COMPACT 1 1/2-WAIST SYSTEM FOR SUB 100NM ARF LITHOGRAPHY
    1.
    发明申请
    COMPACT 1 1/2-WAIST SYSTEM FOR SUB 100NM ARF LITHOGRAPHY 有权
    紧凑的1/2-WAIST系统用于100NM ARF算法

    公开(公告)号:US20050083583A1

    公开(公告)日:2005-04-21

    申请号:US10688212

    申请日:2003-10-15

    CPC分类号: G03F7/70241 G02B13/143

    摘要: According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first lens group having negative refractive power; and (2) at least three other lens groups having a positive refractive power and at least one other lens group having a negative refractive power. In one embodiment, the projections lens includes a second lens group having a positive refractive power; a third lens group having a negative refractive power; and fourth, fifth and sixth lens groups having overall positive refractive power. The projection lens having a numerical aperture of at least about 0.85 and is of a 1½ waist construction, with the ½ waist defined in the first lens group and a primary waist is defined in the third lens group.

    摘要翻译: 根据一个示例性实施例,提供具有物平面和像平面的投影透镜,并且包括以成像方式对象地列出的以下透镜组:(1)具有负屈光力的第一透镜组; 和(2)具有正屈光力的至少三个其它透镜组和具有负屈光力的至少一个其它透镜组。 在一个实施例中,投影透镜包括具有正折光力的第二透镜组; 具有负屈光力的第三透镜组; 以及具有总正正屈光力的第四,第五和第六透镜组。 投影透镜具有至少约0.85的数值孔径,并且具有1/2腰围结构,其中限定在第一透镜组中的1/2腰围和初级腰围限定在第三透镜组中。

    Compact 1½-waist system for sub 100 nm ArF lithography
    6.
    发明授权
    Compact 1½-waist system for sub 100 nm ArF lithography 有权
    紧凑的1½腰系统用于亚100 nm ArF光刻

    公开(公告)号:US06906866B2

    公开(公告)日:2005-06-14

    申请号:US10688212

    申请日:2003-10-15

    CPC分类号: G03F7/70241 G02B13/143

    摘要: According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first lens group having negative refractive power; and (2) at least three other lens groups having a positive refractive power and at least one other lens group having a negative refractive power. In one embodiment, the projections lens includes a second lens group having a positive refractive power; a third lens group having a negative refractive power; and fourth, fifth and sixth lens groups having overall positive refractive power. The projection lens having a numerical aperture of at least about 0.85 and is of a 1½ waist construction, with the ½ waist defined in the first lens group and a primary waist is defined in the third lens group.

    摘要翻译: 根据一个示例性实施例,提供具有物平面和像平面的投影透镜,并且包括以成像方式对象地列出的以下透镜组:(1)具有负屈光力的第一透镜组; 和(2)具有正屈光力的至少三个其它透镜组和具有负屈光力的至少一个其它透镜组。 在一个实施例中,投影透镜包括具有正折光力的第二透镜组; 具有负屈光力的第三透镜组; 以及具有总正正屈光力的第四,第五和第六透镜组。 投影透镜具有至少约0.85的数值孔径,并且具有1/2腰围结构,其中限定在第一透镜组中的1/2腰围和初级腰围限定在第三透镜组中。

    Microlithographic reduction projection catadioptric objective
    7.
    发明授权
    Microlithographic reduction projection catadioptric objective 失效
    微光刻折射反射折射目标

    公开(公告)号:US07218445B2

    公开(公告)日:2007-05-15

    申请号:US10438153

    申请日:2003-05-13

    IPC分类号: G02B17/08

    摘要: A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.

    摘要翻译: 光刻还原投影反折射物镜包括具有偶数个至少四个反射镜并且具有正的整体放大倍率的第一光学组和比具有多个透镜的第一光学组更多的图像的第二基本上折射的光学组。 第二光学组具有用于提供图像缩小的负总体放大倍率。 第一光学组为第二光学组提供补偿像差校正。 目标形成数值孔径至少基本为0.65,优选大于0.70,或更优选大于0.75的图像。

    Microlithographic reduction projection catadioptric objective
    9.
    发明授权
    Microlithographic reduction projection catadioptric objective 有权
    微光刻折射反射折射目标

    公开(公告)号:US07859748B2

    公开(公告)日:2010-12-28

    申请号:US11686157

    申请日:2007-03-14

    IPC分类号: G02B17/08

    摘要: A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.

    摘要翻译: 光刻还原投影反折射物镜包括具有偶数个至少四个反射镜并且具有正的整体放大倍率的第一光学组和比具有多个透镜的第一光学组更多的图像的第二基本上折射的光学组。 第二光学组具有用于提供图像缩小的负总体放大倍率。 第一光学组为第二光学组提供补偿像差校正。 目标形成数值孔径至少基本为0.65,优选大于0.70,或更优选大于0.75的图像。

    MICROLITHOGRAPHIC REDUCTION PROJECTION CATADIOPTRIC OBJECTIVE
    10.
    发明申请
    MICROLITHOGRAPHIC REDUCTION PROJECTION CATADIOPTRIC OBJECTIVE 有权
    微观缩小投影目标

    公开(公告)号:US20070153398A1

    公开(公告)日:2007-07-05

    申请号:US11686157

    申请日:2007-03-14

    IPC分类号: G02B3/00 G02B17/00

    摘要: A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnigying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.

    摘要翻译: 光刻还原投影反折射物镜包括具有偶数个至少四个反射镜并且具有正的整体功率的第一光学组,以及比具有多个透镜的第一光学组更向前的第二基本上折射的光学组。 第二光学组具有用于提供图像缩小的负总体放大倍率。 第一光学组为第二光学组提供补偿像差校正。 目标形成数值孔径至少基本为0.65,优选大于0.70,或更优选大于0.75的图像。