johan Loccufier ,  Bert Groenedaal ,  Marc Van Damme ,  Huub Van Aert

IPC: B41C1/10 ,  G03C1/76

CPC classification number: B41C1/1008 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/145

Abstract: A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a developer soluble polymer which comprises a phenolic monomeric unit wherein the phenyl group of the phenolic monomeric unit is substituted by a group Q, wherein Q has the structure and is covalently linked to a carbon atom of the phenyl group and wherein L1, L2 and L3 are linking groups, a, b and c are 0 or 1, and T1, T2 and T3 are terminal groups. The polymer, substituted by the group Q, increases the chemical resistance of the coating.

Abstract translation: 公开了一种热敏平版印刷版前体，其包含亲水性载体和亲油性涂层，其包含红外吸收剂和显影剂可溶性聚合物，其包含酚单体单元，其中酚单体单元的苯基被基团Q 其中Q具有结构并共价连接到苯基的碳原子，其中L 1，L 2和L 3是连接基团，a，b和c分别是0或1，T <1>，T 2和T 3是末端基团。 由Q组取代的聚合物增加了涂层的耐化学性。

公开(公告)号：US06852363B2

公开(公告)日：2005-02-08

申请号：US09996108

申请日：2001-11-28

Applicant: Johan Loccufier ,  Marc Van Damme ,  Luc Leenders

Inventor： Johan Loccufier ,  Marc Van Damme ,  Luc Leenders

IPC: B41C1/10 ,  B05D5/04 ,  B05D1/02 ,  B05D1/26

CPC classification number: B41C1/1066

Abstract: A method for preparing a lithographic printing plate by means of ink jet printing. The ink jet fluid contains an oleophilizing compound having in its chemical structure a functional amidine group capable of reacting with the surface of a lithographic receiver.

Abstract translation: 一种通过喷墨印刷制备平版印刷版的方法。 喷墨流体包含具有化学结构的能够与光刻接收体的表面反应的官能脒基的油相化合物。

公开(公告)号：US20050003304A1

公开(公告)日：2005-01-06

申请号：US10843078

申请日：2004-05-11

Applicant: Marc Van Damme ,  Rudi Mayers ,  Peter Hendrikx

Inventor： Marc Van Damme ,  Rudi Mayers ,  Peter Hendrikx

IPC: B41C1/10 ,  B41N1/08 ,  B41N3/03 ,  C09D11/00 ,  G03C1/76

CPC classification number: B41C1/1066 ,  B41N1/083 ,  B41N3/034

Abstract: A method for preparing a lithographic printing plate by means of ink jet printing is disclosed. The invention involves a method for controlling the resolution of an image formed by ink yet printing with an ink comprising at least one transition metal complex on a specific surface treated substrate.

Abstract translation: 公开了一种通过喷墨印刷制备平版印刷版的方法。 本发明涉及一种用于控制由油墨形成的图像的分辨率的方法，同时用包含至少一种过渡金属络合物的油墨在特定表面处理的基材上进行印刷。

公开(公告)号：US06790595B2

公开(公告)日：2004-09-14

申请号：US10002944

申请日：2001-11-02

Applicant: Marc Van Damme ,  Wim Sap ,  Huub Van Aert

Inventor： Marc Van Damme ,  Wim Sap ,  Huub Van Aert

IPC: G03F711

CPC classification number: B41C1/1041 ,  Y10S430/145 ,  Y10S430/146

Abstract: A negative-working heat-sensitive material for making a lithographic printing plate by direct-to-plate recording is disclosed. The material comprises in the order given a lithographic base having a hydrophilic surface, an oleophilic imaging layer and a cross-linked hydrophilic upper layer which comprises an organic compound derived from sulfonic acid, sulfuric acid, phosphoric acid or phosphonic acid. Materials according to the invention are characterized by an increased water-acceptance in the non-printing areas, which allows a rapid start-up of the press.

Abstract translation: 公开了一种用于通过直接到板记录制造平版印刷版的负性热敏材料。 该材料按顺序给出具有亲水表面的光刻基底，亲油成像层和交联的亲水性上层，其包含衍生自磺酸，硫酸，磷酸或膦酸的有机化合物。 根据本发明的材料的特征在于在非印刷区域中增加的水接受性，这允许压机的快速启动。

公开(公告)号：US06641976B2

公开(公告)日：2003-11-04

申请号：US10087244

申请日：2002-03-01

Applicant: Joan Vermeersch ,  Marc Van Damme

Inventor： Joan Vermeersch ,  Marc Van Damme

IPC: G03F7038

CPC classification number: B41C1/1025 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/145 ,  Y10S430/146

Abstract: A method of making a negative-working heat-sensitive lithographic printing plate precursor is disclosed, the method comprising the steps of (a) preparing an aqueous dispersion comprising particles of a hydrophobic thermoplastic polymer A which is not soluble or swellable in an aqueous alkaline developer and particles of a polymer B which is soluble or swellable in an aqueous alkaline developer but not soluble or swellable in water, wherein the glass transition temperature of polymer A is higher than the softening temperature of polymer B; (b) applying the aqueous dispersion on a lithographic substrate having a hydrophilic surface, thereby obtaining an image-recording layer; (c) overall heating the image-recording layer at a temperature which is higher than the softening temperature of polymer B without inducing coalescense of the particles of polymer A. The printing plate precursor has improved mechanical resistance.

Abstract translation: 公开了一种制备负性热敏平版印刷版前体的方法，该方法包括以下步骤：（a）制备包含疏水性热塑性聚合物A的颗粒的水性分散体，其在水性碱性显影剂中不溶或可溶胀 聚合物B的颗粒，其在水性碱性显影剂中是可溶的或可溶胀的，但在水中不溶或可膨胀，其中聚合物A的玻璃化转变温度高于聚合物B的软化温度;（b）将水分散体 具有亲水性表面的光刻基板，从而获得图像记录层;（c）在高于聚合物B的软化温度的温度下整体加热图像记录层，而不会引起聚合物A的颗粒的聚结。 印版前体具有改善的机械阻力。

公开(公告)号：US06638680B2

公开(公告)日：2003-10-28

申请号：US09891649

申请日：2001-06-26

Applicant: Johan Lamotte ,  Frank Louwet ,  Marc Van Damme ,  Joan Vermeersch

Inventor： Johan Lamotte ,  Frank Louwet ,  Marc Van Damme ,  Joan Vermeersch

IPC: G03F7021

CPC classification number: G03F7/0166 ,  G03F7/0163 ,  G03F7/093 ,  H05K3/105 ,  H05K2201/0329

Abstract: A material for making an electroconductive pattern, the material comprising a support and a light-exposure differentiable element, characterized in that the light-exposure differentiable element comprises an outermost layer containing a polyanion and a polymer or copolymer of a substituted or unsubstituted thiophene, and optionally a second layer contiguous with the outermost layer; and wherein the outermost layer and/or the optional second layer contains a light-sensitive component capable upon exposure of changing the removability of the exposed parts of the outermost layer relative to the unexposed parts of the outermost layer; and a method of making an electroconductive pattern on a support using the material for making an electroconductive pattern.