Method and Apparatus for Improving Measurement Accuracy
    51.
    发明申请
    Method and Apparatus for Improving Measurement Accuracy 有权
    提高测量精度的方法和装置

    公开(公告)号:US20160231241A1

    公开(公告)日:2016-08-11

    申请号:US15013348

    申请日:2016-02-02

    Inventor: Nitesh PANDEY

    Abstract: An optical system (10) includes an arrangement for splitting a source beam into a measurement beam and a reference beam. The reference beam is reflected off a reflective element (42) which mounted on a delay line (44). A target (35) scatters the radiation from the measurement beam. The scattered radiation and the reference beam are brought to interfere on a detector (40) by calibrating the delay line (44). The detected interference pattern is Fourier-transformed and filtered to select a region of interest around a side-band of the Fourier-transformed interference pattern in order to remove noise caused by stray radiation that hits the detector.

    Abstract translation: 光学系统(10)包括用于将源光束分成测量光束和参考光束的装置。 参考光束从安装在延迟线(44)上的反射元件(42)反射。 目标(35)散射来自测量光束的辐射。 通过校准延迟线(44)使分散的辐射和参考光束在检测器(40)上产生干涉。 检测到的干涉图案被傅立叶变换和滤波,以选择傅立叶变换干涉图案的边带周围的感兴趣区域,以便消除由检测器引起的杂散辐射引起的噪声。

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