公开(公告)号：US06271529B1

公开(公告)日：2001-08-07

申请号：US09083707

申请日：1998-05-22

申请人： Marvin Farley ,  Vadim G. Dudnikov ,  Mehran Nasser-Ghodsi

发明人： Marvin Farley ,  Vadim G. Dudnikov ,  Mehran Nasser-Ghodsi

IPC分类号： H01S100

CPC分类号： H01J37/026 ,  H01J37/063 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0042 ,  H01J2237/0044 ,  H01J2237/0045 ,  H05H1/54 ,  H05H3/02

摘要： An ion implanter is provided for implanting ions in a workpiece. The ion implanter includes an apparatus for generating an ion beam and directing it toward a surface of a work piece and a plasma generator for generating plasma to neutralize the ion beam and the work piece surface. The plasma generator has a plasma generator chamber defined by walls, a relatively narrow outlet aperture for plasma produced in the chamber to leave the chamber to neutralize the beam and work piece surface, cathodes, and anodes spaced from the cathodes and from the walls of the chamber. The plasma generator also has magnets arranged within the plasma generator chamber, adjacent the chamber walls to generate a magnetic field to deflect primary electrons emitted from the cathode from directly reaching the anode. The plasma generator also features a conductive shield, positioned within the chamber between the anode and the magnets, the shield having an electric potential selected to deflect electrons, the magnetic field and the conductive shield effective during operation to cause electrons from the cathode to trace extended paths to ionize gas within the chamber to generate plasma before reaching the anode. A drift tube defined by walls through which the ion beam passes before reaching the workpiece is opened into by the aperture opens into the tube. A series of parallel, linear magnets are positioned perpendicular to the general path of the ion beam. The adjacent poles of adjacent magnets are of opposite polarity.

摘要翻译： 提供离子注入机用于将离子注入到工件中。 离子注入机包括用于产生离子束并将其引导到工件的表面的装置和用于产生等离子体以中和离子束和工件表面的等离子体发生器的装置。 等离子体发生器具有由壁限定的等离子体发生器室，用于在室中产生的等离子体的相对较窄的出口孔，以离开室以中和来自阴极和阴极以及与阴极隔离的工件表面，阴极和阳极 房间。 等离子体发生器还具有布置在等离子体发生器室内的磁体，邻近室壁以产生磁场，以使从阴极发射的一次电子直接到达阳极。 等离子体发生器还具有导电屏蔽，其位于阳极和磁体之间的室内，屏蔽具有选择用于偏转电子的电位，磁场和导电屏蔽在操作期间有效以使来自阴极的电子延伸 在室内电离气体以在到达阳极之前产生等离子体的路径。 由到达工件的离子束通过的由壁限定的漂移管通过孔打开进入管中。 一系列平行的线性磁体垂直于离子束的通用路径定位。 相邻磁体的相邻磁极具有相反的极性。

公开(公告)号：US4587433A

公开(公告)日：1986-05-06

申请号：US719834

申请日：1985-04-03

申请人： Marvin Farley

发明人： Marvin Farley

IPC分类号： H01J37/304 ,  H01J37/317 ,  G21K5/00

CPC分类号： H01J37/304 ,  H01J37/3171

摘要： An apparatus for measuring and compensating for neutral ions in an ion beam in the dose control system of an ion implanter. The gas pressure in the implantation volume (15) is measured, and the pressure signal is converted to an effective beam current signal in accordance with a known relationship among the gas pressure, the apparent beam current as measured by a Faraday cage and the neutral beam. The resulting effective beam current signal is inputted to the dose control system.

摘要翻译： 一种用于在离子注入机的剂量控制系统中测量和补偿离子束中的中性离子的装置。 测量注入体积（15）中的气体压力，并且根据气体压力，由法拉第笼测量的视在束流和中性束之间的已知关系将压力信号转换为有效束电流信号 。 所产生的有效束电流信号被输入到剂量控制系统。

公开(公告)号：US4539217A

公开(公告)日：1985-09-03

申请号：US625263

申请日：1984-06-27

申请人： Marvin Farley

发明人： Marvin Farley

IPC分类号： H01J37/304 ,  H01J37/317 ,  H01L21/265 ,  B05D3/06

CPC分类号： H01J37/304 ,  H01J37/3171

摘要： A method and apparatus for measuring and compensating for neutral ions in an ion beam in the dose control system of an ion implanter. The gas pressure in the implantation volume (15) is measured, and the pressure signal is converted to an effective beam current signal in accordance with a known relationship among the gas pressure, the apparent beam current as measured by a Faraday cage and the neutral beam. The resulting effective beam current signal is inputted to the dose control system.

摘要翻译： 一种用于在离子注入机的剂量控制系统中测量和补偿离子束中的中性离子的方法和装置。 测量注入体积（15）中的气体压力，并且根据气体压力，由法拉第笼测量的视在束流和中性束之间的已知关系将压力信号转换为有效束电流信号 。 所产生的有效束电流信号被输入到剂量控制系统。