Polishing pad
    31.
    发明授权
    Polishing pad 有权
    抛光垫

    公开(公告)号:US07927183B2

    公开(公告)日:2011-04-19

    申请号:US12294391

    申请日:2007-05-15

    IPC分类号: B24B49/00

    CPC分类号: B24B37/205

    摘要: A polishing pad provides excellent optical detection accuracy properties over a broad wavelength range (particularly at the short-wavelength side). A method for manufacturing a semiconductor device includes a process of polishing the surface of a semiconductor wafer with this polishing pad. The polishing pad has a polishing layer containing a polishing region and a light-transmitting region, wherein the light-transmitting region includes a polyurethane resin having an aromatic ring density of 2 wt % or less, and the light transmittance of the light-transmitting region is 30% or more in the overall range of wavelengths of 300 to 400 nm.

    摘要翻译: 抛光垫在宽波长范围(特别是在短波长侧)提供优异的光学检测精度特性。 半导体器件的制造方法包括利用该研磨垫对半导体晶片的表面进行研磨的工序。 抛光垫具有包含抛光区域和透光区域的抛光层,其中透光区域包括芳族环密度为2重量%以下的聚氨酯树脂,透光区域的透光率 在波长为300〜400nm的整个范围内为30%以上。

    Polishing pad
    32.
    发明授权
    Polishing pad 有权
    抛光垫

    公开(公告)号:US07874894B2

    公开(公告)日:2011-01-25

    申请号:US12294402

    申请日:2007-05-15

    IPC分类号: B24B49/00

    CPC分类号: B24B37/205

    摘要: A polishing pad provides excellent optical detection accuracy properties over a broad wavelength range (particularly at the short-wavelength side) and is capable of preventing a slurry from leaking from the boundary between a polishing region and a light-transmitting region. The polishing pad includes at least a transparent support film laminated on one side of a polishing layer including a polishing region and a light-transmitting region; the light transmittance of an optical detection region containing at least the light-transmitting region and the transparent support film is 40% or more in the overall range of wavelengths of 300 to 400 nm.

    摘要翻译: 抛光垫在宽波长范围(特别是短波长侧)提供优异的光学检测精度特性,并且能够防止浆料从抛光区域和透光区域之间的边界泄漏。 抛光垫至少包括层叠在包括抛光区域和透光区域的抛光层的一侧上的透明支撑膜; 至少含有透光区域和透明支撑膜的光学检测区域的光透射率在波长为300〜400nm的整个范围内为40%以上。