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    Door opening/closing system, and load port equipped with door opening/closing system
    1.
    发明授权
    Door opening/closing system, and load port equipped with door opening/closing system 有权

    公开(公告)号：US10930537B2

    公开(公告)日：2021-02-23

    申请号：US16774758

    申请日：2020-01-28

    Applicant: SINFONIA TECHNOLOGY CO., LTD.

    Inventor： Toshihiro Kawai ,  Yasushi Taniyama ,  Munekazu Komiya ,  Takashi Shigeta

    IPC: H01L21/677 ,  H01L21/67 ,  H01L21/673

    Abstract: Provided are a door opening/closing system which prevents the entry of atmospheric air into a front-opening unified pod (FOUP) and an equipment front end module (EFEM) when the FOUP and the EFEM are placed in communication with each other, and a load port equipped with the door opening/closing system. The door opening/closing system is provided with: a base which constitutes a part of a wall isolating a conveyance space from an external space, an opening portion provided in the base; a door which is capable of opening and closing the opening portion; a first seal member which seals a gap between the base and a container; a second seal member which seals a gap between the base and the door, a sealed space which is constituted by the base, the first seal member, the second seal member, a lid member, and the door when the container is in a state of contact with the opening portion with the first seal member therebetween, a first gas injection unit which injects gas into the sealed space; and a second gas discharge unit 88 which evacuates the sealed space.

    Transfer chamber
    3.
    发明授权
    Transfer chamber 有权

    公开(公告)号：US10658217B2

    公开(公告)日：2020-05-19

    申请号：US15554152

    申请日：2016-02-05

    Applicant: SINFONIA TECHNOLOGY CO., LTD.

    Inventor： Toshihiro Kawai ,  Takashi Shigeta ,  Munekazu Komiya ,  Yasushi Taniyama

    IPC: H01L21/677 ,  H01L21/67 ,  H01L21/673 ,  H01L21/02

    Abstract: The transfer chamber transfers a wafer (W) as a transferred object to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) as a chemical filter provided in the midstream of the circulation path (CL), a humidity detector (HG2) as a humidity detection means which detects internal humidity, a gas supply means (NS) which supplies gas to the inside of the transfer chamber (1), and a moisture supply means (HS) which supplies moisture content to the inside of the transfer chamber (1). The moisture supply means (HS) is made to operate in accordance with a humidity detection value by the humidity detection means.

    Wafer stocker
    5.
    发明授权
    Wafer stocker 有权

    公开(公告)号：US11610797B2

    公开(公告)日：2023-03-21

    申请号：US17297509

    申请日：2019-11-25

    Applicant: Sinfonia Technology Co., Ltd.

    Inventor： Yasushi Taniyama ,  Toshihiro Kawai

    IPC: H01L21/677 ,  B65G1/04 ,  F24F13/06 ,  H01L21/687 ,  B25J11/00

    Abstract: A wafer stocker is capable of further improving an environment around wafers. The wafer stocker includes a housing, a loading device provided on a front surface of the housing, a wafer cassette shelf arranged in the housing, a wafer transfer robot configured to move the wafers from a transfer container mounted on the loading device to a wafer cassette in the wafer cassette shelf, a wafer cassette delivery device configured to move the wafer cassette in the wafer cassette shelf to a stage having a different height, and a fan filter unit configured to generate a laminar flow in a wafer transfer space and in a wafer cassette transfer space.

    TRANSPORT SYSTEM
    6.
    发明申请
    TRANSPORT SYSTEM 有权

    公开(公告)号：US20220336245A1

    公开(公告)日：2022-10-20

    申请号：US17761816

    申请日：2020-09-23

    Applicant: Sinfonia Technology Co., Ltd.

    Inventor： Toshihiro Kawai ,  Hiroaki Nakamura ,  Gengoro Ogura ,  Kosuke Sugiura ,  Yasushi Taniyama

    IPC: H01L21/677 ,  B65G47/248

    Abstract: There is provided a technique capable of efficiently transporting a plurality of objects between a storage container configured to store the plurality of objects and a processing apparatus configured to collectively process the plurality of objects. A transport system 1 for transporting a plurality of objects between a storage container 9 configured to store the plurality of objects and a processing apparatus 2 configured to collectively process the plurality of objects held on a tray 8, includes: a mounting part 31 on which the storage container 9 is mounted; a stage 41 on which the plurality of objects are mounted; a tray support part 51 configured to support the tray 8; a first transport device 44 configured to transport the plurality of objects between the storage container 9 mounted on the mounting part 31 and the stage 41; and a second transport device 53 configured to transport the plurality of objects between the stage 41 and the tray 8 supported by the tray support part 51.

    Gas injection device
    7.
    发明授权
    Gas injection device 有权

    公开(公告)号：US10923372B2

    公开(公告)日：2021-02-16

    申请号：US15757560

    申请日：2016-08-19

    Applicant: SINFONIA TECHNOLOGY CO., LTD.

    Inventor： Toshihiro Kawai ,  Yasushi Taniyama ,  Munekazu Komiya ,  Takashi Shigeta

    IPC: F16K31/122 ,  H01L21/673 ,  F16K15/14 ,  H01L21/677 ,  F16K15/02

    Abstract: There is provided a gas injection device configured to prevent entry of atmospheric air when charging gas into a FOUP. In order to realize such a gas injection device, the gas injection device is structured so as to include: a gas supply port 72 through which inert gas is supplied; a nozzle main body 71 including a gas passage 77 communicating with the gas supply port 72; an opening/closing mechanism 92 configured to close the gas supply port 72; and an opener 96 configured to cause the opening/closing mechanism 92 to open the gas supply port 72 closed by the opening/closing mechanism 92.

    METHOD FOR MANUFACTURING SEMICONDUCTOR
    8.
    发明申请
    METHOD FOR MANUFACTURING SEMICONDUCTOR 审中-公开

    公开(公告)号：US20190145641A1

    公开(公告)日：2019-05-16

    申请号：US16244490

    申请日：2019-01-10

    Applicant: SINFONIA TECHNOLOGY CO., LTD.

    Inventor： Yasushi Taniyama ,  Mitsutoshi Ochiai ,  Mitsuo Natsume ,  Atsushi Suzuki

    IPC: F24F9/00 ,  H01L21/677 ,  H01L21/67

    Abstract: There is provided a method for manufacturing semiconductor. The method includes providing a semiconductor manufacturing apparatus and providing an EFEM. The EFEM includes a shield gas curtain apparatus 6 that forms a gas curtain capable of shielding an opening 23 when an internal space 5S of a purge container 5, in which the humidity is reduced to a predetermined value by means of a bottom purge apparatus 25 provided in a load port 2, is brought into communication with an internal space 3S of a wafer transport chamber 3, the gas curtain being formed of a shield curtain gas blown immediately downward from a location near the opening 23 of the load port 2 and being closer to the wafer transport chamber 3 than the opening 23 at a higher height than an upper edge of the opening 23.

    EFEM AND LOAD PORT
    9.
    发明申请
    EFEM AND LOAD PORT 审中-公开
    EFEM和负载端口

    公开(公告)号：US20150024671A1

    公开(公告)日：2015-01-22

    申请号：US14269360

    申请日：2014-05-05

    Applicant: SINFONIA TECHNOLOGY CO., LTD.

    Inventor： Yasushi Taniyama ,  Mitsutoshi Ochiai ,  Mitsuo Natsume ,  Atsushi Suzuki

    IPC: F24F9/00

    CPC classification number: F24F9/00 ,  F24F3/161 ,  H01L21/67017 ,  H01L21/67772

    Abstract: There is provided an EFEM that includes a shield gas curtain apparatus 6 that forms a gas curtain capable of shielding an opening 23 when an internal space 5S of a purge container 5, in which the humidity is reduced to a predetermined value by means of a bottom purge apparatus 25 provided in a load port 2, is brought into communication with an internal space 3S of a wafer transport chamber 3, the gas curtain being formed of a shield curtain gas blown immediately downward from a location near the opening 23 of the load port 2 and being closer to the wafer transport chamber 3 than the opening 23 at a higher height than an upper edge of the opening 23. The EFEM thus configured can prevent and suppress a rapid increase in the humidity in the purge container, in which the humidity in the interior space is reduced by performing the bottom purging, occurring immediately after a lid of the purge container is opened, so that quality degradation due to the moisture adhered on a wafer can be avoided.

    Abstract translation: 提供了一种EFEM，其包括屏蔽气幕装置6，其形成能够屏蔽开口23的气幕，当清洗容器5的内部空间5S通过底部将湿度降低到预定值时 设置在负载端口2中的净化装置25与晶片运送室3的内部空间3S连通，气幕由从负载端口的开口23附近的位置立即向下吹出的屏蔽帘式气体形成 并且比开口23更高的高度比开口23更靠近晶片输送室3.如此构造的EFEM可以防止和抑制净化容器中的湿度的快速增加，其中湿度 通过执行底部清洗，在清洗容器的盖子打开之后立即发生的内部空间被减少，使得由于水分附着在晶片上而导致的质量劣化可以是avoi ded。

    WAFER STOCKER
    10.
    发明公开
    WAFER STOCKER 审中-公开

    公开(公告)号：US20230207367A1

    公开(公告)日：2023-06-29

    申请号：US18115044

    申请日：2023-02-28

    Applicant: Sinfonia Technology Co., Ltd.

    Inventor： Yasushi Taniyama ,  Toshihiro Kawai

    IPC: H01L21/677 ,  B65G1/04 ,  F24F13/06 ,  H01L21/687

    CPC classification number: H01L21/67778 ,  B65G1/0485 ,  F24F13/06 ,  H01L21/67766 ,  H01L21/67769 ,  H01L21/68707 ,  B25J11/0095

    Abstract: A wafer stocker capable of further improving an environment around wafers is provided. The wafer stocker includes a housing, a loading device provided on a front surface of the housing, a wafer cassette shelf arranged in the housing, a wafer transfer robot configured to move the wafers from a transfer container mounted on the loading device to a wafer cassette in the wafer cassette shelf, a wafer cassette delivery device configured to move the wafer cassette in the wafer cassette shelf to a stage having a different height, and a fan filter unit configured to generate a laminar flow in a wafer transfer space and in a wafer cassette transfer space.

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