公开(公告)号：US20080151203A1

公开(公告)日：2008-06-26

申请号：US12010824

申请日：2008-01-30

申请人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

发明人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

IPC分类号： G03B27/52

CPC分类号： G03F7/709 ,  G03F7/70341 ,  G03F7/70716

摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. A supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. A recovery mechanism recovers the liquid and an auxiliary recovery mechanism recovers the liquid which could not be recovered by the recovery mechanism.

摘要翻译： 曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。 曝光装置包括其上安装有基板并且在保持基板的二维平面内移动的基板台。 供给机构将液体供给到基板台上的投影光学系统与基板之间的空间。 回收机构回收液体，辅助回收机构回收回收机构无法回收的液体。

公开(公告)号：US20070258063A1

公开(公告)日：2007-11-08

申请号：US11822672

申请日：2007-07-09

申请人： Hiroyuki Nagasaka ,  Nobutaka Magome

发明人： Hiroyuki Nagasaka ,  Nobutaka Magome

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/709

摘要： In an exposure apparatus, an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system (PL) and the substrate (P) with a liquid (50) and projecting the image of a pattern onto the substrate (P) via the projection optical system (PL). An optical element (60) and a barrel (PK), which are in contact with the liquid (50) when the substrate (P) is moved, are surface-treated for adjusting the affinity with the liquid (50). Consequently, generation of bubbles in the liquid between the projection optical system and the substrate is suppressed and the liquid is always retained between the projection optical system and the substrate, thereby creating a good immersion state.

摘要翻译： 在曝光装置中，通过用液体（50）填充投影光学系统（PL）和基板（P）之间的至少一部分空间来进行基板（P）的曝光，并投影图像 通过投影光学系统（PL）将衬底（P）上的图案。 在移动衬底（P）时与液体（50）接触的光学元件（60）和镜筒（PK）进行表面处理以调节与液体（50）的亲和性。 因此，抑制投影光学系统和基板之间的液体中的气泡的产生，并且液体始终保持在投影光学系统和基板之间，从而形成良好的浸没状态。

公开(公告)号：US20070247640A1

公开(公告)日：2007-10-25

申请号：US10594509

申请日：2005-03-30

申请人： Nobutaka Magome ,  Hideo Mizutani ,  Yasuhiro Hidaka

发明人： Nobutaka Magome ,  Hideo Mizutani ,  Yasuhiro Hidaka

IPC分类号： G01B11/30

CPC分类号： G03F9/7011 ,  G03F9/7003 ,  G03F9/7019 ,  H04B7/155

摘要： In subroutine 201 and step 205, a best image-forming plane of a projection optical system and an offset component of a multipoint AF system are detected as calibration information. During measurement of a wafer alignment mark by an alignment system in step 215, the multipoint AF system detects information related to a surface shape of a surface subject to exposure of a wafer (Z map). In step 219, a Z position order profile regarding position order (Z, θx, θy) related to autofocus leveling control is made, along with an XY position order profile of a wafer stage during scanning exposure, and in step 221, scanning exposure is performed while performing open control based on the position order.

摘要翻译： 在子程序201和步骤205中，检测投影光学系统的最佳图像形成平面和多点AF系统的偏移分量作为校准信息。 在步骤215中通过对准系统测量晶片对准标记期间，多点AF系统检测与经过晶片曝光的表面的表面形状有关的信息（Z图）。 在步骤219中，与扫描曝光期间的晶片台的XY位置顺序轮廓一起进行与自动聚焦调平控制有关的位置顺序（Z，thetax，thetay）的Z位置阶轮廓，并且在步骤221中，扫描曝光是 在基于位置顺序执行打开控制时执行。

公开(公告)号：US20070115447A1

公开(公告)日：2007-05-24

申请号：US11655083

申请日：2007-01-19

申请人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

发明人： Shigeru Hirukawa ,  Nobutaka Magome ,  Issey Tanaka

IPC分类号： G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70341 ,  G03F7/70716

摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. In addition, a supply mechanism supplies liquid to locally fill a space between the projection optical system and the substrate on the substrate stage with the liquid, and a recovery mechanism recovers the liquid. A plate is provided in at least a part of the periphery of a mounted area of the substrate on the substrate stage. The plate has a surface arranged at substantially the same height as a surface of the substrate mounted on the substrate stage.

摘要翻译： 曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。 曝光装置包括其上安装有基板并且在保持基板的二维平面内移动的基板台。 此外，供给机构用液体供给液体以局部填充基板台上的投影光学系统与基板之间的空间，回收机构回收液体。 在衬底台上的衬底的安装区域的周边的至少一部分中设置有板。 板具有布置成与安装在基板台上的基板的表面基本相同的高度的表面。

公开(公告)号：US20060132737A1

公开(公告)日：2006-06-22

申请号：US11338661

申请日：2006-01-25

申请人： Nobutaka Magome ,  Naoyuki Kobayashi ,  Yasuyuki Sakakibara ,  Hiroaki Takaiwa

发明人： Nobutaka Magome ,  Naoyuki Kobayashi ,  Yasuyuki Sakakibara ,  Hiroaki Takaiwa

IPC分类号： G03B27/42

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70525 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/709

摘要： An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a pattern on the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid supply mechanism (10) which supplies the liquid (1) between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism (10) stops the supply of the liquid (1) when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.

摘要翻译： 曝光装置（EX）通过投影光学系统（PL）和液体（1）将基板（P）上的图案的图像投射到基板（P）上。 曝光装置（EX）具有在投影光学系统（PL）和基板（P）之间供给液体（1）的液体供给机构（10）。 当检测到异常时，液体供给机构（10）停止供给液体（1）。 这抑制了由于形成液浸区域的液体的泄漏而导致的衬底周边的器件和构件的影响，从而实现令人满意的曝光处理。

公开(公告)号：US5907405A

公开(公告)日：1999-05-25

申请号：US985906

申请日：1997-12-05

申请人： Shinji Mizutani ,  Nobutaka Magome

发明人： Shinji Mizutani ,  Nobutaka Magome

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/00

CPC分类号： G03F7/70425 ,  G03F9/70

摘要： Alignment is performed with a high degree of accuracy by detecting an offset in the Z position of a wafer mark. A focal position detecting system of a multipoint type is provided which irradiates spot beams on a plurality of measurement points substantially equally distributed on the exposure field of an projection optical system and detects the heights or levels of the irradiated positions. An alignment illumination beam for detecting the position of the wafer mark is irradiated as a slit beam from an alignment sensor, and the spot beams are set so as to be overlaid with the irradiated position of the slit beam. A sample shot where the measured value of a level at the irradiated position of the spot beam exceeds an allowable range of the measured value of a level at another measurement point is excluded from alignment data, and the coordinate positions of each shot area on a wafer are calculated by an EGA method.

摘要翻译： 通过检测晶片标记的Z位置的偏移，以高精度执行对准。 提供一种多点式的焦点位置检测系统，其将基本上均匀地分布在投影光学系统的曝光场上的多个测量点上的点光束照射并检测照射位置的高度或水平。 用于检测晶片标记的位置的对准照明光束作为来自对准传感器的狭缝光束照射，并且将点光束设定为与狭缝光束的照射位置重叠。 点光源的照射位置处的电平的测量值超过另一测量点处的电平的测量值的允许范围的采样镜头被排除在对准数据之外，并且晶片上每个照射区域的坐标位置 通过EGA方法计算。

公开(公告)号：US5734478A

公开(公告)日：1998-03-31

申请号：US537982

申请日：1995-10-02

申请人： Nobutaka Magome ,  Hideo Mizutani ,  Kenji Nishi

发明人： Nobutaka Magome ,  Hideo Mizutani ,  Kenji Nishi

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/7049

摘要： A projection exposure apparatus employs light in two different wavelength bands for exposure of a photosensitive substrate and for alignment of the substrate with a mask, respectively. The mask has a window through which alignment light is passed to an alignment mark on the substrate and has a shield for preventing illumination of the alignment mark by exposure light. In one embodiment the position of the shield relative to the window is determined by magnification chromatic aberration of a projection optical system with regard to the alignment light. In another embodiment the path of the alignment light through the window is inclined relative to a line perpendicular to the mask and passes through a pupil of the projection optical system at a point deviated from the center of the pupil. In another embodiment a mark on the mask and a mark on the substrate are illuminated with light beams incident on the marks from different directions and forming interference fringes to provide optical information that is utilized to align the mask and the substrate.

摘要翻译： 投影曝光装置采用两个不同波段的光来分别曝光感光基片和基片与掩模的对准。 掩模具有窗口，通过该窗口对准光通过基板上的对准标记，并具有用于防止曝光光照射对准标记的屏蔽。 在一个实施例中，屏蔽件相对于窗口的位置由投影光学系统相对于对准光的倍率色差确定。 在另一个实施例中，通过窗口的对准光的路径相对于垂直于掩模的线倾斜，并且在偏离瞳孔中心的点处穿过投影光学系统的光瞳。 在另一个实施例中，掩模上的标记和衬底上的标记被从不同方向入射到标记上的光束照射并形成干涉条纹以提供用于对准掩模和衬底的光学信息。

公开(公告)号：US5689339A

公开(公告)日：1997-11-18

申请号：US506132

申请日：1995-07-24

申请人： Kazuya Ota ,  Kouichirou Komatsu ,  Hideo Mizutani ,  Nobutaka Magome

发明人： Kazuya Ota ,  Kouichirou Komatsu ,  Hideo Mizutani ,  Nobutaka Magome

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/70

摘要： In an alignment apparatus for aligning a mask and a photosensitive substrate (a semiconductor wafer or glass plate applied with a photoresist), and which is suitably used in a projection exposure apparatus (a stepper or aligner), a proximity exposure apparatus, or the like used in a lithography process in the manufacture of a semiconductor element or a liquid crystal display element, two first beams and two second beams differing from the first beams may be radiated on a diffraction grating-like mask mark and a diffraction grating-like substrate mark, respectively, with the two second beams passing through a transparent region adjacent to the mask mark. By detecting diffracted light components of the two first beams and detecting diffracted light components of the two second beams, a relative position shift between the mask and the substrate can be determined. The alignment apparatus advantageously can reduce mixing of alignment light from a mask and alignment light from a wafer (substrate) to a minimum degree, or can sufficiently separate signals corresponding to these light components in a signal processing stage even when mixing inevitably occurs.

摘要翻译： 在用于对准掩模和感光基板（涂有光致抗蚀剂的半导体晶片或玻璃板）的对准装置中，适用于投影曝光装置（步进机或对准器）中的接近曝光装置等 用于制造半导体元件或液晶显示元件的光刻工艺中，可以将不同于第一光束的两个第一光束和两个第二光束照射在衍射光栅状掩模标记和衍射光栅样基板标记 分别与两个第二光束通过与掩模标记相邻的透明区域。 通过检测两个第一光束的衍射光分量并检测两个第二光束的衍射光分量，可以确定掩模和基板之间的相对位置偏移。 对准装置有利地可以减少来自掩模的对准光和来自晶片（衬底）的对准光到最小程度的混合，或者即使当不可避免地发生混合时，也可以在信号处理阶段中充分地分离与这些光分量对应的信号。

公开(公告)号：US5521036A

公开(公告)日：1996-05-28

申请号：US409921

申请日：1995-03-23

申请人： Yoshichika Iwamoto ,  Hiroki Tateno ,  Nobutaka Magome ,  Hiroki Okamoto

发明人： Yoshichika Iwamoto ,  Hiroki Tateno ,  Nobutaka Magome ,  Hiroki Okamoto

IPC分类号： G03F9/00

CPC分类号： G03F9/7026

摘要： A positioning method involving the following steps is disclosed. Measured are coordinates positions of at least three preselected exposure areas on a static coordinate system among a plurality of exposure areas two-dimensionally formed in accordance with predetermined array coordinates on a photosensitive substrate. Calculative array coordinates of the plurality of exposure areas on the static coordinate system are calculated by using a plurality of first parameters calculated by statistically calculating the plurality of measured coordinate positions. Then, the photosensitive substrate is positioned in an exposure position while being moved in accordance with the calculative array coordinates thus calculated. Specific marks formed on a mask are thus exposed on each of a plurality of predetermined positions on the photosensitive substrate. Measured further are coordinate positions of latent images of at least three specific marks on the static coordinate system among images (latent images) of a plurality of specific marks exposed. The plurality of these measured coordinate positions are statistically calculated, thereby calculating a plurality of second parameters used for obtaining coordinate positions of each of the plurality of specific marks (latent images) on the static coordinate system. Next, each of the plurality of exposure areas on the photosensitive substrate is aligned with an exposure position in accordance with a deviation between the parameter representing an array offset among the plurality of first parameters and the parameter representing an array offset among the plurality of second parameters. Besides, particularly the specific marks of the mask are exposed within a non-exposure domain (where no base pattern is formed) in the vicinity of the outer periphery of the photosensitive substrate.

摘要翻译： 公开了涉及以下步骤的定位方法。 根据感光性基板上的规定的阵列坐标二维地形成的多个曝光区域中，测定静止坐标系上至少三个预选曝光区域的坐标位置。 通过使用通过统计计算多个测量坐标位置计算出的多个第一参数来计算静态坐标系上的多个曝光区域的计算阵列坐标。 然后，根据由此计算出的计算阵列坐标而将感光基板定位在曝光位置。 因此，形成在掩模上的特定标记因此暴露在感光基板上的多个预定位置中的每一个上。 还进一步测量了暴露的多个特定标记的图像（潜像）中的静态坐标系上的至少三个特定标记的潜像的坐标位置。 统计计算多个这些测量的坐标位置，从而计算用于获得静态坐标系上的多个特定标记（潜像）中的每一个的坐标位置的多个第二参数。 接下来，感光基板上的多个曝光区域中的每一个根据表示多个第一参数之间的阵列偏移的参数与表示多个第二参数中的阵列偏移的参数之间的偏差与曝光位置对准 。 此外，特别地，掩模的特定标记在感光基板的外周附近的非曝光域（其中不形成基底图案）下曝光。

公开(公告)号：US5402224A

公开(公告)日：1995-03-28

申请号：US126393

申请日：1993-09-24

申请人： Shigeru Hirukawa ,  Nobutaka Magome ,  Kyoichi Suwa

发明人： Shigeru Hirukawa ,  Nobutaka Magome ,  Kyoichi Suwa

IPC分类号： G03F7/20 ,  G01B11/00

CPC分类号： G01M11/0264 ,  G03F7/706 ,  G03F7/70633 ,  G03F7/70675

摘要： A method for inspecting distortion characteristics of a projection optical system to be inspected by arranging a mask formed with measurement patterns at a plurality of predetermined positions on the object surface side of the projection optical system, transferring projected images of the plurality of measurement patterns onto a photosensitive substrate arranged on the image surface side of the projection optical system, and detecting transfer images of the measurement-patterns, includes:the step of exposing a mask, on which pairs of first and second measurement patterns are arranged adjacent to each other to be separated by a predetermined interval .DELTA.T in one direction at positions on the mask corresponding to a plurality of points at which distortion amounts are to be inspected in a projection view field of the projection optical system, onto the photosensitive substrate via the projection optical system;the step of exposing the mask onto the photosensitive substrate via the projection optical system after the mask and the photosensitive substrate are moved relative to each other by an amount determined by the interval .DELTA.T with respect to the state in the preceding step;the step of measuring relative displacements between overlapping images of the first and second measurement patterns at different image height points in the projection view field of the projection optical system; andthe step of calculating a value obtained by sequentially accumulating the measured relative displacements in units of image height values as a distortion amount at the corresponding image height point.

摘要翻译： 一种用于通过在投影光学系统的物体表面上的多个预定位置处布置形成有测量图案的掩模来检查要检查的投影光学系统的失真特性的方法，将多个测量图案的投影图像转印到 布置在投影光学系统的图像表面侧的感光基板和检测测量图案的转印图像包括：曝光掩模的步骤，第一和第二测量图案对彼此相邻配置成为 通过投影光学系统在投影光学系统的投影视场中将与要在失真量被检查的多个点对应的位置上的一个方向上分离预定间隔DELTA T到感光基板上; 在掩模和感光基板相对于前一步骤中的状态由间隔DELTA T确定的量相对于彼此移动之后，通过投影光学系统将掩模曝光到感光基板上的步骤; 测量投影光学系统的投影视场中不同图像高度点处的第一和第二测量图案的重叠图像之间的相对位移的步骤; 并且计算通过以图像高度值为单位将所测量的相对位移顺序地累积为在相应图像高度点处的失真量而获得的值的步骤。