Resistor formed using resistance patterns and semiconductor devices including the same
    41.
    发明授权
    Resistor formed using resistance patterns and semiconductor devices including the same 有权
    使用电阻图案形成的电阻和包括其的半导体器件

    公开(公告)号:US09520458B2

    公开(公告)日:2016-12-13

    申请号:US14718685

    申请日:2015-05-21

    CPC classification number: H01L28/20 H01L27/0629

    Abstract: Embodiments of the inventive concepts provide a resistor and a semiconductor device including the same. The resistor includes a substrate, a device isolation layer in the substrate which defines active regions arranged in a first direction a resistance layer including resistance patterns that vertically protrude from the active regions and are connected to each other in the first direction, and contact electrodes on the resistance layer.

    Abstract translation: 本发明构思的实施例提供一种电阻器和包括该电阻器的半导体器件。 电阻器包括衬底,衬底中的器件隔离层,其限定在第一方向上布置的有源区,包括从有源区垂直突出并在第一方向上彼此连接的电阻图案的电阻层,以及接触电极 电阻层。

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