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公开(公告)号:US20080294246A1
公开(公告)日:2008-11-27
申请号:US11752772
申请日:2007-05-23
Applicant: Torsten Scheuermann , Michael Kuehling , Umang Anand , Jaydeep Y. Kokate , Samuel Robaina
Inventor: Torsten Scheuermann , Michael Kuehling , Umang Anand , Jaydeep Y. Kokate , Samuel Robaina
IPC: A61F2/06
CPC classification number: A47G19/22 , A61F2/0077 , A61F2/82 , A61F2/91 , A61L31/088 , A61L31/10 , A61L31/16 , A61L2300/606 , Y10T428/131 , Y10T428/1321
Abstract: An endoprosthesis, such as a stent, includes a ceramic, such as IROX, having a select morphology and composition.
Abstract translation: 内置假体,例如支架,包括具有选择形态和组成的陶瓷,例如IROX。
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公开(公告)号:US20080290958A1
公开(公告)日:2008-11-27
申请号:US12220819
申请日:2008-07-29
Applicant: Torsten Scheuermann
Inventor: Torsten Scheuermann
CPC classification number: G01R33/286 , G01R33/3628
Abstract: Systems and methods for a resonator with an adjustable capacitance for a medical device. In one embodiment, a resonator system includes a resonator device with an LC resonator circuit that has an adjustable capacitance, an inductor coil in series with the adjustable capacitance, and an adjustable capacitance control that can control the adjustable capacitance to obtain different particular capacitance values. This embodiment also includes a medical device, positioned with the resonator device, so that at least a portion of the inductor coil surrounds a space that is surrounded by at least a portion of the medical device.
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公开(公告)号:US20060196581A1
公开(公告)日:2006-09-07
申请号:US11417856
申请日:2006-05-03
Applicant: Torsten Scheuermann , Eckhard Alt
Inventor: Torsten Scheuermann , Eckhard Alt
IPC: C23C8/06
CPC classification number: A61L31/18 , A61F2/91 , A61F2/915 , A61F2002/91541 , A61F2002/91558 , A61F2310/00598 , A61L31/022 , A61L31/088
Abstract: In a process of fabricating a stent composed primarily of niobium alloyed with a trace amount of zirconium, tantalum, or titanium for hardening, the stent is annealed under vacuum in a substantially oxygen-free environment. The vacuum is preferably maintained at pressure less than 10−4 millibars, oxygen-content less than about 80 parts per million, and the annealing temperature exceeds 400° C. for at least one hour, and is preferably kept in a range from about 1100-1200° C. for several hours. This may be followed by applying a surface layer of oxide, such as iridium oxide, with a thickness of 299-300 nm to the stent.
Abstract translation: 在制造主要由铌合金化的用于硬化的锆,钽或钛的支架的制造过程中,支架在基本上无氧的环境中在真空下退火。 真空优选保持在小于10 -4毫巴的压力下,含氧量小于约百万分之八十,退火温度超过400℃至少一小时,优选 保持在约1100-1200℃的范围内几个小时。 然后可以向支架施加厚度为299-300nm的氧化物表面层,例如氧化铱。
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公开(公告)号:US07101391B2
公开(公告)日:2006-09-05
申请号:US10232774
申请日:2002-08-31
Applicant: Torsten Scheuermann , Eckhard Alt
Inventor: Torsten Scheuermann , Eckhard Alt
IPC: A61F2/06
CPC classification number: A61L31/18 , A61F2/91 , A61F2/915 , A61F2002/91541 , A61F2002/91558 , A61F2310/00598 , A61L31/022 , A61L31/088
Abstract: In a process of fabricating a stent composed primarily of niobium alloyed with a trace amount of zirconium, tantalum, or titanium for hardening, the stent is annealed under vacuum in a substantially oxygen-free environment. The vacuum is preferably maintained at pressure less than 10−4 millibars, oxygen-content less than about 80 parts per million, and the annealing temperature exceeds 400° C. for at least one hour, and is preferably kept in a range from about 1100–1200° C. for several hours. This may be followed by applying a surface layer of oxide, such as iridium oxide, with a thickness of 299–300 nm to the stent.
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