Refractive projection objective for immersion lithography
    51.
    发明授权
    Refractive projection objective for immersion lithography 有权
    用于浸没光刻的折射投影物镜

    公开(公告)号:US07312847B2

    公开(公告)日:2007-12-25

    申请号:US11085602

    申请日:2005-03-22

    摘要: A purely refractive projection objective suitable for immersion micro-lithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with a negative refracting power, a second lens group with a positive refracting power, a third lens group with a negative refracting power, a fourth lens group with a positive refracting power and a fifth lens group with a positive refracting power are provided. The system aperture is in the region of maximum beam diameter between the fourth and the fifth lens group. Embodiments of projection objectives according to the invention achieve a very high numerical aperture of NA>1 in conjunction with a large image field, and are distinguished by a good optical correction state and moderate overall size. Pattern widths substantially below 100 nm can be resolved when immersion fluids are used between the projection objective and substrate in the case of operating wavelengths below 200 nm.

    摘要翻译: 适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统,在具有负折射光焦度的第一透镜组,具有正折射光焦度的第二透镜组, 提供具有负折射率的第三透镜组,具有正折射率的第四透镜组和具有正折射率的第五透镜组。 系统孔径在第四和第五透镜组之间的最大光束直径的区域中。 根据本发明的投影物镜的实施例与大图像场一起实现了NA> 1的非常高的数值孔径,并且通过良好的光学校正状态和适度的总体尺寸来区分。 在波长低于200nm的情况下,当在投影物镜和基底之间使用浸液时,可以解析出大致低于100nm的图案宽度。

    Compact 1½-waist system for sub 100 nm ArF lithography
    52.
    发明授权
    Compact 1½-waist system for sub 100 nm ArF lithography 有权
    紧凑的1½腰系统用于亚100 nm ArF光刻

    公开(公告)号:US06906866B2

    公开(公告)日:2005-06-14

    申请号:US10688212

    申请日:2003-10-15

    CPC分类号: G03F7/70241 G02B13/143

    摘要: According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first lens group having negative refractive power; and (2) at least three other lens groups having a positive refractive power and at least one other lens group having a negative refractive power. In one embodiment, the projections lens includes a second lens group having a positive refractive power; a third lens group having a negative refractive power; and fourth, fifth and sixth lens groups having overall positive refractive power. The projection lens having a numerical aperture of at least about 0.85 and is of a 1½ waist construction, with the ½ waist defined in the first lens group and a primary waist is defined in the third lens group.

    摘要翻译: 根据一个示例性实施例,提供具有物平面和像平面的投影透镜,并且包括以成像方式对象地列出的以下透镜组:(1)具有负屈光力的第一透镜组; 和(2)具有正屈光力的至少三个其它透镜组和具有负屈光力的至少一个其它透镜组。 在一个实施例中,投影透镜包括具有正折光力的第二透镜组; 具有负屈光力的第三透镜组; 以及具有总正正屈光力的第四,第五和第六透镜组。 投影透镜具有至少约0.85的数值孔径,并且具有1/2腰围结构,其中限定在第一透镜组中的1/2腰围和初级腰围限定在第三透镜组中。