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公开(公告)号:US20170347459A1
公开(公告)日:2017-11-30
申请号:US15536851
申请日:2015-12-21
Inventor: Kazuhiro MIYATA , Issei OKADA , Takashi KASUGA , Yoshio OKA , Yasuhiro OKUDA , Jinjoo PARK , Hiroshi UEDA , Kousuke MIURA
CPC classification number: H05K1/092 , C09D11/52 , H05K1/03 , H05K1/0346 , H05K1/09 , H05K1/097 , H05K3/022 , H05K3/064 , H05K3/102 , H05K3/1208 , H05K3/245 , H05K3/246 , H05K2201/0154 , H05K2201/0347 , H05K2203/072 , H05K2203/1131 , H05K2203/1157
Abstract: A substrate for a printed circuit board according to an embodiment of the present invention includes a base film having an insulating property, and a conductive layer formed on at least one of surfaces of the base film. In the substrate for a printed circuit board, at least the conductive layer contains titanium in a dispersed manner. The conductive layer preferably contains copper or a copper alloy as a main component. A mass ratio of titanium in the conductive layer is preferably 10 ppm or more and 1,000 ppm or less. The conductive layer is preferably formed by application and heating of a conductive ink containing metal particles. The conductive ink preferably contains titanium or a titanium ion. The metal particles are preferably obtained by a titanium redox process including reducing metal ions using trivalent titanium ions as a reducing agent in an aqueous solution by an action of the reducing agent.
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32.
公开(公告)号:US20170099732A1
公开(公告)日:2017-04-06
申请号:US15127203
申请日:2015-03-26
Inventor: Takashi KASUGA , Yoshio OKA , Jinjoo PARK , Sumito UEHARA , Kousuke MIURA , Hiroshi UEDA
CPC classification number: H05K1/097 , H05K1/092 , H05K3/12 , H05K3/246 , H05K3/4069 , H05K2201/032
Abstract: A substrate for a printed circuit board according to the present invention includes a base film having an insulating property and including at least one opening; a first conductive layer that is formed on both surfaces of the base film by applying and heat-treating a conductive ink containing metal particles, and that fills the at least one opening; and a second conductive layer formed, by plating, on at least one of surfaces of the first conductive layer. The metal particles preferably have a mean particle size of 1 nm or more and 500 nm or less.
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