公开(公告)号：US20080041817A1

公开(公告)日：2008-02-21

申请号：US11925477

申请日：2007-10-26

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: B29D11/00

CPC classification number: B81C1/00801 ,  B81B2201/047 ,  G02B26/001 ,  G02B26/0841

Abstract: A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.

Abstract translation: 提供微电子机械系统的结构和制造方法，其结构和制造方法适用于光学干涉显示单元。 光学干涉显示单元的结构包括第一电极，第二电极和柱。 第二电极包括由材料层覆盖的导电层并且与第一电极大致平行地布置。 支撑件位于第一板和第二板之间，并形成空腔。 在制造结构的剥离蚀刻工艺中，材料层保护导电层免受蚀刻剂的损伤。 材料层还保护导电层免受空气中的氧气和水分的损害。

公开(公告)号：US07066624B2

公开(公告)日：2006-06-27

申请号：US10641881

申请日：2003-08-16

Applicant: Wen-Jian Lin ,  Hung-Huei Hsu ,  Hong-Da Liu

Inventor： Wen-Jian Lin ,  Hung-Huei Hsu ,  Hong-Da Liu

IPC: F21V7/22

CPC classification number: G02F1/133553 ,  F21V7/22

Abstract: A structure of an ultra-micro reflector having abrasive surface with tapered micro bumps and free of resin layer and its fabrication method are provided. The reflector structure comprises mainly a layer of reflector metal, a scattering element with abrasive surface, and a layer of ITO. The abrasive surface has many tapered micro bumps. The reflector structure can be applied to a reflective or partially reflective LCD to achieve optimal performance. It makes the scattering angle of the reflective light source wider and more uniform. The variation of the gap of liquid crystal cells is greatly reduced, so that the reflective efficiency can be kept in an optimal condition. The reflector structure has larger scattering angle, smooth effect, and very good anti-glare effect. The fabrication process of the reflector structure is simple. The material cost for the abrasive surface is inexpensive. The reflector can endure higher temperature than conventional organic reflective elements, because the inorganic thin film process is used.

Abstract translation: 本发明提供具有锥形微凸块和不含树脂层的研磨表面的超微反射器的结构及其制造方法。 反射器结构主要包括反射金属层，具有研磨表面的散射元件和ITO层。 磨料表面有许多锥形微型凸块。 反射器结构可以应用于反射或部分反射的LCD以实现最佳性能。 使反射光源的散射角变得更均匀。 液晶单元的间隙的变化大大降低，从而可以将反射效率保持在最佳状态。 反射器结构具有较大的散射角，平滑的效果，以及非常好的防眩光效果。 反射器结构的制造工艺简单。 研磨表面的材料成本便宜。 因为使用无机薄膜工艺，所以反射器可以耐受比常规有机反射元件更高的温度。

公开(公告)号：US20060050393A1

公开(公告)日：2006-03-09

申请号：US11261466

申请日：2005-10-31

Applicant: Wen-Jian Lin ,  Hsiung-Kuang Tsai

Inventor： Wen-Jian Lin ,  Hsiung-Kuang Tsai

IPC: G02B1/10

CPC classification number: G02B26/001

Abstract: An optical-interference type reflective panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple supporting layers are firstly formed. Then, a plurality of first conductive optical film stacks, spacing layers and multiple second conductive optical film stacks are sequentially formed on the substrate. Finally, once the spacing layers are removed, optical-interference regulators are formed. Since said supporting layers forming step is prior to the first conductive optical film stacks, a precise back-side exposing step is not necessary so that the making procedure of the panel is simplified.

Abstract translation: 公开了一种光干涉型反射板及其制造方法，其中显示面板具有首先形成有多个支撑层的基板。 然后，在衬底上依次形成多个第一导电光学膜堆叠，间隔层和多个第二导电光学膜堆叠。 最后，一旦间隔层被去除，就形成光干涉调节器。 由于所述支撑层形成步骤在第一导电光学膜堆叠之前，因此不需要精确的背面曝光步骤，从而简化了面板的制作步骤。

公开(公告)号：US06995890B2

公开(公告)日：2006-02-07

申请号：US10706923

申请日：2003-11-14

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: G02F1/03 ,  G02F1/07

CPC classification number: G02B26/001 ,  B81B2201/047 ,  B81C1/00182 ,  G02B5/201 ,  G02B5/284

Abstract: An interference display unit with a first electrode, a second electrode and posts located between the two electrodes is provided. The characteristic of the interference display unit is that the second electrode's stress is released through a thermal process. The position of the second electrode is shifted and the distance between the first electrode and the second electrode is therefore defined. A method for fabricating the structure described as follow. A first electrode and a sacrificial layer are sequentially formed on a substrate and at least two openings are formed in the first electrode and the sacrificial layer. A supporter is formed in the opening and the supporter may have at least one arm on the top portion of the supporter. A second electrode is formed on the sacrificial layer and the supporter and a thermal process is performed. Finally, The sacrificial layer is removed.

Abstract translation: 提供具有位于两个电极之间的第一电极，第二电极和支柱的干涉显示单元。 干涉显示单元的特征是通过热处理释放第二电极的应力。 第二电极的位置偏移，因此限定第一电极和第二电极之间的距离。 一种制造如下结构的方法。 第一电极和牺牲层依次形成在基板上，并且在第一电极和牺牲层中形成至少两个开口。 支撑件形成在开口中，并且支撑件可以在支撑件的顶部上具有至少一个臂。 在牺牲层和支撑体上形成第二电极，并进行热处理。 最后，牺牲层被去除。

公开(公告)号：US20060006138A1

公开(公告)日：2006-01-12

申请号：US11221806

申请日：2005-09-09

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: B44C1/22

CPC classification number: G02B26/001

Abstract: An optical interference display unit with a first electrode, a second electrode and support structures located between the two electrodes is provided. The second electrode has at least a first material layer and a second material layer. At least one material layer of the two is made from conductive material and the second conductive layer is used as a mask while an etching process is performed to etch the first material layer to define the second electrode.

公开(公告)号：US06952303B2

公开(公告)日：2005-10-04

申请号：US10815947

申请日：2004-04-02

Applicant: Wen-Jian Lin ,  Hsiung-Kuang Tsai

Inventor： Wen-Jian Lin ,  Hsiung-Kuang Tsai

IPC: G02B26/00 ,  G02F1/1335 ,  G02F1/21

CPC classification number: G02B26/001

Abstract: A protection layer covers the cavity-side surface of a bottom electrode of a interferometric modulation pixel. Consequently, the protective layer protects the surface of the bottom electrode while a sacrificial layer between the bottom electrode and the top electrode is being etched. Thus, the distance between the bottom electrode and the top electrode is maintained, thereby ensuring that only the light with desired wavelengths is reflected by the interferometric modulation pixel.

公开(公告)号：US06882461B1

公开(公告)日：2005-04-19

申请号：US10812257

申请日：2004-03-29

Applicant: Hsiung-Kuang Tsai ,  Wen-Jian Lin

Inventor： Hsiung-Kuang Tsai ,  Wen-Jian Lin

IPC: G02B26/06 ,  B81B3/00 ,  B81C1/00 ,  B81C99/00 ,  G02B26/02 ,  G02F1/1335 ,  G02B26/00

CPC classification number: G02B26/001

Abstract: A micro electro mechanical system display cell comprises a substrate, black matrix layer, a first electrode, a second electrode and supporters. The black matrix layer is located on the substrate and the first electrode is bridged between the black matrixes. The supporters are located on the black matrix layers and located between the two electrodes. The black matrix layers are used to prevent the light leakage between the second electrodes and between the first electrode and the second electrode.

Abstract translation: 微电子机械系统显示单元包括基板，黑矩阵层，第一电极，第二电极和支撑件。 黑矩阵层位于衬底上，第一电极桥接在黑色矩阵之间。 支持者位于黑矩阵层上并位于两个电极之间。 黑矩阵层用于防止第二电极之间和第一电极与第二电极之间的光泄漏。

公开(公告)号：US20050046923A1

公开(公告)日：2005-03-03

申请号：US10815947

申请日：2004-04-02

Applicant: Wen-Jian Lin ,  Hsiung-Kuang Tsai

Inventor： Wen-Jian Lin ,  Hsiung-Kuang Tsai

IPC: G02B26/00 ,  G02F1/1335 ,  G02F1/21

CPC classification number: G02B26/001

Abstract: A protection layer covers the cavity-side surface of a bottom electrode of a interferometric modulation pixel. Consequently, the protective layer protects the surface of the bottom electrode while a sacrificial layer between the bottom electrode and the top electrode is being etched. Thus, the distance between the bottom electrode and the top electrode is maintained, thereby ensuring that only the light with desired wavelengths is reflected by the interferometric modulation pixel.

Abstract translation: 保护层覆盖干涉式调制像素的底部电极的空腔侧表面。 因此，当蚀刻底部电极和顶部电极之间的牺牲层时，保护层保护底部电极的表面。 因此，保持底部电极和顶部电极之间的距离，从而确保只有具有期望波长的光被干涉式调制像素反射。

公开(公告)号：US20050024557A1

公开(公告)日：2005-02-03

申请号：US10711665

申请日：2004-09-30

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: G02F1/1335 ,  G02B26/00 ,  G02B26/08

CPC classification number: G02F1/29 ,  G02B26/001

Abstract: An optical interference color display comprising a transparent substrate, an inner-front optical diffusion layer, a plurality of first electrodes, a patterned support layer, a plurality of optical films and a plurality of second electrodes is provided. The inner-front optical diffusion layer is on the transparent substrate and the first electrodes are on the inner-front optical diffusion layer. The patterned support layer is on the inner-front optical diffusion layer between the first electrodes. The optical film is on the first electrodes and the second electrodes are positioned over the respective first electrodes. The second electrodes are supported through the patterned support layer. Furthermore, there is an air gap between the second electrodes and their respective first electrodes.

Abstract translation: 提供了包括透明基板，内前光学扩散层，多个第一电极，图案化支撑层，多个光学膜和多个第二电极的光学干涉色彩显示器。 内侧光学扩散层位于透明基板上，第一电极位于内侧光学扩散层上。 图案化支撑层位于第一电极之间的内前光学扩散层上。 光学膜位于第一电极上，第二电极位于相应的第一电极上。 第二电极通过图案化支撑层被支撑。 此外，在第二电极和它们各自的第一电极之间存在气隙。

公开(公告)号：US08004736B2

公开(公告)日：2011-08-23

申请号：US12463312

申请日：2009-05-08

Applicant: Wen-Jian Lin ,  Brian Arbuckle ,  Brian Gally ,  Philip Floyd ,  Lauren Palmateer

Inventor： Wen-Jian Lin ,  Brian Arbuckle ,  Brian Gally ,  Philip Floyd ,  Lauren Palmateer

IPC: G02B26/00

CPC classification number: G02B26/001 ,  B81B7/0012 ,  B81B2201/045

Abstract: A first electrode and a sacrificial layer are sequentially formed on a substrate, and then first openings for forming supports inside are formed in the first electrode and the sacrificial layer. The supports are formed in the first openings, and then a second electrode is formed on the sacrificial layer and the supports, thus forming a micro electro mechanical system structure. Afterward, an adhesive is used to adhere and fix a protection structure to the substrate for forming a chamber to enclose the micro electro mechanical system structure, and at least one second opening is preserved on sidewalls of the chamber. A release etch process is subsequently employed to remove the sacrificial layer through the second opening in order to form cavities in an optical interference reflection structure. Finally, the second opening is closed to seal the optical interference reflection structure between the substrate and the protection structure.

Abstract translation: 第一电极和牺牲层依次形成在基板上，然后在第一电极和牺牲层中形成用于形成支撑件的第一开口。 支撑件形成在第一开口中，然后在牺牲层和支撑件上形成第二电极，从而形成微机电系统结构。 之后，使用粘合剂将保护结构粘附并固定到基底上以形成腔室以包围微机电系统结构，并且至少一个第二开口保留在腔室的侧壁上。 随后采用释放蚀刻工艺以通过第二开口去除牺牲层，以便在光学干涉反射结构中形成空腔。 最后，关闭第二个开口以密封衬底和保护结构之间的光学干涉反射结构。