Diffractive element in extreme-UV lithography condenser
    41.
    发明授权
    Diffractive element in extreme-UV lithography condenser 失效
    极紫外光刻冷凝器中的衍射元件

    公开(公告)号:US06285497B1

    公开(公告)日:2001-09-04

    申请号:US09615795

    申请日:2000-07-13

    IPC分类号: G02B508

    摘要: Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

    摘要翻译: 具有使用极紫外线投射光刻的衍射光栅的反射镜的冷凝器显着增强了关键尺寸控制。 衍射光栅具有以最小光损耗平滑照相机入射光瞳的照明效果。 建模表明,100 nm特征的临界尺寸控制可以从3 nm提高到小于约0.5 nm。

    Maskless lithography
    42.
    发明授权
    Maskless lithography 失效
    无掩模光刻

    公开(公告)号:US5870176A

    公开(公告)日:1999-02-09

    申请号:US878444

    申请日:1997-06-18

    IPC分类号: G02B26/08 G03F7/20 G03B27/42

    摘要: The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides.

    摘要翻译: 本发明提供一种无掩模光刻的方法。 多个独立可寻址和可旋转的微镜一起包括微镜的二维阵列。 可以将二维阵列中的每个微镜视为包括所需电路图案的图像中的可单独寻址的元件。 随着每个微镜被寻址,其旋转以将来自光源的光反射到光刻胶涂覆的晶片的一部分上,从而在电路图案内形成像素。 通过以适当的顺序电子地寻址这些微镜的二维阵列,可以在微芯片上构建由这些单独像素构成的电路图案。 微镜的反射表面被配置为克服相干和衍射效应,以便产生具有直边的电路元件。

    Apparatus and method for laser velocity interferometry
    44.
    发明授权
    Apparatus and method for laser velocity interferometry 失效
    激光速度干涉仪的设备和方法

    公开(公告)号:US5245473A

    公开(公告)日:1993-09-14

    申请号:US722995

    申请日:1991-06-28

    IPC分类号: G01P3/36

    CPC分类号: G01P3/366

    摘要: An apparatus and method for laser velocity interferometry employing a fixed interferometer cavity and delay element. The invention permits rapid construction of interferometers that may be operated by those non-skilled in the art, that have high image quality with no drift or loss of contrast, and that have long-term stability even without shock isolation of the cavity.

    摘要翻译: 一种采用固定干涉仪腔和延迟元件的激光速度干涉测量装置和方法。 本发明允许快速构建可由本领域技术人员操作的干涉仪,其具有高图像质量,没有漂移或失去对比度,并且即使没有腔体的震动隔离也具有长期稳定性。