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公开(公告)号：US20050083583A1
公开(公告)日：2005-04-21
申请号：US10688212
申请日：2003-10-15
CPC分类号： G03F7/70241 , G02B13/143
摘要： According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first lens group having negative refractive power; and (2) at least three other lens groups having a positive refractive power and at least one other lens group having a negative refractive power. In one embodiment, the projections lens includes a second lens group having a positive refractive power; a third lens group having a negative refractive power; and fourth, fifth and sixth lens groups having overall positive refractive power. The projection lens having a numerical aperture of at least about 0.85 and is of a 1½ waist construction, with the ½ waist defined in the first lens group and a primary waist is defined in the third lens group.
摘要翻译： 根据一个示例性实施例，提供具有物平面和像平面的投影透镜，并且包括以成像方式对象地列出的以下透镜组：（1）具有负屈光力的第一透镜组; 和（2）具有正屈光力的至少三个其它透镜组和具有负屈光力的至少一个其它透镜组。 在一个实施例中，投影透镜包括具有正折光力的第二透镜组; 具有负屈光力的第三透镜组; 以及具有总正正屈光力的第四，第五和第六透镜组。 投影透镜具有至少约0.85的数值孔径，并且具有1/2腰围结构，其中限定在第一透镜组中的1/2腰围和初级腰围限定在第三透镜组中。
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公开(公告)号：US07190527B2
公开(公告)日：2007-03-13
申请号：US10931051
申请日：2004-09-01
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译： 具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。 第一凸度具有由D1表示的最大直径，并且第二凸度具有由D2表示的最大直径和0.8
2 <1.1。 -
公开(公告)号：US07382540B2
公开(公告)日：2008-06-03
申请号：US11716679
申请日：2007-03-12
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译： 具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。 第一凸度具有由D1表示的最大直径，并且第二凸度具有由D2表示的最大直径和0.8
2 <1.1。 -
公开(公告)号：US20070247722A1
公开(公告)日：2007-10-25
申请号：US11716679
申请日：2007-03-12
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译： 具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。 第一凸度具有由D 1表示的最大直径，并且第二凸度具有由D 2表示的最大直径和0.8
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公开(公告)号：US20050231813A1
公开(公告)日：2005-10-20
申请号：US10931051
申请日：2004-09-01
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译： 具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。 第一凸度具有由D1表示的最大直径，并且第二凸度具有由D2表示的最大直径和0.8
2 <1.1。 -
公开(公告)号：US06906866B2
公开(公告)日：2005-06-14
申请号：US10688212
申请日：2003-10-15
CPC分类号： G03F7/70241 , G02B13/143
摘要： According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first lens group having negative refractive power; and (2) at least three other lens groups having a positive refractive power and at least one other lens group having a negative refractive power. In one embodiment, the projections lens includes a second lens group having a positive refractive power; a third lens group having a negative refractive power; and fourth, fifth and sixth lens groups having overall positive refractive power. The projection lens having a numerical aperture of at least about 0.85 and is of a 1½ waist construction, with the ½ waist defined in the first lens group and a primary waist is defined in the third lens group.
摘要翻译： 根据一个示例性实施例，提供具有物平面和像平面的投影透镜，并且包括以成像方式对象地列出的以下透镜组：（1）具有负屈光力的第一透镜组; 和（2）具有正屈光力的至少三个其它透镜组和具有负屈光力的至少一个其它透镜组。 在一个实施例中，投影透镜包括具有正折光力的第二透镜组; 具有负屈光力的第三透镜组; 以及具有总正正屈光力的第四，第五和第六透镜组。 投影透镜具有至少约0.85的数值孔径，并且具有1/2腰围结构，其中限定在第一透镜组中的1/2腰围和初级腰围限定在第三透镜组中。
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公开(公告)号：US07965453B2
公开(公告)日：2011-06-21
申请号：US12651829
申请日：2010-01-04
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译： 用于投影光刻的缩小投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物场成像为以缩小倍率|＆bgr布置在投影物镜的图像表面中的有效图像场 ; | <1。 光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。 光学元件包括具有最大透镜直径Dmax的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 COMP = Dmax /（Y'·（NA / n'）2）条件COMP <15.8成立。 优选实施例具有相对较小的透镜总数，这允许以相对低的材料消耗制造尺寸相对较小的投影物镜，产生用于干式光刻的高性能，重量轻，紧凑的缩小投影物镜。
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公开(公告)号：US20100323299A1
公开(公告)日：2010-12-23
申请号：US12819861
申请日：2010-06-21
CPC分类号： G03F7/70241 , G02B13/143 , G03F7/70341
摘要： A projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, and has a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size. For working wavelengths below 200 nm, structural widths of substantially under 100 nm can be resolved when use is made of immersion fluids between the projection objective and substrate.
摘要翻译： 适用于浸没微光刻的投影物镜被设计为具有五个透镜组的单腰系统，并且具有负折光力的第一透镜组，正屈光力的第二透镜组，负折射光焦度的第三透镜组， 正屈光力的第四透镜组和正屈光力的第五透镜组。 第四透镜组具有位于第三透镜组（LG3）和第四透镜组（LG4）之间的边缘光线高度的拐点附近的入射面（E）。 在入射面和系统隔膜（5）之间没有设置具有大量屈光力的负透镜。 本发明的投影物镜的实施例结合大图像场实现非常高的数值孔径NA> 1，并且通过紧凑的设计尺寸来区分。 对于低于200nm的工作波长，当在投影物镜和基底之间使用浸没流体时，可以解决基本上在100nm以下的结构宽度。
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公开(公告)号：US07738188B2
公开(公告)日：2010-06-15
申请号：US11727013
申请日：2007-03-23
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译： 用于投影光刻的缩小投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物场成像为以缩小倍率|＆bgr布置在投影物镜的图像表面中的有效图像场 ; | <1。 光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。 光学元件包括具有最大透镜直径Dmax的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 COMP = Dmax /（Y'·（NA / n'）2）条件COMP <15.8成立。
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10.发明授权Projection exposure apparatus, projection exposure method and projection objective 有权投影曝光装置，投影曝光方法和投影物镜公开(公告)号：US07834981B2
公开(公告)日：2010-11-16
申请号：US11747630
申请日：2007-05-11
CPC分类号： G03F7/70225 , G02B17/0892 , G03F7/70275
摘要： A projection exposure apparatus for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask that is arranged in the region of an object surface of the projection objective has a light source for emitting ultraviolet light from a wavelength band having a bandwidth Δλ>10 pm around a central operating wavelength λ>200 nm; an illumination system for receiving the light from the light source and for directing illumination radiation onto the pattern of the mask; and a projection objective for the imaging of the structure of the mask onto a light-sensitive substrate. The projection objective is a catadioptric projection objective having at least one concave mirror arranged in a region of a pupil surface of the projection objective, and a negative group having at least one negative lens arranged in direct proximity to the concave mirror in a region near the pupil surface, where a marginal ray height (MRH) of the imaging is greater than a chief ray height (CRH).
摘要翻译： 一种投影曝光装置，用于曝光布置在投影物镜的图像表面的区域中的辐射敏感基板，其具有布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像 具有用于从围绕中心工作波长λ> 200nm的带宽＆Dgr;λ>10μm的波长带发射紫外光的光源; 照明系统，用于接收来自光源的光并将照射辐射引导到掩模的图案上; 以及用于将掩模的结构成像到感光基板上的投影物镜。 投影物镜是一个反射折射投影物镜，它具有至少一个凹面镜，该凹面镜布置在投影物镜的光瞳表面的区域中，以及一个负极组，具有至少一个负透镜， 瞳孔表面，其中成像的边缘射线高度（MRH）大于主射线高度（CRH）。
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