公开(公告)号：US5948704A

公开(公告)日：1999-09-07

申请号：US658262

申请日：1996-06-05

Applicant: Neil Benjamin ,  Jon Hylbert ,  Stefano Mangano

Inventor： Neil Benjamin ,  Jon Hylbert ,  Stefano Mangano

IPC: H01L21/302 ,  H01J37/20 ,  H01L21/00 ,  H01L21/285 ,  H01L21/304 ,  H01L21/3065 ,  H01L21/677 ,  H01L21/306 ,  H05H1/00

CPC classification number: H01L21/67748 ,  H01J37/20 ,  H01J37/321 ,  H01J37/32449 ,  H01J37/32752 ,  Y10T279/23

Abstract: A vacuum processing chamber having a substrate support removably mounted therein. The chamber includes an opening in a sidewall thereof and the opening is large enough to allow the substrate support to be removed from the chamber through the opening. A modular mounting arrangement extends through the opening and removably supports the substrate support in the interior of the chamber at a position located inwardly of an inner sidewall of the chamber. The mounting arrangement includes a mounting flange and a support arm. The mounting flange is attached to an exterior surface of the chamber and the support arm extends between the substrate support and the mounting flange. The chamber includes a single vacuum port in a central portion of an endwall of the chamber spaced from the substrate support. The vacuum port is connected to a vacuum pump which removes gases from the interior of the chamber and maintains the chamber at a pressure below atmospheric pressure. The substrate support is easy to service or replace since it can be removed through a sidewall of the chamber. The sidewall mounted substrate support also allows a large vacuum port to be located in the endwall of the chamber thus allowing high flow to be achieved by connecting the vacuum port a large capacity vacuum pump. The chamber also includes a modular liner, a modular plasma generating source and a modular vacuum pumping arrangement, each of which can be replaced with interchangeable equipment.

Abstract translation: 真空处理室，其具有可移除地安装在其中的基板支撑件。 腔室包括在其侧壁中的开口，并且开口足够大以允许衬底支撑件通过开口从腔室移除。 模块化安装布置延伸穿过开口并且可移动地将腔室内部的基板支撑件支撑在位于腔室内侧壁的内侧的位置。 安装装置包括安装凸缘和支撑臂。 安装凸缘连接到室的外表面，并且支撑臂在基板支撑件和安装凸缘之间延伸。 腔室包括在与衬底支撑件间隔开的腔室的端壁的中心部分中的单个真空端口。 真空端口连接到真空泵，真空泵从腔室内部除去气体，并将室保持在低于大气压的压力下。 衬底支撑件易于维修或更换，因为它可以通过腔室的侧壁去除。 侧壁安装的基板支撑件还允许大的真空端口位于室的端壁中，从而允许通过将真空端口连接到大容量真空泵来实现高流量。 该室还包括模块化衬垫，模块式等离子体发生源和模块化真空泵送装置，其中每一个都可以用可更换的设备来代替。

公开(公告)号：US5820723A

公开(公告)日：1998-10-13

申请号：US658261

申请日：1996-06-05

Applicant: Neil Benjamin ,  Jon Hylbert ,  Stefano Mangano

Inventor： Neil Benjamin ,  Jon Hylbert ,  Stefano Mangano

IPC: H01L21/302 ,  H01J37/16 ,  H01L21/00 ,  H01L21/3065 ,  H01L21/677 ,  C23F1/02

CPC classification number: H01L21/67748 ,  H01J37/16 ,  H01J37/321 ,  H01J37/32458

Abstract: A vacuum processing chamber having a substrate support removably mounted therein. The chamber includes an opening in a sidewall thereof and the opening is large enough to allow the substrate support to be removed from the chamber through the opening. A modular mounting arrangement extends through the opening and removably supports the substrate support in the interior of the chamber at a position located inwardly of an inner sidewall of the chamber. The mounting arrangement includes a mounting flange and a support arm. The mounting flange is attached to an exterior surface of the chamber and the support arm extends between the substrate support and the mounting flange. The chamber includes a single vacuum port in a central portion of an endwall of the chamber spaced from the substrate support. The vacuum port is connected to a vacuum pump which removes gases from the interior of the chamber and maintains the chamber at a pressure below atmospheric pressure. The substrate support is easy to service or replace since it can be removed through a sidewall of the chamber. The sidewall mounted substrate support also allows a large vacuum port to be located in the endwall of the chamber thus allowing high flow to be achieved by connecting the vacuum port a large capacity vacuum pump. The chamber also includes a modular liner, a modular plasma generating source and a modular vacuum pumping arrangement, each of which can be replaced with interchangeable equipment.

Abstract translation: 真空处理室，其具有可移除地安装在其中的基板支撑件。 腔室包括在其侧壁中的开口，并且开口足够大以允许衬底支撑件通过开口从腔室移除。 模块化安装布置延伸穿过开口并且可移动地将腔室内部的基板支撑件支撑在位于腔室内侧壁的内侧的位置。 安装装置包括安装凸缘和支撑臂。 安装凸缘连接到室的外表面，并且支撑臂在基板支撑件和安装凸缘之间延伸。 腔室包括在与衬底支撑件间隔开的腔室的端壁的中心部分中的单个真空端口。 真空端口连接到真空泵，真空泵从腔室内部除去气体，并将室保持在低于大气压的压力下。 衬底支撑件易于维修或更换，因为它可以通过腔室的侧壁去除。 侧壁安装的基板支撑件还允许大的真空端口位于室的端壁中，从而允许通过将真空端口连接到大容量真空泵来实现高流量。 该室还包括模块化衬垫，模块式等离子体发生源和模块化真空泵送装置，其中每一个都可以用可更换的设备来代替。