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    Projection optical system
    52.
    发明授权
    Projection optical system 有权
    投影光学系统

    公开(公告)号：US07957069B2

    公开(公告)日：2011-06-07

    申请号：US11793678

    申请日：2005-12-30

    申请人： Aurelian Dodoc ,  Wilhelm Ulrich

    发明人： Aurelian Dodoc ,  Wilhelm Ulrich

    IPC分类号： G02B3/00 ,  G02B9/00 ,  G02B9/34 ,  G02B13/18 ,  G02B3/02

    CPC分类号： G03F7/70225 ,  G02B13/143 ,  G03F7/70241

    摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses, such that a total refractive power of each group of lenses is one of a negative refractive power and a positive refractive power; and wherein a refractive power of each lens of the fourth group of lenses is equal to or greater than 0. A lens of the third group of lenses which is disposed directly adjacent to a lens of the fourth group of lenses may have a concave surface facing towards the second object.

    摘要翻译： 投影光学系统包括沿投影光学系统的光轴设置的多个透镜; 其中所述多个透镜可分为四个不重叠的透镜组，使得每组透镜的总屈光力为负屈光力和正屈光力之一; 并且其中所述第四组透镜的每个透镜的折射力等于或大于0.所述第三组透镜的透镜与所述第四组透镜的透镜直接相邻设置，可以具有面向 朝向第二个目标。

    CATADIOPTRIC PROJECTION OBJECTIVE
    54.
    发明申请
    CATADIOPTRIC PROJECTION OBJECTIVE 有权
    目标投影目标

    公开(公告)号：US20100253999A1

    公开(公告)日：2010-10-07

    申请号：US12817628

    申请日：2010-06-17

    申请人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

    发明人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

    IPC分类号： G02B17/08

    CPC分类号： G02B17/0804 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0844 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70225

    摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

    摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。 该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

    Symmetrical objective having four lens groups for microlithography
    55.
    发明授权
    Symmetrical objective having four lens groups for microlithography 有权
    具有用于微光刻的四个透镜组的对称物镜

    公开(公告)号：US07697211B2

    公开(公告)日：2010-04-13

    申请号：US12257156

    申请日：2008-10-23

    申请人： David R. Shafer ,  Aurelian Dodoc ,  Johannes Zellner ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Holger Walter ,  Ulrich Loering ,  Daniel Kraehmer ,  Gerhard Fuerter

    发明人： David R. Shafer ,  Aurelian Dodoc ,  Johannes Zellner ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Holger Walter ,  Ulrich Loering ,  Daniel Kraehmer ,  Gerhard Fuerter

    IPC分类号： G02B27/30

    CPC分类号： G02B13/143 ,  G02B13/26 ,  G03F7/70241

    摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.

    摘要翻译： 本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台 。 在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。 用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位 到所述透镜系统的光轴。

    Illumination System for a Microlithgraphic Exposure Apparatus
    57.
    发明申请
    Illumination System for a Microlithgraphic Exposure Apparatus 有权
    微照相曝光设备的照明系统

    公开(公告)号：US20080192359A1

    公开(公告)日：2008-08-14

    申请号：US11911904

    申请日：2006-04-26

    申请人： Alexander Sohmer ,  Aurelian Dodoc ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Gerhard Furter ,  Rafael Egger ,  Artur Hogele ,  Michael Raum

    发明人： Alexander Sohmer ,  Aurelian Dodoc ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Gerhard Furter ,  Rafael Egger ,  Artur Hogele ,  Michael Raum

    IPC分类号： G02B27/18

    CPC分类号： G03F7/70075 ,  G02B17/0892 ,  G02B27/0043

    摘要： An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62). The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666′) that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606).

    摘要翻译： 微光刻曝光设备（10）的照明系统（12）包括用于将光瞳平面（54）变换成场平面（62）的冷凝器（601; 602; 603; 604; 605; 606）。 冷凝器具有透镜组（L 14，L 15，L 16，L 17; L 24，L 25，L 26，L 27，L 28; L 34，L 35，L 36，L 37; L 44，L 45，L 46; L 53，L 54，L 55）。 这些透镜被布置为使得在轴上场点（72）上由聚光器（601; 602; 603; 604; 605）聚焦的光束（70）会聚在透镜组的每个透镜内。 透镜组的至少一个透镜（L 15，L 16，L 17; L 25，L 26; L 34，L 44，L 45; L 54）具有凹面。 照明系统还可以包括至少部分校正冷凝器（601; 602; 603; 604; 605; 606）的残余光瞳像差的场停止物镜（66; 666,666'）。

    Catadioptric projection objective with geometric beam splitting
    59.
    发明申请
    Catadioptric projection objective with geometric beam splitting 有权
    反射折射投影物镜，具有几何光束分裂

    公开(公告)号：US20050117224A1

    公开(公告)日：2005-06-02

    申请号：US10734623

    申请日：2003-12-15

    申请人： David Shafer ,  Alexander Epple ,  Aurelian Dodoc ,  Helmut Beierl ,  Wilhelm Ulrich

    发明人： David Shafer ,  Alexander Epple ,  Aurelian Dodoc ,  Helmut Beierl ,  Wilhelm Ulrich

    IPC分类号： G02B13/14 ,  G02B13/18 ,  G02B17/08 ,  G03F7/20 ,  G02B3/00 ,  G02B9/00

    CPC分类号： G02B13/143 ,  G02B13/18 ,  G02B13/22 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： A catadioptric projection objective is used to project a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the formation of at least one real intermediate image and has an image-side numerical aperture NA>0.7. The projection objective comprises an optical axis and at least one catadioptric objective part that comprises a concave mirror and a first folding mirror. There are a first beam section running from the object plane to the concave mirror and a second beam section running from the concave mirror to the image plane. The first folding mirror is arranged with reference to the concave mirror in such a way that one of the beam sections is folded at the first folding mirror and the other beam section passes the first folding mirror without vignetting, the first beam section and the second beam section crossing one another in a cross-over region.

    摘要翻译： 反射折射投影物镜用于将形成投影物镜的物平面中的图案投影到投影物镜的像平面中，形成至少一个实际中间像，并具有图像侧数值孔径NA> 0.7。 投影物镜包括光轴和包括凹面镜和第一折叠镜的至少一个反射折射物镜部分。 存在从物平面延伸到凹面镜的第一光束部分和从凹面镜向像面延伸的第二光束部分。 第一折叠镜相对于凹面镜布置成使得其中一个光束部分在第一折叠反射镜处被折叠，而另一个光束部分经过第一折叠镜而没有渐晕，第一光束部分和第二光束 横跨地区相互交叉。