公开(公告)号：US20150128441A1

公开(公告)日：2015-05-14

申请号：US14537477

申请日：2014-11-10

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Mikio Segawa ,  Yasushi Taniyama ,  Shin Kawahisa ,  Mitsuo Natsume

IPC: F26B25/00 ,  H01L21/677

CPC classification number: H01L21/67772 ,  H01L21/67389 ,  H01L21/67742

Abstract: The present invention provides an atmosphere replacement apparatus capable of replacing the atmosphere on the surface of a wafer with a small amount of gas. The apparatus is configured to have a cover capable of facing and covering the wafer to be transported, and a gas supply means that supplies gas having properties different from a surrounding atmosphere from the cover, and replaces the atmosphere on the surface of the wafer by the gas.

Abstract translation: 本发明提供一种能够用少量气体代替晶片表面的气氛的气氛置换装置。 该装置被配置为具有能够面对和覆盖要输送的晶片的盖，以及气体供给装置，其将与周围大气不同的性质的气体与盖接触，并且通过 加油站。