公开(公告)号：US20190143454A1

公开(公告)日：2019-05-16

申请号：US16182911

申请日：2018-11-07

Applicant: Advanced Technology Inc.

Inventor： Byoung-Chan CHOI ,  Yong Cheol CHOI ,  Ho Kyeng CHOI ,  Young Hun SONG ,  Ki Won JUNG ,  Doo Baeck AN

IPC: B23K26/352 ,  B23K26/00 ,  B23K26/03 ,  B23K26/042 ,  B23K26/06 ,  B23K26/0622 ,  B23K26/082

Abstract: A laser patterning apparatus of a three-dimensional object to be processed, which includes a laser generation unit, a first beam adjustment unit for adjusting the magnitude of a laser beam generated in the laser generation unit, a second beam adjustment unit for adjusting the focal location of z-axis, x-axis, and y-axis of the laser beam via the first beam adjustment unit, and a control unit for controlling the second beam adjustment unit so that laser patterning is performed on a three-dimensional object to be processed.

公开(公告)号：US20170261114A1

公开(公告)日：2017-09-14

申请号：US15529489

申请日：2015-11-24

Applicant: Genesis Advanced Technology Inc.

Inventor： James Brent Klassen

IPC: F16K31/00 ,  G05G5/04 ,  H01H3/42 ,  G05G3/00

Abstract: A control element having a beam member divided into an actuation section and a valve section positioned on opposing sides of a pivot member, in which active control of the actuation section causes buckling of the valve section to bring the valve section from a closed state to an open state or causes relaxing of the valve section to bring the valve section from an open state to a closed state.