公开(公告)号：US20230068505A1

公开(公告)日：2023-03-02

申请号：US17900073

申请日：2022-08-31

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Brian Cronquist

IPC: H01L27/06 ,  H01L23/528 ,  H01L23/532 ,  H01L23/535 ,  H01L21/822 ,  H01L21/683

Abstract: A semiconductor device, the device including: a first silicon layer including a first single crystal silicon layer and a plurality of first transistors; a first metal layer disposed over the first single crystal silicon layer; a second metal layer disposed over the first metal layer; a third metal layer disposed over the second metal layer; a second level including a plurality of second transistors, the second level disposed over the third metal layer; a fourth metal layer disposed over the second level; a fifth metal layer disposed over the fourth metal layer; and a via disposed through the second level, where the via has a diameter of less than 450 nm, where the via includes tungsten, and where a typical thickness of the fifth metal layer is greater than a typical thickness of the second metal layer by at least 50%.

公开(公告)号：US20230018701A1

公开(公告)日：2023-01-19

申请号：US17948225

申请日：2022-09-20

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Jin-Woo Han ,  Eli Lusky

IPC: G11C7/18 ,  G11C7/12 ,  G11C16/04 ,  G11C16/24 ,  H01L27/11578

Abstract: A 3D memory device, the device including: a plurality of memory cells, where each memory cell of the plurality of memory cells includes at least one memory transistor, where each of the at least one memory transistor includes a source, a drain, and a channel; and a plurality of bit-line pillars, where each bit-line pillar of the plurality of bit-line pillars is directly connected to a plurality of the source or the drain, where the bit-line pillars are vertically oriented, where the channel is horizontally oriented, and where the device includes a temperature sensor.

公开(公告)号：US20230005821A1

公开(公告)日：2023-01-05

申请号：US17941891

申请日：2022-09-09

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Deepak C. Sekar ,  Brian Cronquist

IPC: H01L23/48 ,  H01L27/06 ,  H01L27/088 ,  H01L27/11551 ,  H01L27/108 ,  H01L29/732 ,  H01L27/11526 ,  H01L27/118 ,  H01L29/10 ,  H01L29/808 ,  H01L27/11573 ,  H01L29/66 ,  H01L27/02 ,  H01L27/11578 ,  H01L29/78 ,  H01L21/74 ,  H01L23/544 ,  H01L23/34 ,  H01L23/50

Abstract: A 3D semiconductor device including: a first level including a single crystal silicon layer and a plurality of first transistors, the plurality of first transistors each including a single crystal channel; a first metal layer overlaying the plurality of first transistors; a second metal layer overlaying the first metal layer; a third metal layer overlaying the second metal layer; a second level is disposed above the third metal layer, where the second level includes a plurality of second transistors; a fourth metal layer disposed above the second level; and a connective path between the fourth metal layer and either the third metal layer or the second metal layer, where the connective path includes a via disposed through the second level, where the via has a diameter of less than 800 nm and greater than 5 nm, and where at least one of the plurality of second transistors includes a metal gate.

公开(公告)号：US20220406424A1

公开(公告)日：2022-12-22

申请号：US17739339

申请日：2022-05-09

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Deepak Sekar

IPC: G16H15/00 ,  G06F40/40 ,  G06F3/01 ,  G10L15/26 ,  G06F40/186

Abstract: A 3D micro display, the 3D micro display including: a first level including a first single crystal layer, the first single crystal layer includes a plurality of LED driving circuits; a second level including a first plurality of light emitting diodes (LEDs), the first plurality of LEDs including a second single crystal layer, where the first level is disposed on top of the second level, where the second level includes at least ten individual first LED pixels; and a bonding structure, where the bonding structure includes oxide to oxide bonding.

公开(公告)号：US11488939B2

公开(公告)日：2022-11-01

申请号：US17581977

申请日：2022-01-24

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Jin-Woo Han ,  Brian Cronquist

IPC: H01L25/065 ,  H01L25/18 ,  H01L25/00 ,  H01L23/00

Abstract: A 3D device comprising: a first level comprising first transistors, said first level comprising a first interconnect; a second level comprising second transistors, said second level overlaying said first level; a third level comprising third transistors, said third level overlaying said second level; a plurality of electronic circuit units (ECUs), wherein each of said plurality of ECUs comprises a first circuit, said first circuit comprising a portion of said first transistors, wherein each of said plurality of ECUs comprises a second circuit, said second circuit comprising a portion of said second transistors, wherein each of said plurality of ECUs comprises a third circuit, said third circuit comprising a portion of said third transistors, wherein each of said ECUs comprises a vertical bus, wherein said vertical bus comprises greater than eight pillars and less than three hundred pillars and provides electrical connections between said first circuit and said second circuit.

公开(公告)号：US20220336252A1

公开(公告)日：2022-10-20

申请号：US17846012

申请日：2022-06-22

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Brian Cronquist ,  Deepak C. Sekar

IPC: H01L21/683 ,  H01L21/74 ,  H01L21/762 ,  H01L21/768 ,  H01L21/822 ,  H01L21/8238 ,  H01L21/84 ,  H01L23/48 ,  H01L23/525 ,  H01L27/02 ,  H01L27/06 ,  H01L27/092 ,  H01L27/10 ,  H01L27/105 ,  H01L27/108 ,  H01L27/11 ,  H01L27/112 ,  H01L27/11526 ,  H01L27/11529 ,  H01L27/11551 ,  H01L27/11573 ,  H01L27/11578 ,  H01L27/118 ,  H01L27/12 ,  H01L29/423 ,  H01L29/66 ,  H01L29/78 ,  H01L29/788 ,  H01L29/792 ,  G11C8/16

Abstract: A method for producing a 3D semiconductor device including: providing a first level including a first single crystal layer; forming peripheral circuitry in and/or on the first level, and includes first single crystal transistors; forming a first metal layer on top of the first level; forming a second metal layer on top of the first metal layer; forming second level disposed on top of the second metal layer; performing a first lithography step; forming a third level on top of the second level; performing a second lithography step; processing steps to form first memory cells within the second level and second memory cells within the third level, where the plurality of first memory cells include at least one second transistor, and the plurality of second memory cells include at least one third transistor; and deposit a gate electrode for second and third transistors simultaneously.

公开(公告)号：US20220336231A1

公开(公告)日：2022-10-20

申请号：US17846010

申请日：2022-06-22

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Brian Cronquist ,  Deepak Sekar

IPC: H01L21/48 ,  H01L23/498 ,  H01L23/34 ,  H01L27/02 ,  H01L21/8234 ,  H01L27/06 ,  H01L27/098 ,  H01L23/522 ,  H01L23/367 ,  H01L27/092 ,  H01L25/00 ,  H01L23/60 ,  H01L25/065

Abstract: A method for producing a 3D semiconductor device: providing a first level with a first single crystal layer; forming a plurality of first transistors in and/or on the first level with a first metal layer above; forming a second metal layer above the first metal layer; forming a third metal layer above the second metal layer; forming at least one second level on top of or above the third metal layer; performing a first etch step; performing additional processing steps to form a plurality of second transistors within the second level; forming a fourth metal layer above; forming a connection to the second metal layer which includes a via through the second level; forming a fifth metal layer above, where some second transistors include a metal gate, and the fifth metal layer thickness is at least 50% greater than the second metal layer thickness.

公开(公告)号：US11476181B1

公开(公告)日：2022-10-18

申请号：US17850819

申请日：2022-06-27

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Deepak C. Sekar ,  Brian Cronquist

IPC: H01L23/48 ,  H01L27/06 ,  H01L27/088 ,  H01L27/11551 ,  H01L27/108 ,  H01L29/732 ,  H01L27/11526 ,  H01L27/118 ,  H01L29/10 ,  H01L29/808 ,  H01L27/11573 ,  H01L29/66 ,  H01L27/02 ,  H01L27/11578 ,  H01L29/78 ,  H01L21/74 ,  H01L23/544 ,  H01L23/34 ,  H01L23/50 ,  H01L27/24

Abstract: A 3D semiconductor device including: a first level including a single crystal silicon layer and a plurality of first transistors each including a single crystal channel; a first metal layer overlaying the plurality of first transistors; a second metal layer overlaying the first metal layer; a third metal layer overlaying the second metal layer; a second level, where the second level overlays the first level and includes a plurality of second transistors; a fourth metal layer overlaying the second level; and a connective path between the fourth metal layer and either the third metal layer or the second metal layer, where the connective path includes a via disposed through the second level and has a diameter of less than 500 nm and greater than 5 nm, where the third metal layer is connected to provide a power or ground signal to at least one of the second transistors.

公开(公告)号：US20220328550A1

公开(公告)日：2022-10-13

申请号：US17844687

申请日：2022-06-20

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Deepak C. Sekar ,  Brian Cronquist

IPC: H01L27/146 ,  H01L23/00 ,  H01L23/544

Abstract: An integrated device, the device including: a first level including a first mono-crystal layer, the first mono-crystal layer including a plurality of single crystal transistors; an overlaying oxide on top of the first level; a second level including a second mono-crystal layer, the second level overlaying the oxide, where the second mono-crystal layer includes a plurality of semiconductor devices; a third level overlaying the second level, where the third level includes a plurality of image sensors, where the second level is bonded to the first level, where the bonded includes an oxide to oxide bond; and an isolation layer disposed between the second mono-crystal layer and the third level.

公开(公告)号：US11469271B2

公开(公告)日：2022-10-11

申请号：US17718932

申请日：2022-04-12

Applicant: Monolithic 3D Inc.

Inventor： Deepak C. Sekar ,  Zvi Or-Bach

IPC: H01L21/425 ,  H01L27/24 ,  H01L21/268 ,  H01L21/683 ,  H01L21/762 ,  H01L21/822 ,  H01L21/84 ,  H01L27/06 ,  H01L27/108 ,  H01L27/11 ,  H01L27/11529 ,  H01L27/11551 ,  H01L27/11578 ,  H01L27/12 ,  H01L29/78 ,  H01L29/423 ,  H01L27/22 ,  H01L27/105 ,  H01L27/11526 ,  H01L27/11573 ,  H01L45/00

Abstract: A method for producing a 3D semiconductor device, the method comprising: providing a first level, said first level comprising a first single crystal layer; forming first alignment marks and control circuits in and/or on said first level, wherein said control circuits comprise first single crystal transistors, and wherein said control circuits comprise at least two interconnection metal layers; forming at least one second level disposed on top of said control circuits; performing a first etch step into said second level; and performing additional processing steps to form a plurality of first memory cells within said second level, wherein each of said memory cells comprise at least one second transistors, and wherein said additional processing steps comprise depositing a gate electrode for said second transistors.