公开(公告)号：US20140341462A1

公开(公告)日：2014-11-20

申请号：US14274972

申请日：2014-05-12

Applicant: KLA-Tencor Corporation

Inventor： Abdurrahman Sezginer ,  Gang Pan ,  Bing Li

IPC: G06T7/00 ,  G06K9/62

CPC classification number: G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/95676 ,  G01N2201/12 ,  G03F1/84 ,  G03F7/7065 ,  G06K9/6232 ,  G06K9/6252 ,  G06K9/6282 ,  G06N99/005 ,  G06T7/0008 ,  G06T2207/20081 ,  G06T2207/30148

Abstract: Apparatus and methods for inspecting a photolithographic reticle are disclosed. A reticle inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a reticle, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a reticle. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.

Abstract translation: 公开了用于检查光刻掩模版的装置和方法。 在一种或多种操作模式下使用掩模版检查工具来获得掩模版的多个训练区域的图像，并且将训练区域识别为无缺陷。 从训练区域的图像导出三个或更多个基础训练图像。 基于三个或更多个基础训练图像形成分类器。 在一个或多个操作模式下使用检查系统以获得掩模版的多个测试区域的图像。 三个或更多个基础测试图像来自测试区域。 分类器应用于三个或更多个基础测试图像，以在测试区域中发现缺陷。