公开(公告)号：US06958847B2

公开(公告)日：2005-10-25

申请号：US10807143

申请日：2004-03-24

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: G02B26/08 ,  G02B26/00 ,  G02F1/00 ,  G02F1/13 ,  G09F9/00 ,  G09F9/30 ,  H04N5/72

CPC classification number: G02B26/001

Abstract: An optical interference display unit, at least comprises a light-incidence electrode and a light-reflection electrode located on a transparent substrate. The light-incidence electrode at least comprises a transparent conductive layer and a dielectric layer. The light-reflection electrode at least comprises an absorption layer and a reflective layer.

Abstract translation: 光学干涉显示单元至少包括位于透明基板上的入射电极和光反射电极。 光入射电极至少包括透明导电层和电介质层。 光反射电极至少包括吸收层和反射层。

公开(公告)号：US20050202649A1

公开(公告)日：2005-09-15

申请号：US10873014

申请日：2004-06-21

Applicant: Po-Chung Hung ,  Hsiung-Kuang Tsai ,  Wen-Jian Lin

Inventor： Po-Chung Hung ,  Hsiung-Kuang Tsai ,  Wen-Jian Lin

IPC: G02B26/00 ,  G02F1/03 ,  G02F1/1335 ,  G09G3/34 ,  H01L21/76

CPC classification number: G02B26/001 ,  G02F1/21 ,  G09G3/3466 ,  G09G2330/08

Abstract: An optical interference reflective element has a light-incident electrode and a light-reflective electrode, and each or both of the two electrodes are made of a display part and a wiring part which are electrically connected to each other with a connection part. A plurality of the interference reflective elements are connected to form an electrode line by the wiring parts, and the electrode line is used in an optical interference reflective structure formed by the optical interference reflective elements that is operated in a passive matrix mode.

公开(公告)号：US20050157364A1

公开(公告)日：2005-07-21

申请号：US10807143

申请日：2004-03-24

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: G02B26/08 ,  G02B26/00 ,  G02F1/00 ,  G02F1/13 ,  G09F9/00 ,  G09F9/30 ,  H04N5/72

CPC classification number: G02B26/001

Abstract: An optical interference display unit, at least comprises a light-incidence electrode and a light-reflection electrode located on a transparent substrate. The light-incidence electrode at least comprises a transparent conductive layer and a dielectric layer. The light-reflection electrode at least comprises an absorption layer and a reflective layer.

公开(公告)号：US20050078348A1

公开(公告)日：2005-04-14

申请号：US10810660

申请日：2004-03-29

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: B81B7/02 ,  B81C1/00 ,  G02B26/00 ,  G02B26/08 ,  H01L21/00 ,  H01L21/4763

CPC classification number: B81C1/00801 ,  B81B2201/047 ,  G02B26/001 ,  G02B26/0841

Abstract: A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.

Abstract translation: 提供微电子机械系统的结构和制造方法，其结构和制造方法适用于光学干涉显示单元。 光学干涉显示单元的结构包括第一电极，第二电极和柱。 第二电极包括由材料层覆盖的导电层并且与第一电极大致平行地布置。 支撑件位于第一板和第二板之间，并形成空腔。 在制造结构的释放蚀刻工艺中，材料层保护导电层免受蚀刻试剂的损伤。 材料层还保护导电层免受空气中的氧气和水分的损害。

公开(公告)号：US20050046948A1

公开(公告)日：2005-03-03

申请号：US10807129

申请日：2004-03-24

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: G02B26/00 ,  G02B1/10

CPC classification number: G02B26/001

Abstract: An optical interference display unit with a first electrode, a second electrode and support structures located between the two electrodes is provided. The second electrode has at least a first material layer and a second material layer. At least one material layer of the two is made from conductive material and the second conductive layer is used as a mask while an etching process is performed to etch the first material layer to define the second electrode.

Abstract translation: 提供了具有位于两个电极之间的第一电极，第二电极和支撑结构的光学干涉显示单元。 第二电极具有至少第一材料层和第二材料层。 两者的至少一个材料层由导电材料制成，并且第二导电层用作掩模，同时执行蚀刻工艺以蚀刻第一材料层以限定第二电极。

公开(公告)号：US20050042117A1

公开(公告)日：2005-02-24

申请号：US10807128

申请日：2004-03-24

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: G02B26/08 ,  B81B3/00 ,  B81B7/00 ,  B81B7/02 ,  B81C1/00 ,  F04B37/02 ,  F04F99/00 ,  G02B26/00 ,  G09F9/00 ,  G09F9/30 ,  F04F11/00

CPC classification number: G02B26/001 ,  B81B7/0012 ,  B81B2201/045

Abstract: A first electrode and a sacrificial layer are sequentially formed on a substrate, and then first openings for forming supports inside are formed in the first electrode and the sacrificial layer. The supports are formed in the first openings, and then a second electrode is formed on the sacrificial layer and the supports, thus forming a micro electro mechanical system structure. Afterward, an adhesive is used to adhere and fix a protection structure to the substrate for forming a chamber to enclose the micro electro mechanical system structure, and at least one second opening is preserved on sidewalls of the chamber. A release etch process is subsequently employed to remove the sacrificial layer through the second opening in order to form cavities in an optical interference reflection structure. Finally, the second opening is closed to seal the optical interference reflection structure between the substrate and the protection structure.

Abstract translation: 第一电极和牺牲层依次形成在基板上，然后在第一电极和牺牲层中形成用于形成支撑件的第一开口。 支撑件形成在第一开口中，然后在牺牲层和支撑件上形成第二电极，从而形成微机电系统结构。 之后，使用粘合剂将保护结构粘附并固定到基底上以形成腔室以包围微机电系统结构，并且至少一个第二开口保留在腔室的侧壁上。 随后采用释放蚀刻工艺以通过第二开口去除牺牲层，以便在光学干涉反射结构中形成空腔。 最后，关闭第二个开口以密封衬底和保护结构之间的光学干涉反射结构。

公开(公告)号：US06747800B1

公开(公告)日：2004-06-08

申请号：US10249061

申请日：2003-03-13

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: G02B110

CPC classification number: G02B26/001

Abstract: A manufacturing method for optical interference type panel is provided. A patterned supporting layer is formed on a transparent substrate, and then a first electrode layer and an optical film are formed sequentially on the supporting layer and the transparent substrate. A sacrificial material layer is formed on the optical layer, and then, a backside exposure process is performed by using the supporting layer as a mask to pattern the sacrificial material layer. A portion of the patterned sacrificial material layer is removed to expose the optical film above the supporting layer to form a sacrificial layer, and then a second electrode layer is formed on the sacrificial layer between the adjacent supporting layers and portion of the optical film. Afterwards, the sacrificial layer is removed.

Abstract translation: 提供了一种用于光学干涉型面板的制造方法。 在透明基板上形成图案化的支撑层，然后在支撑层和透明基板上依次形成第一电极层和光学膜。 在光学层上形成牺牲材料层，然后通过使用支撑层作为掩模来进行背面曝光处理，以对牺牲材料层进行图案化。 去除图案化的牺牲材料层的一部分以暴露支撑层上方的光学膜以形成牺牲层，然后在相邻的支撑层和光学膜的一部分之间的牺牲层上形成第二电极层。 之后，去除牺牲层。