公开(公告)号：US06632512B1

公开(公告)日：2003-10-14

申请号：US09787954

申请日：2001-03-23

申请人： Yasutaka Ito

发明人： Yasutaka Ito

IPC分类号： B32B300

CPC分类号： H01L23/49827 ,  H01L21/6833 ,  H01L2924/0002 ,  H02N13/00 ,  Y10T428/24917 ,  Y10T428/24926 ,  H01L2924/00

摘要： The present invention provides a ceramic substrate for use in an apparatus for manufacturing and inspecting semiconductors. The ceramic substrate comprises a through-hole having excellent tolerance performance against a drawing stress applied to an external terminal pin. The through-hole is provided with a projection which protrudes into the ceramic substrate made of aluminum nitride as primary component.

摘要翻译： 本发明提供一种用于半导体制造和检查装置的陶瓷基板。 陶瓷基板包括对施加到外部端子销的拉伸应力具有优异的公差性能的通孔。 通孔设置有突出到作为主要部件的由氮化铝制成的陶瓷基板中的突起

公开(公告)号：US08582722B2

公开(公告)日：2013-11-12

申请号：US12875559

申请日：2010-09-03

申请人： Chiharu Tadokoro ,  Yasutaka Ito ,  Hitoshi Hattori ,  Ryoichi Takahashi ,  Tetsuya Yonezawa ,  Hironori Nakamuta

发明人： Chiharu Tadokoro ,  Yasutaka Ito ,  Hitoshi Hattori ,  Ryoichi Takahashi ,  Tetsuya Yonezawa ,  Hironori Nakamuta

IPC分类号： H01J35/10

CPC分类号： H01J35/101 ,  H01J2235/106 ,  H01J2235/1086

摘要： A rotary anode X-ray tube apparatus according to an embodiment of the present invention includes a stationary shaft, a cooling bath that is provided in the stationary shaft, a rotary cylinder that is rotatably supported to the stationary shaft, a target that is provided in the rotary cylinder, a cathode that is disposed to face the target, and a vacuum enclosure that stores these components. The stationary shaft has a large-diameter portion provided in a portion thereof and is provided with a flow passage through which a cooling fluid flows. The cooling bath is provided by thinning the wall thickness of the large-diameter portion to increase the flow passage diameter of a portion of the flow passage. The rotary cylinder covers an area of the stationary shaft including the large-diameter portion through a liquid metal and is rotatably supported to the stationary shaft. The target has a hollow circular plate shape that is provided on an outer circumferential surface of the rotary cylinder. The vacuum enclosure stores the stationary shaft, the rotary cylinder, the target, and the cathode and supports the stationary shaft.

摘要翻译： 根据本发明实施例的旋转阳极X射线管装置包括固定轴，设置在固定轴中的冷却槽，可旋转地支撑在固定轴上的旋转圆筒，设置在 旋转圆筒，设置为面对靶的阴极和存储这些部件的真空外壳。 固定轴具有设置在其一部分中的大直径部分，并且设置有冷却流体流过的流动通道。 通过减薄大直径部分的壁厚来提供冷却浴，以增加流路的一部分的流路直径。 旋转圆筒通过液体金属覆盖包括大直径部分的固定轴的区域，并且可旋转地支撑在固定轴上。 目标具有设置在旋转圆筒的外周面上的中空圆板形状。 真空外壳存放固定轴，旋转圆筒，目标和阴极，并支撑固定轴。

公开(公告)号：US08201584B2

公开(公告)日：2012-06-19

申请号：US12516374

申请日：2008-06-19

申请人： Yasutaka Ito ,  Jin Wakamatsu

发明人： Yasutaka Ito ,  Jin Wakamatsu

IPC分类号： F16L9/14

CPC分类号： F01N13/141 ,  C23C24/00 ,  C23C26/00 ,  F01N13/08 ,  F01N13/082 ,  F01N13/16 ,  F01N2260/02 ,  F01N2260/08 ,  F01N2260/20 ,  F01N2510/02 ,  F01N2530/26

摘要： An object of the present invention is to provide an exhaust pipe that can lower the temperature of exhaust gases when the exhaust gases having a high temperature pass through the exhaust pipe. The exhaust pipe of the present invention, which allows exhaust gases to flow through the exhaust pipe, comprises a base that contains metal and has a cylindrical shape; and a surface-coating layer that contains a plurality of crystalline inorganic materials and an amorphous binder and is formed on the outer peripheral face of the base, wherein the plurality of crystalline inorganic materials are distributed in the surface-coating layer, in an accumulative manner in a thickness direction, and the amorphous binder has an average thickness of 20 μm or less at a location nearer the outer peripheral face of the exhaust pipe than a location of the crystalline inorganic materials.

摘要翻译： 本发明的目的是提供一种排气管，其能够在具有高温的废气通过排气管时降低废气的温度。 本发明的排气管，其允许废气流过排气管，包括含有金属并具有圆柱形状的基座; 以及包含多个结晶无机材料和无定形粘合剂并且形成在所述基材的外周面上的表面被覆层，其中所述多个结晶无机材料以累积的方式分布在所述表面被覆层中 并且所述无定形粘合剂在比所述结晶无机材料的位置更靠近所述排气管的外周面的位置处具有20μm以下的平均厚度。

公开(公告)号：US20110000575A1

公开(公告)日：2011-01-06

申请号：US12516374

申请日：2008-06-19

申请人： Yasutaka Ito ,  Jin Wakamatsu

发明人： Yasutaka Ito ,  Jin Wakamatsu

IPC分类号： F16L9/00

CPC分类号： F01N13/141 ,  C23C24/00 ,  C23C26/00 ,  F01N13/08 ,  F01N13/082 ,  F01N13/16 ,  F01N2260/02 ,  F01N2260/08 ,  F01N2260/20 ,  F01N2510/02 ,  F01N2530/26

摘要： An exhaust pipe devised to, at the flow of high-temperature exhaust gas through the exhaust pipe, lower the temperature of the exhaust gas. The exhaust pipe has the following characteristics. The exhaust pipe has a tubular base material of metal and, provided on the outer circumferential surface of the base material, a surface coating layer composed of a crystalline inorganic material and an amorphous binder material. In the surface coating layer, the crystalline inorganic material is distributed in the state of being multiply stacked one upon another in the direction of thickness of the surface coating layer. The average thickness of the amorphous binder material located on the side of outer circumferential surface relative to the crystalline inorganic material is 20 μm or less. The exhaust gas flows through the interior of the pipe.

摘要翻译： 排气管设计成在通过排气管的高温废气的流动下，降低废气的温度。 排气管具有以下特点。 排气管具有金属的管状基材，并且在基材的外周面上设置由结晶无机材料和无定形粘合剂材料构成的表面被覆层。 在表面被覆层中，结晶性无机材料以表面被覆层的厚度方向相互叠层的状态分布。 位于外周面相对于结晶无机材料侧的无定形粘合剂材料的平均厚度为20μm以下。 废气流过管道内部。

公开(公告)号：US20100269939A1

公开(公告)日：2010-10-28

申请号：US12447272

申请日：2008-06-19

申请人： Yasutaka Ito ,  Jin Wakamatsu

发明人： Yasutaka Ito ,  Jin Wakamatsu

IPC分类号： F28F13/12 ,  F16L9/14

CPC分类号： F01N13/08 ,  C23C24/00 ,  C23C24/08 ,  C23C24/10 ,  C23C26/00 ,  F01N13/141 ,  F01N13/16 ,  F01N2240/02

摘要： An object of the present invention is to provide an exhaust pipe in which a peeling of a constituent member does not occur and reliability thereof is excellent, and an exhaust pipe allowing exhaust gases to flow through the exhaust pipe of the present invention includes a heat-releasing layer containing a crystalline inorganic material and an amorphous inorganic material and having infrared emissivity higher than infrared emissivity of a base, wherein irregularities are formed on a surface of the base on which the heat-releasing layer is to be formed.

摘要翻译： 本发明的目的是提供一种排气管，其中不会发生构成构件的剥离，并且其可靠性优异，并且允许废气流过本发明的排气管的排气管包括： 包含结晶无机材料和无定形无机材料并且具有高于基底的红外发射率的红外发射率的释放层，其中在要形成所述散热层的基底的表面上形成不规则性。

公开(公告)号：US20060088692A1

公开(公告)日：2006-04-27

申请号：US10969945

申请日：2004-10-22

申请人： Yasutaka Ito ,  Yasuji Hiramatsu

发明人： Yasutaka Ito ,  Yasuji Hiramatsu

IPC分类号： G11B5/64 ,  B32B9/00

CPC分类号： C04B35/581 ,  C04B35/6264 ,  C04B35/645 ,  C04B2235/3225 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/6025 ,  C04B2235/963 ,  H01L21/68757 ,  H01L21/68785 ,  Y10T428/24355

摘要： A ceramic plate for a semiconductor producing/examining device, including a ceramic substrate having a heating surface for receiving a semiconductor wafer thereon or facing the semiconductor wafer at a given distance apart therefrom. The ceramic substrate has a surface roughness Rmax of about 0.1 to 250 μm according to JIS R 0601, and a difference between a surface roughness of the heating surface and a surface roughness of the bottom surface is 50% or less.

摘要翻译： 一种用于半导体制造/检查装置的陶瓷板，包括具有用于在其上接收半导体晶片或面向半导体晶片的加热表面的陶瓷基板，该半导体晶片与该半导体晶片隔开一定距离。 根据JIS R 0601，陶瓷基板的表面粗糙度Rmax为约0.1〜250μm，加热面的表面粗糙度与底面的表面粗糙度之差为50％以下。

公开(公告)号：US20050141845A1

公开(公告)日：2005-06-30

申请号：US10500866

申请日：2003-01-24

申请人： Mikio Mori ,  Hajime Sakamoto ,  Yasutaka Ito

发明人： Mikio Mori ,  Hajime Sakamoto ,  Yasutaka Ito

IPC分类号： G02B6/12 ,  G02B6/42 ,  G02B6/00

CPC分类号： G02B6/12007 ,  G02B6/4201 ,  G02B6/4271 ,  G02B2006/12135

摘要： A temperature controller and temperature control element, whose plate-surface temperature distribution is highly homogeneous, which can be used in a waveguide type optical module. In a waveguide type optical module a temperature control element is supported on a pedestal inside a casing and an optical waveguide is mounted on the temperature control element. The temperature control element includes a plate having a heater or heat absorber provided on the non-heating side thereof or buried therein. The pedestal is provided to support the plate mainly in contact with the non-heating side of the plate. A total area of contact of the pedestal with the plate including an area of contact with the heater or heat absorber is set to over 30% of the area of the non-heating side of the plate and a sum of surface roughness of the pedestal and those of both the plate and heater is set to over 0.05 μm.

摘要翻译： 一种温度控制器和温度控制元件，其板表面温度分布高度均匀，可用于波导型光学模块。 在波导型光学模块中，温度控制元件被支撑在壳体内的基座上，并且光波导安装在温度控制元件上。 温度控制元件包括具有设置在其非加热侧上或埋入其中的加热器或吸热体的板。 基座设置成主要与板的非加热侧接触地支撑板。 基座与板的接触面积与加热器或吸热体的接触面积的总面积设定为板的非加热侧面积的30％以上，基座的表面粗糙度与 板和加热器的设置为0.05毫米以上。

公开(公告)号：US06878907B2

公开(公告)日：2005-04-12

申请号：US10277818

申请日：2002-10-23

申请人： Yasuji Hiramatsu ,  Yasutaka Ito

发明人： Yasuji Hiramatsu ,  Yasutaka Ito

IPC分类号： B23Q3/15 ,  H01L21/00 ,  H01L21/66 ,  H01L21/683 ,  H05B3/12 ,  H05B3/14 ,  H05B3/18 ,  H05B3/20 ,  H05B3/26 ,  H05B3/74 ,  H05B3/68

CPC分类号： H01L21/67103 ,  H01L21/6831 ,  H01L21/6833 ,  H05B3/143 ,  H05B3/265 ,  H05B3/74

摘要： It is a an object of the present invention to provide a ceramic substrate for a semiconductor producing/examining device which has high fracture toughness value, exellent thermal shock resistivity, high thermal conductivity and an excellent temperature rising and falling properties, and is preferable as a hot plate, an electrostatic chuck, a wafer prober and the like. A ceramic substrate, for a semiconductor producing/examining device, having a conductor formed inside thereof or on the surface thereof of the present invention is the ceramic substrate, wherein said ceramic substrate has been sintered such that a fractured section thereof exhibits intergranular fracture.

摘要翻译： 本发明的目的是提供一种具有高断裂韧性值，高耐热冲击电阻率，高导热性和优异的升温和降温性能的半导体制造/检查装置用陶瓷基板，优选为 热板，静电卡盘，晶片探测器等。 在本发明的内部或其表面上形成有导体的半导体制造/检查装置的陶瓷基板是陶瓷基板，其中所述陶瓷基板已被烧结，使得其断裂部分呈现晶间断裂。

公开(公告)号：US06878906B2

公开(公告)日：2005-04-12

申请号：US10111980

申请日：2001-08-30

申请人： Yasutaka Ito ,  Atsushi Ito

发明人： Yasutaka Ito ,  Atsushi Ito

IPC分类号： H01L21/00 ,  H05B3/68

CPC分类号： H01L21/67248 ,  H01L21/67109

摘要： An object of the present invention is to provide a ceramic heater for a semiconductor producing/examining device which is capable of accurately measuring the temperature of an object to be heated and evenly heating the whole body of a silicon wafer by adjusting the heating state of a heating element based on the temperature measurement result, and the ceramic heater for a semiconductor producing/examining device of the present invention is a ceramic heater including a ceramic substrate and a heating element formed on the surface or the inside of the ceramic substrate, wherein a temperature measurement element is formed while being brought into contact with the ceramic substrate and the surface roughness of the ceramic substrate brought into contact with the temperature measurement element is Ra≦5 μm.

摘要翻译： 本发明的目的是提供一种用于半导体制造/检查装置的陶瓷加热器，其能够精确地测量被加热物体的温度并且通过调节硅片的加热状态来均匀地加热硅晶片的整体 基于温度测量结果的加热元件和本发明的半导体制造/检查装置用陶瓷加热器是陶瓷加热器，其包括形成在陶瓷基板的表面或内部的陶瓷基板和加热元件，其中， 在与陶瓷基板接触的同时形成温度测量元件，并且与温度测量元件接触的陶瓷基板的表面粗糙度Ra <= 5MUM。

公开(公告)号：US20050029244A1

公开(公告)日：2005-02-10

申请号：US10943974

申请日：2004-09-20

申请人： Yasutaka Ito ,  Yasuji Hiramatsu

发明人： Yasutaka Ito ,  Yasuji Hiramatsu

IPC分类号： C04B35/00 ,  C04B35/581 ,  H01L21/027 ,  H01L21/66 ,  H01L21/68 ,  H01L21/683 ,  H05B3/02 ,  H05B3/14 ,  H05B3/20 ,  H05B3/18 ,  H05B3/68

CPC分类号： H01L21/6835 ,  C04B35/00 ,  C04B35/581 ,  H01L21/6833 ,  H01L2924/30105

摘要： A ceramic substrate for semiconductor manufacture and/or inspection which is conducive to decrease in α-rays radiated, to prevent electrical errors, and to decrease an electrostatic chucking force such as heater or wafer prober, generation of particles, and circuit defects. The ceramic substrate is configured such that the level of α-rays radiated from the surface of the ceramic substrate is not higher than 0.250 c/cm2·hr.

摘要翻译： 用于半导体制造和/或检查的陶瓷衬底，其有助于减少辐射的α射线，以防止电气错误，并且降低诸如加热器或晶片探针的静电吸附力，产生颗粒和电路缺陷。 陶瓷基板被配置为使得从陶瓷基板的表面辐射的α射线的水平不高于0.250c / cm 2·hr。