公开(公告)号：US20140371341A1

公开(公告)日：2014-12-18

申请号：US14343300

申请日：2012-09-10

申请人： Norbert Moszner ,  Thomas Hirt ,  Kai Rist ,  Ulrich Salz ,  Christoph Weder ,  Gina Fiore ,  Christian Heinzmann ,  Volker Rheinberger

发明人： Norbert Moszner ,  Thomas Hirt ,  Kai Rist ,  Ulrich Salz ,  Christoph Weder ,  Gina Fiore ,  Christian Heinzmann ,  Volker Rheinberger

IPC分类号： A61K6/083 ,  C07D239/47 ,  C08F122/22 ,  C07F3/06

CPC分类号： A61K6/0835 ,  A61K6/0002 ,  A61K6/0023 ,  A61K6/083 ,  C07D239/47 ,  C07F3/06 ,  C08F122/22 ,  C08L33/00

摘要： The invention relates to a dental restorative material which comprises a thermolabile compound of Formula I: [(Z1)m-Q1-X)]k-T-[Y-Q2-(Z2)n]l  Formula I, in which T represents a thermolabile unit which contains at least one thermolabile group based on non-covalent interactions, Z1 and Z2 in each case independently represent a polymerizable group selected from vinyl groups, CH2═CR1—CO—O— and CH2═CR1—CO—NR2— or an adhesive group selected from —Si(OR)3, —COOH, —O—PO(OH)2, —PO(OH)2, —SO2OH and —SH, Q1 in each case independently is missing or represents an (m+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, Q2 in each case independently is missing or represents an (n+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, X and Y in each case independently are missing or represent —O—, —S—, CO—O—, —O—CO—, —CO—NR3— or —NR3—CO—, R, R1, R2 and R3 in each case independently represent H or a C1-C7 alkyl radical, k and l in each case independently are 0, 1, 2 or 3 and m and n in each case independently are 1, 2 or 3.

公开(公告)号：US20110190412A1

公开(公告)日：2011-08-04

申请号：US12812795

申请日：2009-01-06

申请人： Katia Studer ,  Kurt Dietliker ,  Tunja Jung

发明人： Katia Studer ,  Kurt Dietliker ,  Tunja Jung

IPC分类号： C08J3/28 ,  C08F222/22 ,  C08F122/10 ,  C08F122/22

CPC分类号： C08F2/50 ,  G03F7/031

摘要： The invention pertains to photolatent amidine bases for redox curing of radically curable formulations, that is a composition comprising (a1) a photolatent amidine base; or (a2) a photolatent amine base; or (a3) a mixture of (a1) and (a2); and (b) a radically polymerizable compound; and (c) a free radical initiator capable to be reduced by amines and/or amidines, in particular a peroxide.

摘要翻译： 本发明涉及用于自由基可固化制剂的氧化还原固化的照相脒基，即包含（a1）光引发脒基的组合物; 或（a2）光致胺基; 或（a3）（a1）和（a2）的混合物; 和（b）自由基聚合性化合物; 和（c）能够被胺和/或脒，特别是过氧化物还原的自由基引发剂。