Thiazolothiazole derivative
    41.
    发明授权
    Thiazolothiazole derivative 有权
    噻唑噻唑衍生物

    公开(公告)号:US07812172B2

    公开(公告)日:2010-10-12

    申请号:US12430361

    申请日:2009-04-27

    IPC分类号: C07D513/04

    CPC分类号: C07D513/04

    摘要: A thiazolothiazole derivative is represented by the following Formula (I). In Formula (I), each R1 independently represents a straight chain alkyl group having 3 to 20 carbon atoms, a straight chain alkoxy group having 3 to 20 carbon atoms, a branched alkyl group having 3 to 20 carbon atoms, or a branched alkoxy group having 3 to 20 carbon atoms; and each R2 independently represents a hydrogen atom, a straight chain alkyl group having 1 to 20 carbon atoms, a straight chain alkoxy group having 1 to 20 carbon atoms, a branched alkyl group having 3 to 20 carbon atoms, or a branched alkoxy group having 3 to 20 carbon atoms.

    摘要翻译: 噻唑并噻唑衍生物由下式(I)表示。 式(I)中,R 1各自独立地表示碳原子数3〜20的直链烷基,碳原子数3〜20的直链烷氧基,碳原子数3〜20的支链烷基或支链烷氧基 具有3至20个碳原子; R2各自独立地表示氢原子,碳原子数1〜20的直链烷基,碳原子数1〜20的直链烷氧基,碳原子数3〜20的支链烷基,或具有 3至20个碳原子。

    Substrate with parallax barrier layer, method for producing substrate with parallax barrier layer, and three-dimensional display
    45.
    发明授权
    Substrate with parallax barrier layer, method for producing substrate with parallax barrier layer, and three-dimensional display 有权
    具有视差屏障层的基板,具有视差屏障层的基板的制造方法以及三维显示

    公开(公告)号:US07420637B2

    公开(公告)日:2008-09-02

    申请号:US10522601

    申请日:2003-07-16

    IPC分类号: G02F1/1333

    摘要: The present invention provides a three-dimensional display device, which can display a 3D image of higher quality than a conventional one by arranging a parallax barrier layer with higher positioning accuracy, and a method for fabricating such a display device. The three-dimensional display device 100 includes a first substrate 11, which is provided closer to the viewer and which is made of a transparent material, a second substrate 21 arranged so as to face the first substrate 11, a liquid crystal layer 30 provided between the first substrate 11 and the second substrate 21, and a parallax barrier layer 12 provided on the surface of the first substrate so as to face the viewer. A polarizer 40 is further provided on the surface of the viewer-side substrate 10 that includes the parallax barrier layer 12 thereon.

    摘要翻译: 本发明提供一种三维显示装置,其可以通过布置具有较高定位精度的视差屏障层来显示比传统3D图像更高质量的3D图像,以及制造这种显示装置的方法。 三维显示装置100包括:靠近观察者设置并由透明材料制成的第一基板11,配置成与第一基板11相对配置的第二基板21,设置在第一基板11之间的液晶层30, 第一基板11和第二基板21以及设置在第一基板的表面上以面对观看者的视差屏障层12。 在其上包括视差屏障层12的观察者侧基板10的表面上还设有偏振片40。

    Mobile terminal
    46.
    发明申请
    Mobile terminal 失效
    移动终端

    公开(公告)号:US20080092082A1

    公开(公告)日:2008-04-17

    申请号:US11974244

    申请日:2007-10-12

    IPC分类号: G06F3/048

    CPC分类号: G06F3/0482

    摘要: According to an aspect of the invention, there is provided a mobile terminal including: an application processor configured to execute application having first mode and second mode, wherein the first mode includes first number of menus and the second mode includes second number of menus smaller than that of the first mode; a mode selection unit configured to input mode switching instruction; and a transition control unit configured to switch one of the first and second modes to another mode within the same application if the mode selection unit is operated.

    摘要翻译: 根据本发明的一个方面,提供了一种移动终端,包括:应用处理器,被配置为执行具有第一模式和第二模式的应用,其中所述第一模式包括第一数量的菜单,并且所述第二模式包括小于 第一种模式的; 模式选择单元,被配置为输入模式切换指令; 以及转换控制单元,被配置为如果所述模式选择单元被操作,则将所述第一和第二模式中的一个切换到同一应用内的另一模式。

    MULTI-IMAGE DISPLAY APPARATUS
    47.
    发明申请
    MULTI-IMAGE DISPLAY APPARATUS 审中-公开
    多图像显示设备

    公开(公告)号:US20070216805A1

    公开(公告)日:2007-09-20

    申请号:US11576520

    申请日:2005-09-30

    IPC分类号: H04N5/45

    CPC分类号: H04N13/359

    摘要: A multi-image display apparatus of the present invention displays a sub-screen which displays information indicative of a current display mode in each of (i) a screen image (left screen image) when viewed from the left side of a display section and (ii) a screen image (right screen image) when viewed from the right side of the display section. For example, in a case where a screen image A is displayed in the left screen image and a screen image B is displayed in the right screen image, the sub-screen displays an icon indicating a dual view mode. On the other hand, in a case where the screen image A is displayed in each of the left screen image and the right screen image, the sub-screen displays an icon indicating a single view mode.

    摘要翻译: 本发明的多图像显示装置在从显示部的左侧观察时(i)屏幕图像(左画面图像)和/或显示部分的左侧显示表示当前显示模式的信息的子屏幕, ii)从显示部分的右侧观看时的屏幕图像(右侧屏幕图像)。 例如,在左屏幕图像中显示屏幕图像A并且在右侧屏幕图像中显示屏幕图像B的情况下,子屏幕显示指示双重视图模式的图标。 另一方面,在屏幕图像A显示在左屏幕图像和右屏幕图像中的每一个中的情况下,子屏幕显示指示单视图模式的图标。

    Method of manufacturing semiconductor integrated circuit devices
    48.
    发明申请
    Method of manufacturing semiconductor integrated circuit devices 审中-公开
    制造半导体集成电路器件的方法

    公开(公告)号:US20070128556A1

    公开(公告)日:2007-06-07

    申请号:US11651977

    申请日:2007-01-11

    IPC分类号: G03F1/00 G03F7/00

    摘要: To alleviate the absolute value control accuracy of phases in a mask having a groove shifter structure, transfer regions formed at different planar positions on the same plane of the same mask are subjected to a multiple exposure by scanning exposure. Although. identical mask patterns are formed over the transfer regions respective groove shifters provided to these mask patterns are arranged opposite from each other.

    摘要翻译: 为了减轻具有凹槽移位结构的掩模中的相位的绝对值控制精度,形成在同一掩模的同一平面上的不同平面位置处的转印区域通过扫描曝光进行多次曝光。 虽然。 在传送区域上形成相同的掩模图案,设置在这些掩模图案上的相应的凹槽移位器相互布置。

    Magnetic resonance magnet system and imaging apparatus with extendable patient support arms
    49.
    发明授权
    Magnetic resonance magnet system and imaging apparatus with extendable patient support arms 失效
    磁共振磁体系统和具有可延伸的患者支撑臂的成像装置

    公开(公告)号:US06794871B2

    公开(公告)日:2004-09-21

    申请号:US10256749

    申请日:2002-09-27

    IPC分类号: G01V300

    摘要: For the purpose of always keeping the positional relationship fixed between a support section for supporting a supported object and a base section for receiving the support section, the present apparatus comprises: a support section 500 for horizontally supporting a supported object; a base section 112 having a horizontal plane on its top; and a position adjusting section 300 provided between the support section and the base section, for moving the support section forward/backward between a position above the horizontal plane and a position off the horizontal plane while keeping the support section at a level higher than the horizontal plane, and for moving the support section upward/downward between a position higher than the horizontal plane and a position lower than the horizontal plane at the position off the horizontal plane.

    摘要翻译: 本发明的装置包括:用于水平地支撑被支撑物体的支撑部分500;以及支撑部分,其用于支撑被支撑物体的支撑部分, 在其顶部具有水平面的基部112; 以及设置在所述支撑部和所述基部之间的位置调整部300,用于在将所述支撑部保持在比所述水平方向高的水平面的同时使所述支撑部在所述水平面上方的位置与所述水平面之间的位置之间前后移动 并且用于在高于水平面的位置和在离开水平面的位置处低于水平面的位置之间向上/向下移动支撑部分。

    Manufacturing method of semiconductor integrated circuit device
    50.
    发明授权
    Manufacturing method of semiconductor integrated circuit device 有权
    半导体集成电路器件的制造方法

    公开(公告)号:US06632744B2

    公开(公告)日:2003-10-14

    申请号:US09903580

    申请日:2001-07-13

    IPC分类号: H01L2100

    摘要: Densely disposed patterns constituting a semiconductor integrated circuit device are divided into a first mask pattern and a second mask pattern 28B such that a phase shifter S can be disposed, and a predetermined pattern is transferred on a semiconductor substrate by multiple-exposure thereof. The second mask pattern 28B has a main light transferring pattern 26c1, a plurality of auxiliary light transferring patterns 26c2 disposed thereabout, and a phase shifter S disposed in the main light transferring pattern 26c1. The auxiliary light transferring patterns 26c2 are disposed such that respective distances from a center of each thereof to a center of the main light transferring pattern 26c1 are substantially equal. With this arrangement, a densely disposed pattern is transferred with sufficient process transfer margin.

    摘要翻译: 构成半导体集成电路器件的密集布置的图案被分成第一掩模图案和第二掩模图案 28 B,使得可以布置移相器S,并且将预定图案 通过多次曝光在半导体衬底上转印。 第二个掩模图案 28 B具有主要的传输图案 26 c 多个辅助光传输图案 26 c BOLD> 设置在主光传输图案 26 c 中的移相器S. 辅助光传输图案 26 c 2 使得从其每一个的中心到主光传输图案 26 c 1 基本相等。 通过这种安排,密集布置的图案将以足够的工艺传送余量进行传送