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公开(公告)号:US20220130685A1
公开(公告)日:2022-04-28
申请号:US17331751
申请日:2021-05-27
Applicant: Samsung Electronics Co., Ltd.
Inventor: Seokhyun Lee , Kyoung Lim Suk , Ae-Nee Jang , Jaegwon Jang
IPC: H01L21/56 , H01L23/485 , H01L23/498 , H01L23/00
Abstract: Disclosed is a semiconductor package comprising a semiconductor chip, an external connection member on the semiconductor chip, and a dielectric film between the semiconductor chip and the external connection member. The semiconductor chip includes a substrate, a front-end-of-line structure on the substrate, and a back-end-of-line structure on the front-end-of-line structure. The back-end-of-line structure includes metal layers stacked on the front-end-of-line structure, a first dielectric layer on the uppermost metal layer and including a contact hole that vertically overlaps a pad of an uppermost metal layer, a redistribution line on the first dielectric layer and including a contact part in the contact hole and electrically connected to the pad, a pad part, and a line part that electrically connects the contact part to the pad part, and an upper dielectric layer on the redistribution line.
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公开(公告)号:US20210407940A1
公开(公告)日:2021-12-30
申请号:US17474614
申请日:2021-09-14
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jongyoun Kim , Jungho Park , Seokhyun Lee , Yeonho Jang , Jaegwon Jang
IPC: H01L23/00 , H01L23/498 , H01L21/768 , H01L25/065
Abstract: A semiconductor package includes a redistribution structure including a redistribution insulating layer and a redistribution pattern, a semiconductor chip provided on a first surface of the redistribution insulation layer and electrically connected to the redistribution pattern, and a lower electrode pad provided on a second surface opposite to the first surface of the redistribution insulating layer, the lower electrode pad including a first portion embedded in the redistribution insulating layer and a second portion protruding from the second surface of the redistribution insulating layer, wherein a thickness of the first portion of the lower electrode pad is greater than a thickness of the second portion of the lower electrode pad.
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