公开(公告)号：US5917205A

公开(公告)日：1999-06-29

申请号：US850066

申请日：1997-05-02

Applicant: Tadashi Mitsui ,  Hieda Katsuhiko

Inventor： Tadashi Mitsui ,  Hieda Katsuhiko

IPC: H01L21/68 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L23/544

CPC classification number: G03F7/70633 ,  G03F9/70 ,  H01L23/544 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2223/5448 ,  H01L2924/0002 ,  Y10S438/975

Abstract: Photolithographic alignment marks (e.g., mask and measurement overlay marks) are formed of a pattern of very small marks using the design configuration and rule of a circuit pattern feature. A relatively large mark comprising a pattern of small marks modeled after the circuit pattern feature results in an etch rate within the mark area that is substantially the same as the etch rate in the circuit pattern (e.g., cell or peripheral circuit) area. This allows for simultaneous formation of circuit pattern features, and the alignment marks, in a common etching step, while avoiding underetching (shallow etch depth) due to a microloading effect. In this manner, proper formation of readily detectible marks is ensured.

Abstract translation: 使用电路图案特征的设计配置和规则，光刻对准标记（例如，掩模和测量覆盖标记）由非常小的标记的图案形成。 包括在电路图案特征之后建模的小标记图案的相对大的标记导致标记区域内的蚀刻速率与电路图案（例如，单元或外围电路）区域中的蚀刻速率基本相同。 这允许在通常的蚀刻步骤中同时形成电路图案特征和对准标记，同时避免由于微加载效应引起的不规则（浅蚀刻深度）。 以这种方式，确保容易发现的标记的适当形成。

公开(公告)号：US5702567A

公开(公告)日：1997-12-30

申请号：US457670

申请日：1995-06-01

Applicant: Tadashi Mitsui ,  Katsuhiko Hieda

Inventor： Tadashi Mitsui ,  Katsuhiko Hieda

IPC: H01L21/68 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L23/544

CPC classification number: G03F7/70633 ,  G03F9/70 ,  H01L23/544 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2223/5448 ,  H01L2924/0002 ,  Y10S438/975

Abstract: Photolithographic alignment marks (e.g., mask and measurement overlay marks) are formed of a pattern of very small marks using the design configuration and rule of a circuit pattern feature. A relatively large mark comprising a pattern of small marks modeled after the circuit pattern feature results in an etch rate within the mark area that is substantially the same as the etch rate in the circuit pattern (e.g., cell or peripheral circuit) area. This allows for simultaneous formation of circuit pattern features, and the alignment marks, in a common etching step, while avoiding underetching (shallow etch depth) due to a microloading effect. In this manner, proper formation of readily detectible marks is ensured.

Abstract translation: 使用电路图案特征的设计配置和规则，光刻对准标记（例如，掩模和测量覆盖标记）由非常小的标记的图案形成。 包括在电路图案特征之后建模的小标记图案的相对大的标记导致标记区域内的蚀刻速率与电路图案（例如，单元或外围电路）区域中的蚀刻速率基本相同。 这允许在通常的蚀刻步骤中同时形成电路图案特征和对准标记，同时避免由于微加载效应引起的不规则（浅蚀刻深度）。 以这种方式，确保容易发现的标记的适当形成。

公开(公告)号：US5491339A

公开(公告)日：1996-02-13

申请号：US308420

申请日：1994-09-19

Applicant: Tadashi Mitsui ,  Nozomu Harada ,  Motosuke Miyoshi ,  Makoto Sekine ,  Katsuya Okumura ,  Haruo Okano

Inventor： Tadashi Mitsui ,  Nozomu Harada ,  Motosuke Miyoshi ,  Makoto Sekine ,  Katsuya Okumura ,  Haruo Okano

IPC: H01L31/09 ,  H01J37/244

CPC classification number: H01J37/244

Abstract: According to this invention, there is provided a charged particle detection device including a semiconductor substrate, an insulating film formed on the semiconductor substrate, an electrode formed on the insulating film, a member for forming a potential well, which is constituted by a depletion layer, near a surface of the semiconductor substrate under the electrode, a member for sweeping, into the semiconductor substrate, charges which are generated in the semiconductor substrate by charged particles incident from the electrode and are stored in the potential well, and a member for detecting signal charges generated by the charged particles swept into the semiconductor substrate.

Abstract translation: 根据本发明，提供了一种带电粒子检测装置，其包括半导体衬底，形成在半导体衬底上的绝缘膜，形成在绝缘膜上的电极，用于形成势阱的构件，其由耗尽层 在电极下方的半导体衬底的表面附近，将从电极入射的带电粒子在半导体衬底中产生的电荷扫描到半导体衬底中并存储在势阱中的元件，以及用于检测 由带电粒子产生的信号电荷扫入半导体衬底。

公开(公告)号：US4939494A

公开(公告)日：1990-07-03

申请号：US342216

申请日：1989-04-24

Applicant: Yoshiaki Masuda ,  Hiraku Imaizumi ,  Takashi Shioura ,  Tadashi Mitsui ,  Tokio Tadano

Inventor： Yoshiaki Masuda ,  Hiraku Imaizumi ,  Takashi Shioura ,  Tadashi Mitsui ,  Tokio Tadano

IPC: H01F27/02 ,  H01F27/29

CPC classification number: H01F27/022 ,  H01F27/292 ,  H01F2005/043 ,  H01F2005/046

Abstract: A surface-mounted-type inductance element comprising a coil structure having a bobbin; the bobbin including a portion around which wires are coiled, a pair of flanges integrally formed at opposing ends of the bobbin, a pair of bases integrally formed at lower edge portions of the flanges in a manner to project laterally from the flanges, and a plurality of external terminals attached to each of the bases in a manner to penetrate the base, each the external terminal including a first portion projecting laterally from the base and a second portion projecting downward from the base, around which first portion of each the external terminal a termination of any one of the wires is wound; a mold covering the coil structure in a manner to allow the second portions of the external terminals to be projected outward from the mold, the mold being formed of resin material exhibiting heat resistance; and a pair of cores assembled to the coil structure through the mold.

Abstract translation: 一种表面安装型电感元件，包括具有线轴的线圈结构; 所述线轴包括线圈绕线的部分，在所述线轴的相对端部一体形成的一对凸缘，以从所述凸缘侧向突出的方式一体形成在所述凸缘的下边缘部的一对基座， 外部端子以穿过基座的方式附接到每个基座，每个外部端子包括从基部横向突出的第一部分和从基部向下突出的第二部分，每个外部端子的第一部分 任何一根电线的端接被缠绕; 模具，其以允许外部端子的第二部分从模具向外突出的方式覆盖线圈结构，模具由具有耐热性的树脂材料形成; 以及通过模具组装到线圈结构的一对芯。

公开(公告)号：USD280810S

公开(公告)日：1985-10-01

申请号：US389900

申请日：1982-06-18

Applicant: Tadashi Mitsui

Designer： Tadashi Mitsui

公开(公告)号：US4352080A

公开(公告)日：1982-09-28

申请号：US188978

申请日：1980-09-19

Applicant: Tadashi Mitsui ,  Masaru Wasaki ,  Junpei Ohta

Inventor： Tadashi Mitsui ,  Masaru Wasaki ,  Junpei Ohta

IPC: H01F3/08 ,  H01F17/04 ,  H01F27/255 ,  H01F27/24

CPC classification number: H01F17/04

Abstract: The new structure of a ferrite core for the use of a power transformer and/or a choke coil has been found. The core is assembled by a pair of identical core halves, and each of core half comprises (a) a circular center boss(12), (b) a pair of outer walls(14,16) positioned at both the sides of said boss(12) so that a fan-shaped empty space is provided between the circular boss(12) and a pair of outer walls(14,16) for mounting a coil, (c) a pair of base plates(18,20) coupling said boss(12) with said outer walls(14,16) at the extreme end of those members so that those members conform substantially with the E-shaped structure, (d) the other extreme end of said boss(12), the outer walls(14,16) and the base plates(18,20) residing on a single plane, (e) each of said outer walls(14,16) being essentially rectangular with the external linear wall and the inner curved wall which is coaxial with the circular boss(12), and the width(d.sub.2) of said external linear wall is larger than the diameter(d.sub.3) of the circular boss(12), (f) each of said base plates(18,20) being essentially in the sector shaped having a pair of tapers which are gradually opened towards the outer walls(14,16), (g) the area(S.sub.3) coupling the base plates(18,20) with the outer walls(14,16) being larger than the half of the cross sectional area(1/4.pi.d.sub.3.sup.2) of the boss(12), (h) the area(S.sub.2) coupling the boss(12) with the base plates(18,20) being substantially the same as half of the cross sectional area(1/4.pi.d.sub.3.sup.2) of the boss(12), and (i) the area(S.sub.1) of the cross section of each of the outer walls(14,16) being essentially the same as half of the cross sectional area(1/4.pi.d.sub.3.sup.2) of the boss(12).

Abstract translation: 已经发现用于使用电力变压器和/或扼流线圈的铁氧体磁心的新结构。 芯部由一对相同的半部组装，每个芯部半部包括（a）圆形中心凸台（12），（b）一对外壁（14,16），其位于所述凸台的两侧 （12），使得在所述圆形凸台（12）和用于安装线圈的一对外壁（14,16）之间设置扇形空的空间，（c）一对基板（18,20），其联接 所述凸台（12）具有位于这些构件的最前端的所述外壁（14,16），使得这些构件基本上符合E形结构，（d）所述凸台（12）的另一端， 壁（14,16）和位于单个平面上的基板（18,20），（e）每个所述外壁（14,16）基本上是矩形的，外部线性壁和内部弯曲壁是同轴的 与圆形凸台（12）的宽度（d2）大于圆形凸台（12）的直径（d3），（f）每个所述基板（18,20）基本上是 在扇形形状 朝向外壁（14,16）逐渐打开的一对锥体，（g）将基板（18,20）与外壁（14,16）联接的区域（S3）大于 凸台（12）的横截面积（1/4 pi d32），（h）将凸台（12）与基板（18,20）联接的区域（S2）基本上与十字架的一半相同 凸台（12）的截面面积（1/4 pi d32），和（i）每个外壁（14,16）的横截面的面积（S1）基本上与横截面的一半相同 凸台（12）的面积（1/4 pi d32）。

公开(公告)号：US09153419B2

公开(公告)日：2015-10-06

申请号：US13071360

申请日：2011-03-24

Applicant: Tadashi Mitsui

Inventor： Tadashi Mitsui

IPC: H01J37/28 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A pattern defect inspection method includes generating electron beam irradiation point track data on the basis of first data on an inspection target pattern, irradiating the electron beam to the inspection target pattern in accordance with the electron beam irradiation point track data, detecting secondary electrons generated from the inspection target pattern due to the irradiation of the electron beam, acquiring second data regarding a signal intensity of the secondary electrons from a signal of the detected secondary electrons, and detecting an abnormal point from the second data and outputting the abnormal point as a defect of the inspection target pattern. The electron beam irradiation point track data includes data on a track of irradiation points of an electron beam to the inspection target pattern and is intended to control over scanning with the electron beam, the electron beam irradiation point track data.

Abstract translation: 图案缺陷检查方法包括根据检查目标图案上的第一数据产生电子束照射点轨道数据，根据电子束照射点轨迹数据将电子束照射到检查对象图案，检测从 由于电子束的照射引起的检查对象图案，从检测到的二次电子的信号获取关于二次电子的信号强度的第二数据，并从第二数据检测出异常点，并将该异常点输出为缺陷 的检查目标模式。 电子束照射点轨道数据包括关于电子束到检查目标图案的照射点的轨迹的数据，并且旨在用电子束，电子束照射点轨迹数据控制扫描。

公开(公告)号：US08144969B2

公开(公告)日：2012-03-27

申请号：US12367273

申请日：2009-02-06

Applicant: Tadashi Mitsui

Inventor： Tadashi Mitsui

IPC: G06K9/00

CPC classification number: G06T7/0004 ,  G06K9/4604 ,  G06K2209/19

Abstract: A pattern evaluation method includes: acquiring data of a design pattern for an evaluation pattern to detect a first edge of the design pattern; acquiring an image of the evaluation pattern to detect a second edge of the evaluation pattern; dividing the first edge into first linear parts and first corner parts; performing matching of the first and second edges to obtain correspondence between the first and second edges; dividing the second edge into second linear parts and second corner parts based on the correspondence between the first and second edges; and evaluating the evaluation pattern based on at least one of the second linear parts and the second corner parts.

Abstract translation: 图案评估方法包括：获取用于评估图案的设计图案的数据，以检测设计图案的第一边缘; 获取所述评估图案的图像以检测所述评估图案的第二边缘; 将第一边缘分成第一直线部分和第一角部; 执行第一和第二边缘的匹配以获得第一和第二边缘之间的对应关系; 基于第一和第二边缘之间的对应关系将第二边缘分成第二直线部分和第二拐角部分; 以及基于所述第二线性部分和所述第二角部中的至少一个来评估所述评估模式。

公开(公告)号：US08090192B2

公开(公告)日：2012-01-03

申请号：US11785782

申请日：2007-04-20

Applicant: Tadashi Mitsui

Inventor： Tadashi Mitsui

IPC: G06K9/00

CPC classification number: G06T7/001 ,  G06T2207/30148 ,  H01L21/67253 ,  H01L21/67288

Abstract: A pattern misalignment measurement method includes acquiring an inspection image of a composite pattern formed by superposing a plurality of kinds of element patterns on each other, acquiring reference images of at least two kinds of element patterns from reference images which are images of reference patterns of the plurality of kinds of element patterns, performing first matching of each of the acquired reference images with the inspection image, and outputting misalignment between the element patterns in the composite pattern on the basis of the result of the first matching.

Abstract translation: 图案未对准测量方法包括获取通过将多种元素图案叠加而形成的复合图案的检查图像，从作为参考图案的参考图像的参考图像的参考图像中获取至少两种元素图案的参考图像 多种元素图案，基于第一匹配的结果，将所获取的参考图像中的每一个与检查图像进行第一匹配，并且输出复合图案中的元素图案之间的未对准。

公开(公告)号：US08045807B2

公开(公告)日：2011-10-25

申请号：US12564515

申请日：2009-09-22

Applicant: Tadashi Mitsui

Inventor： Tadashi Mitsui

IPC: G06K9/48 ,  H03F7/00 ,  H03F3/04

CPC classification number: G06K9/4604

Abstract: A pattern edge detecting method includes: detecting edge points in an image of an inspection pattern acquired from an imaging device; generating a plurality of edge lines from the edge points using a grouping process; generating a plurality of edge line group pairs, each composed of a combination of first and second edge line groups to be a candidate of any of one and the other of an outside edge and an inside edge of the inspection pattern, the generated edge lines being divided into two parts in different manners; performing shape matching between the first and second edge line groups for each edge line group pair; and specifying, as an edge of the inspection pattern, one of the first and second edge line groups constituting the edge line group pair whose matching score is best of matching scores of the edge line group pairs obtained during the shape matching.

Abstract translation: 图案边缘检测方法包括：检测从成像装置获取的检查图案的图像中的边缘点; 使用分组处理从边缘点生成多条边缘线; 生成多个边缘线组对，每个边缘线组对由第一和第二边缘线组的组合构成为检查图案的外边缘和内边缘中的任一个的候选者，所生成的边缘线为 以不同的方式分为两部分; 对每个边缘线组对进行第一和第二边缘线组之间的形状匹配; 并且作为检查图案的边缘，指定构成边缘线组对的第一和第二边缘线组中的一个，其匹配分数最佳地匹配在形状匹配期间获得的边缘线组对的分数。