公开(公告)号：US20240411287A1

公开(公告)日：2024-12-12

申请号：US18698017

申请日：2021-10-04

Applicant: NIKON CORPORATION

Inventor： Satoshi OKUNO ,  Shigenori SUGISHITA ,  Toshimitsu KURAMI ,  Taiichi ITO ,  Eisaku OGAWA

IPC: G05B19/4099

Abstract: A data generation method includes: generating, based on an input of an input apparatus, model data representing a three-dimensional shape of an object that is additively built on a placement apparatus by using a build head; generating, based on the model data, display data for displaying a three-dimensional model related to the object on a display apparatus; and generating, based on the model data, build data for additively building the object, the three-dimensional model related to the object includes a three-dimensional model of a build object before the additive building is completed, the display data includes interference information indicating an interference between the build head and at least one of the build object and the placement apparatus, when the re-input of the input apparatus is performed, the model data and the display data are re-generated based on the re-input, the interference information is updated based on the re-input.

公开(公告)号：US12164236B2

公开(公告)日：2024-12-10

申请号：US17837107

申请日：2022-06-10

Applicant: NIKON CORPORATION

Inventor： Akihiro Ueda

IPC: G03F9/00 ,  G01B11/00 ,  G01B11/14 ,  G01D5/38 ,  G03F7/20

Abstract: A measurement system in which an object that moves toward a processing position serves as a measurement target. In the processing position a processing device is capable of applying processing to the object. The measurement system includes: a mark detection device that has an irradiation system to irradiate a mark provided at the object that is moving with a measurement beam while moving the measurement beam; and a beam receiving system to receive a beam from the mark. The irradiation system irradiates the object with the measurement beam while moving the measurement beam, during a period when the object moves toward the processing position.

公开(公告)号：US20240407243A1

公开(公告)日：2024-12-05

申请号：US18802126

申请日：2024-08-13

Applicant: NIKON CORPORATION

Inventor： Yasutaka NISHI ,  Makoto NAKAZUMI

IPC: H10K71/00 ,  B05B7/08 ,  B05B13/02 ,  B05B13/04 ,  B05B16/60 ,  B05B17/06 ,  B05D1/02 ,  B05D3/06 ,  B05D3/10 ,  C23C24/08 ,  G03F7/16 ,  H10K71/60

Abstract: A film forming apparatus, a substrate processing apparatus, and a device manufacturing method are provided, which improve the film thickness uniformity of a thin film that is formed on a substrate by spraying a thin film material. The film forming apparatus which forms a thin film on a substrate is provided with a nozzle that sprays a thin film material and an exhaust unit that discharges a gas. An exhaust port of the exhaust unit is arranged on a side that is opposite to the direction in which the gravity acts with respect to the substrate. The substrate processing apparatus performs a predetermined process on the substrate using the film forming apparatus. The device manufacturing method manufactures a device using the film forming apparatus.

公开(公告)号：US12156695B2

公开(公告)日：2024-12-03

申请号：US17057278

申请日：2019-05-23

Applicant: NIKON CORPORATION

Inventor： Hiroki Yazawa

IPC: A61B3/10 ,  A61B3/00 ,  A61B3/15

Abstract: A model eye is disposed on a reference light path of reference light in a reference optical system so as to reflect or scatter the reference light at a model retina in order to form an interference optical system used to obtain interference light from the reference light of the reference optical system and signal light illuminated onto an examined eye in a signal optical system.

公开(公告)号：US20240393100A1

公开(公告)日：2024-11-28

申请号：US18567782

申请日：2021-06-11

Applicant: NIKON CORPORATION

Inventor： Shinji SATO

IPC: G01B11/00 ,  B25J9/16

Abstract: A position measurement device includes a position measurement unit configured to irradiate measurement light to a reflective element, receive reflected light reflected by the reflective element, and acquire position information of the reflective element in a three-dimensional space and a reference position measurement unit configured to irradiate reference measurement light to at least one reference reflective element, receive reference reflected light reflected by the reference reflective element, and acquire position information of the reference reflective element in a three-dimensional space. The position information of the reflective element acquired by the position measurement unit is corrected using the position information of the reference reflective element measured by the reference position measurement unit.

公开(公告)号：US20240381005A1

公开(公告)日：2024-11-14

申请号：US18685633

申请日：2022-08-25

Applicant: NIKON CORPORATION

Inventor： Hajime YONEMOCHI ,  Tomoki HIRATA ,  Shutaro KATO

IPC: H04N25/78 ,  H04N25/535 ,  H04N25/766 ,  H04N25/773 ,  H04N25/79

Abstract: An imaging element includes a first semiconductor substrate having a pixel unit having disposed therein a plurality of pixels that each include a photoelectric conversion unit configured to convert light to an electric charge, and to output signals based on the electric charge converted by the photoelectric conversion unit and a second semiconductor substrate having an exposure processing unit configured to use the signals read from the pixels to calculate an accumulation time for accumulating the electric charge yielded by the conversion performed by the photoelectric conversion units.

公开(公告)号：US20240377763A1

公开(公告)日：2024-11-14

申请号：US18783620

申请日：2024-07-25

Applicant: NIKON CORPORATION

Inventor： Arata OCHINO ,  Kenta ASAI ,  Yoshiki KIDA ,  Masatoshi MORO ,  Hiroaki TSUJI ,  Masahiro YOSHIDA ,  Takayuki SUDA

IPC: G03F7/00 ,  G03F9/00

Abstract: An exposure system exposing system capable of exposing wafer transported from coating apparatus capable of coating photosensitive material onto wafer, including: holding apparatus including first holding part holding first surface of wafer transported from coating apparatus; measurement apparatus including first measurement part having at least first measurement region and capable of measuring position in first direction of second surface on side opposite to first surface of wafer held by first holding part and second measurement part having at least one second measurement region different from first measurement region and capable of measuring position in first direction of first or second surface of wafer; exposure apparatus exposing the wafer with energy beam; transport apparatus transporting wafer from measurement apparatus to exposure apparatus; and control apparatus, wherein control apparatus determines whether or not wafer is transported toward exposure apparatus by transport apparatus based on measurement result of first and second measurement parts.

公开(公告)号：US12140739B2

公开(公告)日：2024-11-12

申请号：US17595849

申请日：2020-05-27

Applicant: Nikon Corporation

Inventor： Kosuke Machida

IPC: G02B15/14 ,  G02B13/18 ,  G02B15/20 ,  G02B15/22

Abstract: A variable power optical system (ZL (1)) includes a plurality of lens groups (G1-G7). During variable magnification, an interval between adjacent lens groups changes. The plurality of lens groups include: a first focusing lens group (G5) that moves during focusing; and a second focusing lens group (G6) that is disposed more toward an imaging surface side than the first focusing lens group and that moves along a different trajectory than the first focusing lens group during focusing. The first focusing lens group and the second focusing lens group both have a negative refractive power. The plurality of lens groups satisfy the following condition: 0.40

公开(公告)号：US12139646B2

公开(公告)日：2024-11-12

申请号：US17314230

申请日：2021-05-07

Applicant: NIKON CORPORATION

Inventor： Yoshihiro Someya ,  Masayuki Shijo

IPC: C09J4/00 ,  C07C69/54 ,  C07C69/593 ,  C07C69/653 ,  C08F220/10 ,  C08F220/22 ,  C08F220/26 ,  C08F220/30 ,  C09J5/00 ,  C09J5/04 ,  C09J133/16 ,  G02B1/04 ,  G02B13/00

Abstract: Provided is a compound represented by Formula (1) given below. (In the formula, R1 represents a hydrogen atom or a methyl group, R2 represents a hydrogen atom, a phenyl group, a C1 to 8 alkyl group, or a C1 to 4 perfluoroalkyl group, X1 represents a hydrogen atom or a hydroxy group, Y1 represents a C1 to 9 alkylene group containing a fluorine atom or a C1 to 9 alkylene group containing no fluorine atom, and n1 is an integer from 0 to 3.).

公开(公告)号：US20240361582A1

公开(公告)日：2024-10-31

申请号：US18768299

申请日：2024-07-10

Applicant: Nikon Corporation

Inventor： Kosuke MACHIDA

IPC: G02B15/14 ,  G02B15/16

CPC classification number: G02B15/144105 ,  G02B15/16

Abstract: A zoom optical system comprises, in order from an object: a front lens group (GFS) having a positive refractive power; an M1 lens group (GM1) having a negative refractive power; an M2 lens group (GM2) having a positive refractive power; and an RN lens group (GRN) having a negative refractive power, wherein upon zooming, distances between the front lens group and the M1 lens group, between the M1 lens group and the M2 lens group, and between the M2 lens group and the RN lens group change, upon focusing from an infinite distant object to a short distant object, the RN lens group moves, and the M2 lens group comprises an A lens group that satisfies a following conditional expression, 1.10